IP Library Granted Patent US 8,841,030
Granted Patent B2
US 8,841,030 · App. 13/357,320 · Granted Sep 23, 2014

Microstructured electrode structures

Inventors: Ashok Lahiri (Cupertino, CA); Robert Spotnitz (Pleasanton, CA); Nirav Shah (Pleasanton, CA); Murali Ramasubramanian (Fremont, CA); Harrold J. Rust, III (Alamo, CA); James D. Wilcox (Pleasanton, CA); Michael J. Armstrong (Danville, CA); Brian E. Brusca (Tracy, CA); Christopher G. Castledine (Sunnyvale, CA); Laurie J. Lauchlan (Saratoga, CA)
Assignee: Enovix Corporation
H01M4/80H01M4/134
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Quick Facts
Patent No.
US 8,841,030
App. No.
13/357,320
Granted
Sep 23, 2014
Kind
B2
Abstract

A structure for use in an energy storage device, the structure comprising a backbone system extending generally perpendicularly from a reference plane, and a population of microstructured anodically active material layers supported by the lateral surfaces of the backbones, each of the microstructured anodically active material layers having a void volume fraction of at least 0.1 and a thickness of at least 1 micrometer.

Claims (57)

1. A structure for use in an energy storage device, the structure comprising a population of anode structures having a height, H A , of at least 50 micrometers measured in a direction orthogonal to a reference plane, each member of the population comprising a microstructured anodically active material layer having a front surface, a back surface, a thickness, T, measured from the front surface to the back surface, and a void volume fraction of at least 0.1, the front and back surfaces being substantially perpendicular to the reference plane, the thickness, T, being at least 1 micrometer and measured in a direction parallel to the reference plane, the microstructured anodically active material layers comprising a fibrous or a porous anodically active material oriented such that (i) anodically active material fibers comprised by the microstructured material layers are attached to the back surface of the layers and predominantly have central axes that are substantially parallel to the reference plane at the point of attachment of the fibers to the back surfaces of the microstructured anodically active material layers, and (ii) the pores of porous anodically active material comprised by the microstructured material layers predominantly have major axes that are substantially parallel to the reference plane wherein the lineal distance, D L , between at least two members of the population, measured in a direction parallel to the reference plane, is greater than the maximum value of H A for the population.

2. The structure of claim 1 wherein each member of the population comprises aluminum, tin, silicon or an alloy thereof.

3. The structure of claim 1 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof.

4. The structure of claim 1 wherein each member of the population comprises silicon or an alloy thereof and has a thickness of about 1 to about 100 micrometers.

5. The structure of claim 1 wherein for each member of the population H A is greater than T.

6. The structure of claim 1 wherein the microstructured anodically active material layer of each member of the population comprises porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, and a thickness of about 1 to about 200 micrometers.

7. The structure of claim 1 wherein the each member of the population is supported by a backbone having an electrical conductivity of less than 10 Siemens/cm.

8. The structure of claim 1 wherein the maximum value of H A for the population is less than 5,000 micrometers.

9. The structure of claim 1 wherein the microstructured anodically active material layer of each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone having an electrical conductivity of less than 10 Siemens/cm, and the maximum value of H A for the population is less than 5,000 micrometers.

10. The structure of claim 1 wherein the microstructured anodically active material layer of each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone having an electrical conductivity of less than 1 Siemens/cm, and the maximum value of H A for the population is less than 1,000 micrometers.

11. The structure of claim 1 wherein the population comprises at least 20 members.

12. An electrochemical stack for use in an energy storage device, the electrochemical stack comprising, in a stacked arrangement, cathode structures, separator layers and a population of anode structures having a height, H A , of at least 50 micrometers measured in a direction orthogonal to a reference plane, the separator layers being disposed between the anode structures and the cathode structures, the direction of stacking of the cathode structures, the separator layers, and the anode structures being parallel to the reference plane, each member of the population of anode structures comprising a microstructured anodically active material layer having a front surface, a back surface, a thickness, T, measured from the front surface to the back surface, and a void volume fraction of at least 0.1, the front and back surfaces being substantially perpendicular to the reference plane, the thickness, T, being at least 1 micrometer and measured in a direction parallel to the reference plane, the microstructured anodically active material layers comprising a fibrous or a porous anodically active material oriented such that (i) anodically active material fibers comprised by the microstructured material layers are attached to the back surface of the layers and predominantly have central axes that are substantially parallel to the reference plane at the point of attachment of the fibers to the back surfaces of the microstructured anodically active material layers, and (ii) the pores of porous anodically active material comprised by the microstructured material layers predominantly have major axes that are substantially parallel to the reference plane wherein the lineal distance, D L , between at least two members of the population, measured in a direction parallel to the reference plane, is greater than the maximum value of H A for the population.

13. The electrochemical stack of claim 12 wherein the population comprises at least 20 members.

14. The electrochemical stack of claim 12 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof.

15. The electrochemical stack of claim 12 wherein each member of the population comprises silicon or an alloy thereof and has a thickness of about 1 to about 100 micrometers.

16. The electrochemical stack of claim 12 wherein for each member of the population H A is greater than T.

17. The electrochemical stack of claim 12 wherein each member of the population comprises porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, and a thickness of about 1 to about 200 micrometers.

18. The electrochemical stack of claim 12 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone and the maximum value of H A for the population is less than 5,000 micrometers.

19. The electrochemical stack of claim 12 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone having an electrical conductivity of less than 10 Siemens/cm, and the maximum value of H A for the population is less than 1,000 micrometers.

20. The electrochemical stack of claim 12 wherein the anode structures comprise an anode current collector, the cathode structures comprise a cathode current collector, and the anode current collector or the cathode current collector comprises an ionically permeable conductor layer.

21. The electrochemical stack of claim 12 wherein the anode structures comprise an anode current collector layer and the anode current collector layer is disposed between and is in direct contact with an anodically active material layer and a separator layer.

22. The electrochemical stack of claim 21 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone and the maximum value of H A for the population is less than 5,000 micrometers.

23. The electrochemical stack of claim 12 wherein the cathode structures comprise a cathode current collector layer and the cathode current collector layer is disposed between and is in direct contact with a cathodically active material layer and a separator layer.

24. An energy storage device comprising carrier ions, a non-aqueous electrolyte and an electrochemical stack, the carrier ions being lithium, sodium or potassium ions, the electrochemical stack comprising, in a stacked arrangement, cathode structures, separator layers and a population of anode structures having a height, H A , of at least 50 micrometers measured in a direction orthogonal to a reference plane, the separator layers being disposed between the anode structures and the cathode structures, the direction of stacking of the cathode structures, the separator layers, and the anode structures being parallel to the reference plane, each member of the population of anode structures comprising a microstructured anodically active material layer having a front surface, a back surface, a thickness, T, measured from the front surface to the back surface, and a void volume fraction of at least 0.1, the front and back surfaces being substantially perpendicular to the reference plane, the thickness, T, being at least 1 micrometer and measured in a direction parallel to the reference plane, the microstructured anodically active material layers comprising a fibrous or a porous anodically active material oriented such that (i) anodically active material fibers comprised by the microstructured material layers are attached to the back surface of the layers and predominantly have central axes that are substantially parallel to the reference plane at the point of attachment of the fibers to the back surfaces of the microstructured anodically active material layers, and (ii) the pores of porous anodically active material comprised by the microstructured material layers predominantly have major axes that are substantially parallel to the reference plane wherein the lineal distance, D L , between at least two members of the population, measured in a direction parallel to the reference plane, is greater than the maximum value of H A for the population.

25. The energy storage device of claim 24 wherein the carrier ions are lithium ions.

26. The energy storage device of claim 24 wherein the population comprises at least 20 members.

27. The energy storage device of claim 24 wherein each member of the population comprises silicon or an alloy thereof and has a thickness of about 1 to about 100 micrometers.

28. The energy storage device of claim 24 wherein for each member of the population H A is greater than T.

29. The energy storage device of claim 24 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof.

30. The energy storage device of claim 24 wherein each member of the population comprises porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, and a thickness of about 1 to about 200 micrometers.

31. The energy storage device of claim 24 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone and the maximum value of H A for the population is less than 5,000 micrometers.

32. The energy storage device of claim 24 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone having an electrical conductivity of less than 10 Siemens/cm, and the maximum value of H A for the population is less than 1,000 micrometers.

33. The energy storage device of claim 24 wherein the anode structures comprise an anode current collector, the cathode structures comprise a cathode current collector, and the anode current collector or the cathode current collector comprises an ionically permeable conductor layer.

34. The energy storage device of claim 24 wherein the anode structures comprise an anode current collector layer and the anode current collector layer is disposed between and is in direct contact with an anodically active material layer and a separator layer.

35. The energy storage device of claim 34 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone and the maximum value of H A for the population is less than 5,000 micrometers.

36. A secondary battery comprising carrier ions, a non-aqueous electrolyte and at least two electrochemical stacks, the carrier ions being lithium, sodium or potassium ions, each of the electrochemical stacks comprising, in a stacked arrangement, cathode structures, separator layers and a population of anode structures having a height, H A , of at least 50 micrometers measured in a direction orthogonal to a reference plane, the separator layers being disposed between the anode structures and the cathode structures, the direction of stacking of the cathode structures, the separator layers, and the anode structures within each such electrochemical stack being parallel to the reference plane, each member of the population of anode structures comprising a microstructured anodically active material layer having a front surface, a back surface, a thickness, T, measured from the front surface to the back surface, and a void volume fraction of at least 0.1, the front and back surfaces being substantially perpendicular to the reference plane, the thickness, T, being at least 1 micrometer and measured in a direction parallel to the reference plane, the microstructured anodically active material layers comprising a fibrous or a porous anodically active material oriented such that (i) anodically active material fibers comprised by the microstructured material layers are attached to the back surface of the layers and predominantly have central axes that are substantially parallel to the reference plane at the point of attachment of the fibers to the back surfaces of the microstructured anodically active material layers, and (ii) the pores of porous anodically active material comprised by the microstructured material layers predominantly have major axes that are substantially parallel to the reference plane wherein the electrochemical stacks are stacked relative to each other in a direction that is orthogonal to the reference plane.

37. The secondary battery of claim 36 wherein the carrier ions are lithium ions.

38. The secondary battery of claim 36 wherein the population comprises at least 20 members.

39. The secondary battery of claim 36 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof.

40. The secondary battery of claim 36 wherein each member of the population comprises silicon or an alloy thereof and has a thickness of about 1 to about 100 micrometers.

41. The secondary battery of claim 36 wherein for each member of the population H A is greater than T.

42. The secondary battery of claim 36 wherein each member of the population comprises porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, and a thickness of about 1 to about 200 micrometers.

43. The secondary battery of claim 36 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone and the maximum value of H A for the population is less than 5,000 micrometers.

44. The secondary battery of claim 36 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone having an electrical conductivity of less than 10 Siemens/cm, and the maximum value of H A for the population is less than 1,000 micrometers.

45. The secondary battery of claim 36 wherein the anode structures comprise an anode current collector, the cathode structures comprise a cathode current collector, and the anode current collector or the cathode current collector comprises an ionically permeable conductor layer.

46. The secondary battery of claim 36 wherein the anode structures comprise an anode current collector layer and the anode current collector layer is disposed between and is in direct contact with an anodically active material layer and a separator layer.

47. The secondary battery of claim 36 wherein each member of the population comprises nanowires of silicon or an alloy thereof, or porous silicon or an alloy thereof, has a void volume fraction of at least 0.1 but less than 0.8, a thickness of about 1 to about 200 micrometers, and is supported by a backbone and the maximum value of H A for the population is less than 5,000 micrometers.

48. The structure of claim 1 wherein the microstructured anodically active material layers comprise mesoporous silicon or an alloy thereof, macroporous silicon or an alloy thereof or a combination of mesoporous and macroporous silicon or an alloy thereof, and the microstructured anodically active material layers have a thickness of about 2 to about 75 micrometers.

49. The structure of claim 1 wherein the lineal distance, D L , between at least two members of the population, measured in a direction parallel to the reference plane, is greater than the maximum value of H A for the population by a factor of at least 10.

50. The structure of claim 1 wherein the population comprises at least 50 members.

51. The structure of claim 1 wherein the anode structures are non-laminated and are supported by a base having a surface that is parallel to the reference plane, and the anode structures, cathode structures and separators have a surface area that exceeds the geometrical footprint of the supporting surface of the base by a factor of at least 2.

52. The structure of claim 1 wherein each of the anode structures comprise an anode backbone having a thickness of about 5 to about 50 micrometers, measured in the same direction as thickness T, and a height of about 50 to about 5,000 micrometers measured in the same direction as height H A .

53. The energy storage device of claim 24 wherein the microstructured anodically active material layers comprise mesoporous silicon or an alloy thereof, macroporous silicon or an alloy thereof or a combination of mesoporous and macroporous silicon or an alloy thereof, and the microstructured anodically active material layers have a thickness of about 2 to about 75 micrometers.

54. The energy storage device of claim 24 wherein the lineal distance, D L , between at least two members of the population, measured in a direction parallel to the reference plane, is greater than the maximum value of H A for the population by a factor of at least 10.

55. The energy storage device of claim 24 wherein the population comprises at least 50 members.

56. The energy storage device of claim 24 wherein the anode structures, cathode structures and separators are non-laminated and are supported by a base having a surface that is parallel to the reference plane, and the anode structures, cathode structures and separators have a surface area that exceeds the geometrical footprint of the supporting surface of the base by a factor of at least 2.

57. The energy storage device of claim 24 wherein each of the anode structures comprises an anode backbone having a thickness of about 5 to about 50 micrometers, measured in the same direction as thickness T, and a height of about 50 to about 5,000 micrometers measured in the same direction as height H A .

Assignments (7)
MERGER AND CHANGE OF NAME Recorded Jan 19, 2023
From: ENOVIX OPERATIONS INC.; ENOVIX CORPORATION
To: ENOVIX CORPORATION
Reel/Frame 062434/0809 →
MERGER AND CHANGE OF NAME Recorded Jan 5, 2022
From: RSVAC MERGER SUB INC.; ENOVIX CORPORATION; ENOVIX OPERATIONS INC.
To: ENOVIX OPERATIONS INC.
Reel/Frame 058646/0894 →
TERMINATION OF SECURED OPTION AGREEMENT Recorded Feb 5, 2021
From: YORK DISTRESSED ESSET FUND III, L.P.; RODGERS MASSEY REVOCABLE LIVING TRUST DTD 4/4/11, THURMAN JOHN RODGERS, TRUSTEE; PETRICK, MICHAEL; EDDY ZERVIGON REVOCABLE TRUST U/A DATED FEBRUARY 16, 2010 - EDDY ZERVIGON AS TRUSTEE; SABOUNGHI, EDGAR; GCHINVESTMENTS,LLC; SHERMAN, JOEL, DR.; THE OBERST FAMILY TRUST, DATED 12/7/2005; GREENBERGER, MARC; JEROME INVESTMENTS, LLC; MCGOVERN, BRIAN; DPIP PROJECT LION SERIES; TUNE HOUSE CAPITAL I LLC; DCM V, L.P.
To: ENOVIX CORPORATION
Reel/Frame 055229/0544 →
SECOND AMENDMENT TO SECURED OPTION AGREEMENT Recorded Jan 7, 2019
From: ENOVIX CORPORATION
To: YORK DISTRESSED ASSET FUND III, L.P.; RODGERS MASSEY REVOCABLE LIVING TRUST DTD 4/4/11, THURMAN JOHN RODGERS, TRUSTEE; MICHAEL PETRICK; EDDY ZERVIGON REVOCABLE TRUST U/A DATED FEBRUARY 16, 2010 - EDDY ZERVIGON AS TRUSTEE; EDGAR SABOUNGHI; GCH INVESTMENTS, LLC; DR. JOEL SHERMAN; THE OBERST FAMILY TRUST, DATED 12/7/2005; MARC GREENBERGER; JEROME INVESTMENTS, LLC; BRIAN MCGOVERN; DPIP PROJECT LION SERIES; TUNE HOUSE CAPITAL I LLC; DCM V, L.P.
Reel/Frame 048432/0300 →
FIRST AMENDMENT TO SECURED OPTION AGREEMENT Recorded Dec 6, 2018
From: ENOVIX CORPORATION
To: YORK DISTRESSED ASSET FUND III, L.P.; RODGERS MASSEY REVOCABLE LIVING TRUST DTD 4/4/11, THURMAN JOHN RODGERS, TRUSTEE; PETRICK, MICHAEL; EDDY ZERVIGON REVOCABLE TRUST U/A DATED FEBRUARY 16, 2010 -EDDY ZERVIGON AS TRUSTEE; SABOUNGHI, EDGAR; GCH INVESTMENTS, LLC; SHERMAN, JOEL, DR.; THE OBERST FAMILY TRUST, DATED 12/7/2005; GREENBERGER, MARC; JEROME INVESTMENTS, LLC; MCGOVERN, BRIAN; DPIP PROJECT LION SERIES; TUNE HOUSE CAPITAL I LLC
Reel/Frame 047733/0685 →
SECURED OPTION AGREEMENT Recorded Oct 29, 2018
From: ENOVIX CORPORATION
To: YORK DISTRESSED ASSET FUND III, L.P.; RODGERS MASSEY REVOCABLE LIVING TRUST DTD 4/4/11, THURMAN JOHN RODGERS, TRUSTEE; PETRICK, MICHAEL; EDDY ZERVIGON REVOCABLE TRUST U/A DATED FEBRUARY 16, 2010 -EDDY ZERVIGON AS TRUSTEE; SABOUNGHI, EDGAR; GCH INVESTMENTS, LLC; SHERMAN, JOEL, DR.; THE OBERST FAMILY TRUST, DATED 12/7/2005; GREENBERGER, MARC; JEROME INVESTMENTS, LLC; MCGOVERN, BRIAN; DPIP PROJECT LION SERIES
Reel/Frame 047348/0007 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 23, 2012
From: LAHIRI, ASHOK; SPOTNITZ, ROBERT; SHAH, NIRAV; RAMASUBRAMANIAN, MURALI; RUST, HARROLD J., III; WILCOX, JAMES D.; ARMSTRONG, MICHAEL J.; BRUSCA, BRIAN E.; CASTLEDINE, CHRISTOPHER G.; LAUCHLAN, LAURIE J.
To: ENOVIX CORPORATION
Reel/Frame 027916/0892 →
Continuity (1)
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