Double silver low-emissivity and solar control coatings
View Patent ↗A low-emissivity multilayer coating includes, in order outward from the substrate, a first layer including a layer containing titanium oxide, a layer containing silicon nitride, or a sublayer layer containing titanium oxide in combination with a sublayer containing silicon 5 nitride, a second layer including Ag, a third layer including at least one layer selected from titanium oxide layers and silicon nitride layers, a fourth layer including Ag, and a fifth layer including silicon nitride, where the color of the coatings can be varied over a wide range by controlling the thicknesses of the layers of titanium oxide, silicon nitride and Ag.
1. A low-emissivity coating on a substrate, the coating comprising, in numerical order outward from the substrate,
a first layer including at least one layer selected from titanium oxide layers and silicon nitride layers;
a second layer including Ag;
a third layer including at least one layer selected from titanium oxide layers and silicon nitride layers;
a fourth layer including Ag; and
a fifth layer including silicon nitride, wherein
at least one of the second layer and the fourth layer consists of, in numerical order outward from the substrate,
a first sublayer, which includes a zinc oxide and which is from 6 to 7 nm thick;
a second sublayer, which includes Ag; and
a third sublayer, which includes a first oxidized metal.
2. The coating according to claim 1 , wherein the first layer is from 5 to 30 nm thick.
3. The coating according to claim 1 , wherein
the first layer includes a titanium oxide layer; and
the titanium oxide in the first layer is amorphous.
4. The coating according to claim 1 , wherein the third layer comprises at least one of a TiO 2 layer and a Si 3 N 4 layer.
5. The coating according to claim 1 , wherein the third layer comprises a superlattice of titanium oxide and silicon nitride.
6. The coating according to claim 1 , wherein the zinc oxide comprises nitrogen.
7. The coating according to claim 1 , wherein the first oxidized metal comprises an at least partially oxidized Ni—Cr alloy.
8. The coating according to claim 1 , wherein the Ag in at least one of the second layer and the fourth layer further comprises at least one of oxygen and nitrogen.
9. The coating according to claim 1 , wherein at least one of the first layer, the second layer, the third layer, and the fourth layer is divided by a layer of a second oxidized metal.
10. The coating according to claim 9 , wherein the second oxidized metal is an at least partially oxidized Ni—Cr alloy.
11. The coating according to claim 1 , wherein the silicon nitride comprises less than a stoichiometric amount of nitrogen.
12. The coating according to claim 1 , wherein
the first layer includes a layer of SiN x , where 0<x≦1.34;
the third layer includes a layer of SiN x , where 0<x≦1.34; and
the fifth layer includes a layer of SiN x , where 0<x≦1.34.
13. The coating according to claim 12 , wherein the first layer includes a layer of SiN x , where x=1.34.
14. A low-emissivity coating on a transparent substrate, the coating comprising, in numerical order outward from the substrate,
a first layer, which includes a silicon nitride and which is from 5 to 30 nm thick;
a second layer, which includes a zinc oxide and which is from 6 to 7 nm thick;
a third layer which includes Ag and which is from 8 to 16 nm thick;
a fourth layer, which includes a first oxidized Ni—Cr alloy directly on the Ag of the third layer and which is from 2 to 8 nm thick;
a fifth layer, which includes a silicon nitride and which is from 45 to 90 nm thick;
a sixth layer, which includes a zinc oxide and which is from 6 to 7 nm thick;
a seventh layer, which includes Ag and which is from 8 to 24 nm thick;
an eighth layer, which includes a second oxidized Ni—Cr alloy directly on the Ag of the seventh layer and which is from 2 to 8 nm thick; and
a ninth layer, which includes a silicon nitride and which is from 25 to 60 nm thick.
15. The coating according to claim 14 , wherein
the first layer includes a layer of SiN x , where 0<x≦1.34;
the fifth layer includes a layer of SiN x , where 0<x≦1.34; and
the ninth layer includes a layer of SiN x , where 0<x≦1.34.
16. The coating according to claim 15 , wherein the first layer includes a layer of SiN x , where x=1.34.
17. The coating according to claim 14 , wherein the zinc oxide in at least one of the second layer and the sixth layer comprises nitrogen.
18. A method of making a low-emissivity coating on a substrate, the method comprising
depositing at least one layer including Ag on the substrate; and
producing the coating of claim 1 .
19. The method according to claim 18 , wherein the depositing comprises sputtering.