Polyethersulfone compositions with high heat and good impact resistance
View Patent ↗Polyethersulfones having Tg greater than about 225° C. and a notched Izod value greater than about 1 ft-lb/in, as measured by ASTM D256, comprise from about 5 mol % to less than about 40 mol % structural units of formula 1; and from greater than about 60 mol % to about 95 mol % structural units of formula 2 wherein R 1 , R 2 , and R 3 are independently at each occurrence a halogen atom, a nitro group, a cyano group, a C 1 -C 12 aliphatic radical, C 3 -C 12 cycloaliphatic radical, or a C 3 -C 12 aromatic radical; n, m, q are independently at each occurrence integers from 0 to 4; and Q is a C 3 -C 20 cycloaliphatic radical, or a C 3 -C 20 aromatic radical.
1. A polyethersulfone having Tg greater than about 225° C. and a notched Izod value greater than about 1 ft-lb/in, said polyethersulfone consisting of
from about 5 mol % to about 25 mol % structural units of formula 1B; and
from greater than about 75 mol % to about 95 mol % structural units of formula 2
wherein
R 2 and R 3 are independently at each occurrence a halogen atom, a nitro group, a cyano group, a C 1 -C 12 aliphatic radical, C 3 -C 12 cycloaliphatic radical, or a C 3 -C 12 aromatic radical;
R 4 is C 1 -C 20 aliphatic radical, a C 3 -C 20 cycloaliphatic radical, or a C 3 -C 20 aromatic radical ; and
n, m, q are independently at each occurrence integers from 0 to 4.
2. A polyethersulfone according to claim 1 , consisting of from about 5 mol % to about 25 mol % structural units of formula 1B1; and
from greater than about 75 mol % to about 95 mol % structural units of formula 2B;
3. An article comprising a polyethersulfone according to claim 1 .