JOINED STRUCTURE, METHOD FOR PRODUCING THE SAME, AND ANISOTROPIC CONDUCTIVE FILM USED FOR THE SAME
A joined structure of the present invention including a first substrate having a wiring thereon, any one of a second substrate and an electronic part, and an anisotropic conductive film containing conductive particles, wherein the first substrate and any one of the second substrate and the electronic part are electrically joined via the anisotropic conductive film, and wherein the conductive particles pressure-bonded to the wiring of the first substrate protrude from both edges of the wiring in a width direction, and an interval of the wiring is 3.5 times or more larger than an average particle diameter of the conductive particles which are not pressure-bonded to the wiring.
1 . A method for producing a joined structure, comprising:
forming an anisotropic conductive film on a surface to be processed; and
joining a first substrate and any one of a second substrate and an electronic part via the anisotropic conductive film,
wherein the joined structure comprises:
the first substrate having a wiring thereon;
any one of the second substrate and the electronic part; and
the anisotropic conductive film containing conductive particles,
wherein the first substrate and any one of the second substrate and the electronic part are electrically joined via the anisotropic conductive film, and
wherein the conductive particles pressure-bonded to the wiring of the first substrate protrude from both edges of the wiring in a width direction, and an interval of the wiring is 3.5 times or more larger than an average particle diameter of conductive particles which are not pressure-bonded to the wiring.