High voltage-resistant lateral double-diffused transistor based on nanowire device
The invention provides a high voltage-resistant lateral double-diffused transistor. The lateral double-diffused MOS transistor includes a channel region, a gate dielectric, a gate region, a source region, a drain region, a source end extension region and a drain end S-shaped drifting region, wherein the channel region has a lateral cylindrical silicon nanowire structure, on which a layer of gate dielectric is uniformly covered, the gate region is on the gate dielectric, the gate region and the gate dielectric completely surround the channel region, the source end extension region lies between the source region and the channel region, the drain end S-shaped drifting region lies between the drain region and the channel region, the plan view of the drain end S-shaped drifting region is in the form of single or multiple S-shaped structure(s), and an insulating material with a relative dielectric constant of 1-4 is filled within the S-shaped structure(s).
1. A lateral double-diffused MOS transistor, comprising a channel region, a gate dielectric, a gate region, a source region, a drain region, a source end extension region and a drain end S-shaped drifting region, wherein the channel region has a lateral cylindrical silicon nanowire structure, on which a layer of gate dielectric is uniformly covered, the gate region is on the gate dielectric, the gate region and the gate dielectric completely surround the channel region, the source end extension region lies between the source region and the channel region, the drain end S-shaped drifting region lies between the drain region and the channel region, the drain end S-shaped drifting region is in a form of single or multiple S-shaped structure, and an insulating material with a relative dielectric constant of 1-4 is filled within the S-shaped structure.
2. The transistor according to claim 1 , wherein a length of the drain end S-shaped drifting region is 1 μm-2 μm, a size of each back-track in the S-shaped structure is 50 nm-100 nm (longitudinal)×100 nm-200 nm (lateral), and the number of S-shaped back-tracks is in the range of 1-5.
3. The transistor according to claim 2 , wherein the doping concentration of the drain end S-shaped drifting region is 10 12 -10 18 cm −3 .
4. The transistor according to claim 1 , wherein the channel region is not doped, and has a length in the range of 10 nm-10 μm and a radius in the range of 3-5 nm.
5. The transistor according to claim 1 , wherein a thickness of the gate dielectric is in the range of 1-2.5 nm, and a thickness of the gate region is in the range of 10 nm-5 μm.
6. The transistor according to claim 1 , wherein the source region is flush with the drain region at upper and lower surfaces, and high-concentration doping is employed, wherein a doping concentration is in the range of 10 20 -10 21 cm −3 .
7. The transistor according to claim 1 , wherein a doping concentration of the source end extension region is the same as that of the source region, a length of the source end extension region is in the range of 20 nm-100 nm, and the doping concentration of the source end extension region is in the range of 10 20 -10 21 cm −3 .