IP Library Granted Patent US 8,780,431
Granted Patent B1
US 8,780,431 · App. 13/364,832 · Granted Jul 15, 2014

Plasmon absorption modulator systems and methods

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Quick Facts
Patent No.
US 8,780,431
App. No.
13/364,832
Granted
Jul 15, 2014
Kind
B1
Abstract

Plasmon absorption modulator systems and methods are disclosed. A plasmon absorption modulator system includes a semiconductor substrate, a plurality of quantum well layers stacked on a top surface of the semiconductor substrate, and a metal layer formed on a top surface of the stack of quantum well layers. A method for modulating plasmonic current includes enabling propagation of the plasmonic current along a metal layer, and applying a voltage across the stack of quantum well layers to cause absorption of a portion of energy of the plasmonic current by the stack of quantum well layers. A metamaterial switching system includes a semiconductor substrate, a plurality of quantum well layers stacked on a top surface of the semiconductor substrate, and at least one metamaterial structure formed on a top surface of the stack of quantum well layers.

Claims (38)

1. A plasmon absorption modulator system comprising:

a semiconductor substrate having a top surface;

a variable absorption layer;

a metal layer having a length parallel to the top surface of the semiconductor substrate and configured to enable propagation of plasmons along its length; and

a coupling structure configured to receive electromagnetic radiation and in response to such received radiation to generate a plasmonic current in the metal layer, and/or to receive plasmonic current from the metal layer and in response to such received current to generate and transmit electromagnetic radiation;

wherein the variable absorption layer comprises a plurality of quantum well layers stacked on a top surface of the semiconductor substrate;

wherein the metal layer is formed on a top surface of the stack of quantum well layers; and

wherein the variable absorption layer is configured to attenuate plasmons of at least some frequencies propagating along the metal layer by an amount that depends on a voltage applied across the stack of quantum well layers.

2. The system of claim 1 , wherein the metal layer comprises an elongated metal strip extending in a first direction along the top surface of the stack of quantum well layers.

3. The system of claim 1 , wherein at least one said coupling structure is formed on at least one end of the metal layer.

4. The system of claim 3 , wherein the coupling structure comprises a diffraction grating.

5. The system of claim 1 , further comprising:

a cladding layer formed at least partially surrounding the metal layer.

6. The system of claim 1 , further comprising:

an electrode directly coupled to the stack of quantum well layers; and

a voltage source electrically coupled to the electrode, the voltage source configured to apply a voltage across the stack of quantum well layers to modulate a plasmonic current propagating in the metal layer.

7. The system of claim 6 , wherein the voltage source is configured to apply a voltage across the stack of quantum well layers in order to modulate a signal onto the plasmonic current propagating in the metal layer.

8. A method for modulating plasmonic current comprising:

enabling propagation of the plasmonic current along a metal layer, the metal layer positioned on a stack of quantum well layers formed on a semiconductor substrate; and

applying a voltage across the stack of quantum well layers to cause absorption of a portion of energy of the plasmonic current by the stack of quantum well layers.

9. The method of claim 8 , further comprising:

generating the plasmonic current at one end of the metal layer with a coupling structure formed on the metal layer.

10. The method of claim 8 , wherein the applying step comprises:

applying a voltage across the stack of quantum well layers in order to modulate a signal onto the plasmonic current.

11. The method of claim 10 , further comprising:

emitting electromagnetic radiation including the signal from the metal layer with a coupling structure formed on the metal layer.

12. A metamaterial switching system comprising:

a semiconductor substrate having a top surface;

a variable absorption layer; and

at least one metamaterial structure;

wherein the variable absorption layer comprises a plurality of quantum well layers stacked on a top surface of the semiconductor substrate;

wherein at least one said metamaterial structure is formed on a top surface of the stack of quantum well layers; and

wherein the variable absorption layer is configured to switch on or off an operation of at least one said metamaterial structure in response to a voltage applied across the stack of quantum well layers.

13. The system of claim 12 , wherein the at least one metamaterial structure comprises an array of metamaterial structures.

14. The system of claim 13 , wherein the array of metamaterial structures comprises an array of split ring resonators.

15. The system of claim 12 , further comprising:

an electrode directly coupled to the stack of quantum well layers; and

a voltage source electrically coupled to the electrode, the voltage source configured to apply a voltage across the stack of quantum well layers to switch on or off an operation of the at least one metamaterial structure.

Assignments (3)
CHANGE OF NAME Recorded May 22, 2018
From: SANDIA CORPORATION
To: NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SANDIA, LLC
Reel/Frame 046209/0521 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2012
From: KEKATPURE, ROHAN DEODATTA; DAVIDS, PAUL
To: SANDIA CORPORATION
Reel/Frame 028322/0355 →
CONFIRMATORY LICENSE Recorded Mar 16, 2012
From: SANDIA CORPORATION
To: U.S. DEPARTMENT OF ENERGY
Reel/Frame 027875/0258 →