Growth substrate and light emitting device
Disclosed are a growth substrate and a light emitting device. The light emitting device includes a silicon substrate, a first buffer layer disposed on the silicon substrate and having an exposing portions of the silicon substrate, a second buffer layer covering the first buffer layer and the exposed portions of the silicon substrate, wherein the second buffer layer is formed of a material causing a eutectic reaction with the silicon substrate, a third buffer layer disposed on the second buffer layer, and a light emitting structure disposed on the third buffer layer, and the second buffer layer includes voids.
1. A growth substrate comprising:
a base substrate;
a first semiconductor buffer layer disposed on the base substrate and having an exposing portions of the base substrate;
a second semiconductor buffer layer covering the first buffer layer and the exposed portions of the base substrate, wherein the second buffer layer is formed of a material causing a eutectic reaction with the base substrate; and
a third semiconductor buffer layer disposed on the second buffer layer,
wherein the second buffer layer includes voids.
2. The growth substrate according to claim 1 , wherein the base substrate is a silicon substrate.
3. The growth substrate according to claim 1 , wherein the first buffer layer includes pin holes or islands exposing the portions of the base substrate, wherein the islands are separated from each other.
4. The growth substrate according to claim 1 , wherein the second buffer layer is formed of a material having a lower melting point than the first buffer layer.
5. The growth substrate according to claim 1 , wherein the third buffer layer is formed of the same material as the first buffer layer.
6. The growth substrate according to claim 1 , wherein the second buffer layer is formed of a nitride semiconductor having a formula of Al x M y Ga (1-x-y) N (0≦x+y≦1, 0≦x≦0.5, M=indium (In) and/or boron (B)).
7. The growth substrate according to claim 6 , wherein the first buffer layer and the third buffer layer are formed of a nitride semiconductor having a formula of Al x In y Ga (1-x-y) N (0≦x+y≦1, 0≦y≦0.5).
8. The growth substrate according to claim 7 , wherein an Al content of the second buffer layer is smaller than an Al content of the first buffer layer and the third buffer layer.
9. The growth substrate according to claim 1 , wherein the voids are formed between the base substrate and the third buffer layer.
10. The growth substrate according to claim 3 , wherein portions of the silicon substrate under the voids include holes.
11. The growth substrate according to claim 7 , wherein the second buffer layer includes GaSi.
12. The growth substrate according to claim 1 , wherein a thickness of the third buffer layer is greater than a thickness of the first buffer layer.
13. A light emitting device comprising:
a silicon substrate;
a first semiconductor buffer layer disposed on the silicon substrate and having an exposing portions of the silicon substrate;
a second semiconductor buffer layer covering the first buffer layer and the exposed portions of the silicon substrate, wherein the second buffer layer is formed of a material causing a eutectic reaction with the silicon substrate;
a third semiconductor buffer layer disposed on the second buffer layer; and
a semiconductor light emitting structure disposed on the third buffer layer,
wherein the second buffer layer includes voids.
14. The light emitting device according to claim 13 , wherein the first buffer layer includes pin holes or islands exposing the portions of the base substrate, wherein the islands are separated from each other.
15. The light emitting device according to claim 13 , wherein the second buffer layer is formed of a material having a lower melting point than the first buffer layer.
16. The light emitting device according to claim 13 , wherein the second buffer layer is formed of a nitride semiconductor having a formula of Al x M y Ga (1-x-y) N (0≦x+y≦1, 0≦x≦0.5, M=indium (In) and/or boron (B)).
17. The light emitting device according to claim 16 , wherein the first buffer layer and the third buffer layer are formed of a nitride semiconductor having a formula of Al x In y Ga (1-x-y) N (0≦x+y≦1, 0≦y≦0.5).
18. The light emitting device according to claim 17 , wherein an Al content of the second buffer layer is smaller than an Al content of the first buffer layer and the third buffer layer.
19. The light emitting device according to claim 14 , wherein portions of the silicon substrate under the voids include holes.
20. The light emitting device according to claim 18 , wherein the second buffer layer includes GaSi.