Ion injection simulation method, ion injection simulation device, method of producing semiconductor device, and method of designing semiconductor device

1. An ion injection simulation method comprising the steps of:

calculating an impurity concentration distribution based on a distribution function of an initial impurity injection into a substrate and a structure on the substrate; and

calculating a reinjection dose for reinjection into a side face of the structure on the substrate after the initial impurity injection based on the impurity concentration distribution; and

re-calculating the impurity concentration distribution based on the distribution function of the initial impurity injection and the reinjection dose.

2. The ion injection simulation method according to claim 1 , wherein the impurity concentration distribution in the substrate or the structure is calculated from the initial impurity injection into the substrate and the structure, and the reinjection dose is calculated from the impurity concentration distribution disposed outside an area on the side face of the structure by a transverse distribution of impurities in the substrate or the structure.

3. The ion injection simulation method according to claim 2 , further comprising the steps of:

setting a reinjection start point on the side face, and

calculating the reinjection dose from the reinjection start point.

4. The ion injection simulation method according to claim 3 , wherein the reinjection dose is calculated in order from the reinjection start point defined at a high position in a direction perpendicular to a face of the substrate.

5. The ion injection simulation method according to claim 2 , further comprising the step of:

setting a reinjection angle of the reinjection dose using the distribution function; and

dividing the reinjection dose into an amount corresponding to the reinjection angle.

6. The ion injection simulation method according to claim 2 , further comprising the steps of:

setting a reinjection energy of the reinjection dose using the distribution function; and

dividing the reinjection dose into an amount corresponding to the reinjection energy.

7. The ion injection simulation method according to claim 2 , further comprising the steps of:

dividing the reinjection dose amount for the reinjection angle using the distribution function and then dividing the reinjection dose amount for the reinjection energy; or

dividing the reinjection dose amount for the reinjection energy using the distribution function and then dividing the reinjection dose amount for the reinjection angle.

8. An ion injection simulation device comprising:

a storage unit configured to store a distribution function and parameters; and

a calculation unit configured to calculate a reinjection dose into a side surface of a structure based on an impurity concentration injected into a substrate and the structure on the substrate using the distribution function and parameters of the impurity concentration.

9. A method of producing a semiconductor device, the method comprising the steps of:

forming a pattern of a structure on a semiconductor substrate; and

injecting ions from the structure to the semiconductor substrate,

wherein,

the injecting ion step further comprises(a) an impurity concentration distribution calculated based on a distribution function of an initial impurity injection into a substrate and a structure on the substrate; and (b) a reinjection dose for reinjection into a side face of the structure on the substrate after the initial impurity injection calculated based on the impurity concentration distribution.

10. A method of designing a semiconductor device, the method comprising the steps of:

calculating an impurity concentration distribution based on a distribution function of an initial impurity injection into a substrate and a structure on the substrate; and

calculating a reinjection dose for reinjection into a side face of the structure on the substrate after the initial impurity injection based on the impurity concentration distribution; and

re-calculating the impurity concentration distribution based on the distribution function of the initial impurity injection and the reinjection dose

calculating a reinjection dose from a distribution function of an impurity concentration injected into a substrate and a structure on the substrate; and.