IP Library Granted Patent US 9,425,766
Granted Patent B2
US 9,425,766 · App. 13/390,115 · Granted Aug 23, 2016

Elastic wave element, and electrical apparatus and duplexer using same

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Quick Facts
Patent No.
US 9,425,766
App. No.
13/390,115
Granted
Aug 23, 2016
Kind
B2
Abstract

An acoustic wave device includes a piezoelectric substrate made of a lithium niobate material having the Euler angles (φ, θ, ψ), an electrode disposed on the piezoelectric substrate for exciting a major acoustic wave of a wavelength λ, and a protective layer disposed on the piezoelectric substrate to cover the electrode. The protective layer has a thickness greater than 0.27λ. The Euler angles satisfy −100°≦θ≦−60°; 1.193φ−2°≦ψ≦1.193φ+2°; and either ψ≦−2φ−3° or −2φ+3°≦ψ.

Claims (29)

1. An acoustic wave device comprising:

a piezoelectric substrate made of a lithium niobate material having Euler angles (φ, θ, ψ), the Euler angles satisfying conditions of −20°≦φ≦20°, −100°≦θ≦−60°, 1.193φ−2°≦ψ≦1.193φ+2°, and either ψ≦−2φ−3° or −2φ+3°≦ψ, the conditions simultaneously suppressing spurious transmissions derived from a Rayleigh wave and from a fast transverse wave excited in the piezoelectric substrate, the fast transverse wave being a fastest wave of transverse waves produced in the acoustic wave device;

an inter-digital transducer (IDT) electrode disposed on the piezoelectric substrate and configured to excite a major acoustic wave of a wavelength λ; and

a protective layer disposed on the piezoelectric substrate and covering the IDT electrode, the protective layer having a thickness greater than 0.27λ.

2. The acoustic wave device of claim 1 wherein the protective layer is made of a silicon oxide film.

3. A duplexer comprising:

a first filter; and

a second filter having a passing frequency range higher than a passing frequency range of the first filter, the first filter including the acoustic wave device of claim 1 .

4. An electronic apparatus comprising:

the acoustic wave device of claim 1 ; and

a semiconductor integrated circuit device connected to the acoustic wave device.

5. The acoustic wave device of claim 1 wherein the IDT electrode is copper and has a normalized thickness of 0.03λ.

6. The acoustic wave device of claim 1 wherein the piezoelectric substrate has a first thermal characteristic and the protective layer has a second thermal characteristic opposite to the first thermal characteristic.

7. An acoustic wave device comprising:

a piezoelectric substrate made of a lithium niobate material having Euler angles (φ, θ, ψ), the Euler angles satisfying, −20°≦φ≦20°, −100°≦θ≦−60°, 1.193φ−2°≦ψ≦1.193φ+2°, and either ψ≦−2φ−3° or −2φ+3°≦ψ,the conditions simultaneously suppressing spurious transmissions derived from a Rayleigh wave and from a fast transverse wave excited in the piezoelectric substrate, the fast transverse wave being a fastest wave of transverse waves produced in the acoustic wave device;

an inter-digital transducer (IDT) electrode disposed on the piezoelectric substrate and configured to excite a major acoustic wave of a wavelength λ; and

a protective layer disposed on the piezoelectric substrate and covering the IDT electrode, the protective layer having a thickness greater than 0.2λ and a projection disposed above an electrode finger of the IDT electrode, a width of a top of the projection being smaller than a width of the electrode finger of the IDT electrode.

8. The acoustic wave device of claim 7 wherein the projection of the protective layer has a curved side thereof projecting downwardly while extending from the top of the projection to a bottom of the projection.

9. The acoustic wave device of claim 7 wherein the width of the top of the projection is not greater than half of the width of the electrode finger of the IDT electrode.

10. The acoustic wave device of claim 7 wherein a center of the top of the projection is aligned substantially above a center of the electrode finger of the IDT electrode.

11. The acoustic wave device of claim 7 wherein a height T of the projection and a thickness h of the IDT electrode satisfies 0.03 λ<T≦h.

12. The acoustic wave device of claim 7 wherein the protective layer is made of a silicon oxide film.

13. A duplexer comprising:

a first filter; and

a second filter having a passing frequency range higher than a passing frequency range of the first filter, the first filter including the acoustic wave device of claim 7 .

14. An electronic apparatus comprising:

an acoustic wave device of claim 7 ; and

a semiconductor integrated circuit device connected to the acoustic wave device.

15. The acoustic wave device of claim 7 wherein the IDT electrode includes a plurality of electrode fingers, and the protective film includes a corresponding plurality of projections, each projection being aligned substantially above each electrode finger.

Assignments (4)
CHANGE OF NAME Recorded Oct 3, 2016
From: SKYWORKS PANASONIC FILTER SOLUTIONS JAPAN CO., LTD.
To: SKYWORKS FILTER SOLUTIONS JAPAN CO., LTD.
Reel/Frame 040209/0113 →
CHANGE OF NAME Recorded Sep 13, 2016
From: SKYWORKS PANASONIC FILTER SOLUTIONS JAPAN CO., LTD.
To: SKYWORKS FILTER SOLUTIONS JAPAN CO., LTD.
Reel/Frame 040022/0829 →
ASSIGNMENT AND ACKNOWLEDGMENT Recorded May 12, 2015
From: PANASONIC CORPORATION
To: SKYWORKS PANASONIC FILTER SOLUTIONS JAPAN CO., LTD.
Reel/Frame 035649/0570 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 20, 2012
From: FUJIWARA, JOJI; HAMAOKA, YOSUKE; TSURUNARI, TETSUYA; NAKANISHI, HIDEKAZU; NAKAMURA, HIROYUKI
To: PANASONIC CORPORATION
Reel/Frame 028078/0455 →