IP Library Granted Patent US 9,415,444
Granted Patent B2
US 9,415,444 · App. 13/382,587 · Granted Aug 16, 2016

Process for production of R-T-B based sintered magnets and R-T-B based sintered magnets

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Quick Facts
Patent No.
US 9,415,444
App. No.
13/382,587
Granted
Aug 16, 2016
Kind
B2
Abstract

A method for producing a sintered R-T-B based magnet includes the steps of: providing a sintered R-T-B based magnet body 1 ; providing an RH diffusion source 2 including a metal or an alloy of a heavy rare-earth element RH (which is at least one of Dy an Tb); loading the sintered magnet body 1 and the RH diffusion source 2 into a processing chamber 3 so that the magnet body 1 and the diffusion source 2 are movable relative to each other and brought close to, or in contact with, each other; and performing an RH diffusion process by conducting a heat treatment on the sintered R-T-B based magnet body 1 and the RH diffusion source 2 at a temperature of 500° C. to 850° C. for at least 10 minutes while moving the magnet body 1 and the diffusion source 2 either continuously or discontinuously in the processing chamber 3.

Claims (17)

1. A method for producing a sintered R-T-B based magnet, the method comprising the steps of:

providing a sintered R-T-B based magnet body;

providing an RH diffusion source including a metal or an alloy of a heavy rare-earth element RH, which is at least one selected from the group consisting of Dy and Tb;

loading the sintered R-T-B based magnet body and the RH diffusion source into a processing chamber so that the sintered R-T-B based magnet body and the RH diffusion source are moved into contact with each other or into and out of contact with each other;

performing an RH diffusion process by conducting a heat treatment on the sintered R-T-B based magnet body and the RH diffusion source at a temperature of 500° C. to 850° C. for at least 10 minutes by heating the processing chamber while moving the sintered R-T-B based magnet body and the RH diffusion source either continuously or discontinuously in the processing chamber so that the magnet body and the RH diffusion source are moved into contact with each other at least once or into and out of contact with each other at least once by rotating the processing chamber at a surface velocity of at least 0.01 m/s. and changing a point of contact between the sintered R-T-B based magnet body and the RH diffusion source and supplying the heavy rare-earth element RH from the RH diffusion source to the sintered R-T-B based magnet body via the point of contact between the sintered R-T-B based magnet body and the RH diffusion source; and

introducing a stirring aid member into the processing chamber before or during the RH diffusion process, the stirring aid member being made of zirconia, silicon nitride, silicon carbide, boron nitride, or any combination thereof; wherein

in the RH diffusion process, the processing chamber is heated by a heater that is arranged around an outer periphery of the processing chamber, the sintered R-T-B based magnet body and the RH diffusion source that are loaded into the processing chamber are also heated, and the temperature of the sintered R-T-B based magnet body and the RH diffusion source is maintained within a range of 500° C. to 850° C.

2. The method of claim 1 , wherein in the RH diffusion process, the heat treatment is carried out with an internal pressure of the processing chamber adjusted to 100 kPa or less.

3. The method of claim 1 , wherein the RH diffusion source has a shape of a sphere, an ellipsoid, or a circular cylinder.

4. A method for producing a sintered R-T-B based magnet, the method comprising the steps of:

providing a sintered R-T-B based magnet body;

providing an RH diffusion source including a metal or an alloy of a heavy rare-earth element RH, which is at least one selected from the group consisting of Dy and Tb;

loading the sintered R-T-B based magnet body and the RH diffusion source into a processing chamber so that the sintered R-T-B based magnet body and the RH diffusion source are movable relative to each other and brought into contact with each other;

performing an RH diffusion process by conducting a heat treatment on the sintered R-T-B based magnet body and the RH diffusion source at a temperature of 500° C. to 850° C. for at least 10 minutes by heating the processing chamber while moving the sintered R-T-B based magnet body and the RH diffusion source either continuously or discontinuously in the processing chamber by rotating the processing chamber at a surface velocity of at least 0.01 m/s, and changing a point of contact between the sintered R-T-B based magnet body and the RH diffusion source and supplying the heavy rare-earth element RH from the RH diffusion source to the sintered R-T-B based magnet body via the point of contact between the sintered R-T-B based magnet body and the RH diffusion source, and the heavy rare-earth element RH that is vaporized from the RH diffusion source is also supplied onto a surface of the sintered R-T-B based magnet body;

introducing a stirring aid member into the processing chamber before or during the RH diffusion process, the stirring aid member being made of zirconia, silicon nitride, silicon carbide, boron nitride, or any combination thereof; wherein

in the RH diffusion process, the processing chamber is heated by a heater that is arranged around an outer periphery of the processing chamber, the sintered R-T-B based magnet body and the RH diffusion source that are loaded into the processing chamber are also heated, and the temperature of the sintered R-T-B based magnet body and the RH diffusion source is maintained within a range of 500° C. to 850° C.

5. The method of claim 4 , wherein in the RH diffusion process, the heat treatment is carried out with an internal pressure of the processing chamber adjusted to 100 kPa or less.

Assignments (2)
CHANGE OF NAME Recorded Dec 27, 2023
From: HITACHI METALS, LTD.
To: PROTERIAL, LTD.
Reel/Frame 066130/0563 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 6, 2012
From: KUNIYOSHI, FUTOSHI
To: HITACHI METALS, LTD.
Reel/Frame 027491/0550 →