Three-dimensional semiconductor device
A three-dimensional semiconductor device using redundant bonding-conductor structures to make inter-level electrical connections between multiple semiconductor chips is disclosed. A first chip, or other semiconductor substrate, forms a first active area on its upper surface, and a second chip or other semiconductor substrate forms a second active area on its upper surface. According to the present invention, when the second chip has been mounted above the first chip, either face-up or face-down, the first active area is coupled to the second active area by at least one redundant bonding-conductor structure. In one embodiment, each redundant bonding-conductor structure includes at least one via portion that extends completely through the second chip to perform this function. In another, the redundant bonding-conductor structure extends downward to the top level interconnect. The present invention also includes a method for making such a device.
1. A method comprising:
forming a redundant bonding-conductor structure through a first surface of a first substrate, the redundant bonding-conductor structure comprising more than one pad and/or more than one via, the redundant bonding-conductor structure comprising at least one pad and at least one via, each pad of the redundant bonding-conductor structure being at the first surface of the first substrate, and each via of the redundant bonding-conductor structure extending from a respective pad of the redundant bonding-conductor structure into the first substrate;
exposing the at least one via of the redundant bonding-conductor structure through a second surface of the first substrate, the second surface being opposite the first surface; and
bonding the second surface of the first substrate to a second substrate, a first active area of the second substrate being electrically coupled to the redundant bonding-conductor structure.
2. The method of claim 1 , wherein the redundant bonding-conductor structure comprises more than one via exposed through the second surface.
3. The method of claim 1 , wherein the redundant bonding-conductor structure comprises more than one pad.
4. The method of claim 1 , wherein the redundant bonding-conductor structure comprises more than one via and more than one pad.
5. The method of claim 1 , wherein the exposing comprises thinning the first substrate to the second surface.
6. The method of claim 1 further comprising bonding a third substrate to the first surface of the first substrate, a second active area of the third substrate being electrically coupled to the redundant bonding-conductor.
7. The method of claim 1 , wherein the at least one via has a substantially circular cross-section.
8. The method of claim 1 , wherein the at least one via has a non-circular cross-section.
9. A method comprising:
etching a redundant-conductor recess in a first surface of a first substrate, the redundant-conductor recess comprising more than one pad recess and/or more than one via recess, the redundant-conductor recess comprising at least one pad recess and at least one via recess, each pad recess of the redundant-conductor recess being at the first surface, and each via recess of the redundant-conductor recess extending from a respective pad recess of the redundant-conductor recess into the first substrate;
depositing a conductor in the redundant-conductor recess thereby forming a redundant-conductor structure in the first substrate, the redundant-conductor structure comprising more than one pad and/or more than one via, the redundant-conductor structure comprising at least one pad and at least one via, each pad of the redundant-conductor structure being formed in a respective one pad recess of the redundant-conductor recess at the first surface of the first substrate, each via of the redundant-conductor structure being formed in a respective one via recess of the redundant-conductor recess extending into the first substrate;
exposing the at least one via of the redundant-conductor structure distal from the first surface; and
stacking the first substrate on a second substrate, the at least one via of the redundant-conductor structure being directly coupled to an area of the second substrate.
10. The method of claim 9 , wherein the redundant-conductor recess comprises more than one via recess.
11. The method of claim 9 , wherein the exposing the at least one via comprises thinning the first substrate.
12. The method of claim 9 further comprising bonding a third substrate to the first substrate, the first substrate being disposed between the third substrate and the second substrate.
13. A method comprising:
forming a first active area on a first chip;
forming a second active area on a second chip; and
forming a redundant bonding-conductor structure in the first chip, the redundant bonding-conductor structure comprising more than one pad and/or more than one via, the redundant bonding-conductor structure comprising at least one pad and at least one via, each pad of the redundant bonding-conductor structure being at a first surface of the first chip, each via of the redundant bonding-conductor structure extending from a respective pad of the redundant bonding-conductor structure to a second surface of the first chip, the first surface and the second surface being opposing surfaces of the first chip, the redundant bonding-conductor structure electrically coupling the first active area to the second active area.
14. The method of claim 13 , wherein the forming the redundant bonding-conductor structure includes forming a plurality of vias.
15. The method of claim 13 , wherein the redundant bonding-conductor structure includes more than one pad.
16. The method of claim 13 , wherein the redundant bonding-conductor structure comprises at least two pads and at least two vias.
17. The method of claim 13 , wherein the forming the redundant bonding-conductor structure includes thinning the first chip.
18. The method of claim 13 further comprising:
forming a third active area on a third chip; and
coupling the third active area to the redundant bonding-conductor structure.