Multiple step printing methods for microbarcodes

1. A method for forming a microparticle, the method comprising:

providing a pattern, wherein the pattern defines a code element;

printing the pattern on a substrate to form a first code element within a microparticle region;

printing the pattern on the substrate to form at least one successive code element, such that the first code element and the at least one successive code element are within the same microparticle region;

wherein a code is formed by the first code element and any successive code elements.

2. The method of claim 1 , wherein printing the pattern on the substrate to form at least one successive code element comprises:

positioning the pattern at a first offset distance from the first code element;

printing the pattern on the substrate to form a second code element;

positioning the pattern at a second offset distance from the second code element; and

printing the pattern on the substrate to form a third code element.

3. The method of claim 2 , wherein the first offset distance and the second offset distance are different distances.

4. The method of claim 1 , wherein printing the pattern comprises printing the pattern with photolithography.

5. The method of claim 1 , wherein printing the pattern comprises the use of a step and repeat exposure system.

6. The method of claim 1 , wherein printing the pattern comprises printing the pattern with imprint lithography.

7. The method of claim 1 , wherein the pattern is provided on a reticle.

8. The method of claim 1 , wherein the code is formed from a plurality of separate and opaque segments.

9. A method for forming a code for a microparticle, the method comprising:

providing a substrate;

depositing a first layer;

depositing a second layer; and

forming a microparticle code according to instructions of a step and repeat exposure system, wherein forming the microparticle code further comprises:

providing a pattern, wherein the pattern defines a code element;

printing the pattern to form a first code element within a microparticle region; and

printing the pattern to form at least one successive code element, such that the first code element and the at least one successive code element are within the same microparticle region;

wherein the microparticle code is formed by the first code element and any successive code elements.

10. The method of claim 9 , wherein the pattern to form at least one successive code element comprises:

positioning the pattern at a first offset distance from the first code element;

printing the pattern on the substrate to form a second code element;

positioning the pattern at a second offset distance from the second code element; and

printing the pattern on the substrate to form a third code element.

11. The method of claim 10 , wherein the first offset distance and the second offset distance are different distances.

12. The method of claim 9 , wherein printing the pattern comprises printing the pattern with photolithography.

13. The method of claim 9 , wherein the second layer is a photosensitive layer.

14. The method of claim 9 , wherein the first layer comprises a transparent material and the second layer comprises an opaque material.

15. The method of claim 9 , wherein the pattern is provided on a reticle.

16. A method for forming an encoded microparticle, comprising:

depositing on a substrate a first layer to be patterned;

depositing on the first layer a second layer that is a photoresist layer;

with a step and repeat exposure system, forming an exposure pattern in the photoresist layer by:

providing a pattern, wherein the pattern defines a code element;

printing the pattern to form a first code element within a microparticle region;

printing the pattern to form at least one successive code element, such that the first code element and the at least one successive code element are within the same microparticle region;

wherein the microparticle code is formed by the first code element and any successive code elements

selectively removing the photoresist layer and patterning the first layer; and

separating the microparticle from the substrate.

17. The method of claim 16 , further comprising:

depositing another layer before depositing the first layer.

18. The method of claim 16 , further comprising:

depositing a third layer after patterning the first layer.

19. The method of claim 16 , wherein depositing the first layer comprises depositing an opaque material.

20. The method of claim 19 , wherein patterning the first layer forms separate segments of the opaque material.

21. The method of claim 20 , further comprising:

depositing a third layer after patterning the first layer, wherein the third layer encloses the separate segments of the opaque material.