SUSCEPTOR FOR CVD APPARATUS, CVD APPARATUS AND SUBSTRATE HEATING METHOD USING THE SAME
Provided are a susceptor for a chemical vapor deposition (CVD) apparatus, including: a susceptor body having an upper surface opposed to a lower surface thereof and formed of a light transmitting material, the upper surface thereof having at least one pocket part formed to receive a substrate therein; and a light absorbing unit formed of a light absorbing material on the upper surface of the susceptor body.
1 . A susceptor for a chemical vapor deposition (CVD) apparatus, comprising:
a susceptor body having an upper surface opposed to a lower surface thereof and formed of a light transmitting material, the upper surface thereof having at least one pocket part formed to receive a substrate therein; and
a light absorbing unit formed of a light absorbing material on the upper surface of the susceptor body.
2 . The susceptor of claim 1 , wherein the pocket part includes a bottom portion and a step part formed at a position spaced apart from the bottom portion in an upward direction, on which a rim of the substrate is supported.
3 . The susceptor of claim 2 , wherein the step part is formed in the susceptor body.
4 . The susceptor of claim 2 , wherein the step part is formed at an end part of the light absorbing unit that is formed to extend to the pocket part.
5 . The susceptor of claim 1 , wherein the light transmitting material is at least one selected from a group consisting of quartz, sapphire and a translucent ceramic.
6 . The susceptor of claim 1 , wherein the light absorbing material is at least one selected from a group consisting of graphite, SiC and graphite coated with SiC.
7 . The susceptor of claim 1 , wherein the light absorbing material absorbs light of 400 nm to 100 μm in wavelength.
8 . A CVD apparatus comprising:
a chamber;
a susceptor for a CVD apparatus adapted within the chamber, and including a susceptor body having an upper surface opposed to a lower surface thereof and formed of a light transmitting material, the upper surface thereof having at least one pocket part formed to receive a substrate therein, and a light absorbing unit formed of a light absorbing material on the upper surface of the susceptor body; and
a heating lamp emitting light to heat the lower surface of the susceptor.
9 . The apparatus of claim 8 , wherein the pocket part includes a bottom portion and a step part formed at a position apart from the bottom portion in an upward direction, on which a rim of the substrate is supported.
10 . The apparatus of claim 9 , wherein the step part is formed in the susceptor body.
11 . The apparatus of claim 9 , wherein the step part is formed at an end part of the light absorbing unit that is formed to extend to the pocket part.
12 . The apparatus of claim 8 , wherein the light absorbing material absorbs light of 400 nm to 100 μm in wavelength.
13 . The apparatus of claim 8 , wherein the light transmitting material is at least one selected from a group consisting of quartz, sapphire and a translucent ceramic.
14 . The apparatus of claim 8 , wherein the light absorbing material is at least one selected from a group consisting of graphite, SiC and graphite coated with SiC.
15 . The apparatus of claim 8 , further comprising a light absorbing layer formed of the light absorbing material on the lower surface of the substrate, and wherein the light absorbing layer is formed by laminating a plurality of layers of materials having different coefficients of thermal expansion.
16 . A method of heating a substrate by using a CVD apparatus, the method comprising:
arranging a susceptor for a CVD apparatus including a susceptor body having an upper surface opposed to a lower surface thereof and formed of a light transmitting material, and a light absorbing unit formed of a light absorbing material on the upper surface of the susceptor body, the upper surface having at least one pocket part formed to receive the substrate therein;
forming a light absorbing layer formed of a light absorbing material on a lower surface of the substrate formed of a light transmitting material;
mounting the substrate having the light absorbing layer formed on the lower surface thereof, in the pocket part, and disposing the mounted substrate within a chamber of the CVD apparatus; and
irradiating light to the lower surface of the susceptor body to provide heat thereto.
17 . The method of claim 16 , wherein the substrate is formed of at least one selected from a group consisting of quartz, sapphire and a translucent ceramic.
18 . The method of claim 16 , wherein the substrate is provided with the light absorbing layer deposited on the lower surface thereof.
19 . The method of claim 16 , wherein the substrate is provided with the light absorbing layer bonded to the lower surface thereof.
20 . The method of claim 16 , wherein the light absorbing layer is formed by laminating a plurality of layers of materials having different coefficients of thermal expansion.
21 . A method of heating a substrate by using a CVD apparatus, the method comprising:
arranging a susceptor for a CVD apparatus including a susceptor body having an upper surface opposed to a lower surface thereof and formed of a light transmitting material, and a light absorbing unit formed of a light absorbing material on the upper surface of the susceptor body, the upper surface having at least one pocket part formed to receive the substrate therein;
forming a light absorbing layer in the pocket;
mounting the substrate on the light absorbing layer and disposing the mounted substrate within a chamber of the CVD apparatus; and
irradiating light to the lower surface of the susceptor body to provide heat thereto.
22 . The method of claim 21 , wherein the light absorbing layer is formed by laminating a plurality of layers of materials having different coefficients of thermal expansion.