Resistance heater
View Patent ↗A resistance heater is shown and described. The resistance heater may include a body. The body may include at least one heating surface, the heating surface being generally smooth and generally flat and a recess formed in the body, at least a portion of the body having a cross-sectional shape selected from the group consisting of: generally U shape, generally I-shape, and generally H-shape, and where the cross-sectional shape extends along at least a portion of the body.
1. A resistance heater comprising:
a body comprising:
at least one heating surface defined by the body, the heating surface being generally smooth and generally flat;
a recess formed in at least a portion of the body, wherein the portion has a cross-sectional shape selected from the group consisting of: generally U shape, generally I-shape, and generally H-shape; and
wherein the cross-sectional shape extends along at least a portion of the length of the body.
2. The resistance heater of claim 1 , wherein the cross-sectional shape extends along a majority of the length of the body.
3. The resistance heater of claim 1 , wherein the body further includes first and second end portions and wherein the recess is not formed in the first and second end portions.
4. The resistance heater of claim 3 wherein the first and second end portions include a terminal connecting hole.
5. The resistance heater of claim 4 , wherein the first and second end portions have substantially identical width to a heating area defined between the first and second end portions, and said recess is not formed at the first and second end portions.
6. The resistance heater of claim 1 , wherein the body has a substantially uniform width along the length.
7. The resistance heater of claim 1 wherein the body is fabricated from at least one of graphite and ceramic material.
8. The resistance heater of claim 1 wherein the body is coated with at least one of pBN and SiC.
9. A method for processing a semiconductor wafer comprising the steps of:
a) providing a resistance heater having a body having at least one heating surface defined by the body, the heating surface being generally smooth and generally flat; a recess formed in at least a portion of the body, wherein the portion has a generally horizontally symmetrical cross-sectional shape; and wherein the cross-sectional shape extends along at least a portion of the length of the body;
b) supporting a semiconductor wafer on the at least one heating surface;
c) applying an electric current to the heater; and
d) heating the semiconductor wafer to a predetermined temperature.
10. The method of claim 9 , wherein the body further includes first and second end portions and wherein the recess is not formed in the first and second end portions.
11. The method of claim 10 wherein the first and second end portions include a terminal connecting hole.
12. The method of claim 11 , wherein the first and second end portions have substantially identical width to a heating area defined between the first and second end portions, and said recess is not formed at the first and second end portions.
13. The method of claim 9 wherein the body is coated with at least one of pBN and SiC.
14. A resistance heater comprising:
a body comprising:
at least one heating surface defined by the body, the heating surface being generally smooth and generally flat;
a recess formed in at least a portion of the body, wherein the portion has a generally horizontally symmetrical cross-sectional shape; and
wherein the cross-sectional shape extends along at least a portion of the length of the body.
15. The resistance heater of claim 14 , wherein the cross-sectional shape of at least a portion the body is generally I-shaped or H-shaped.
16. The resistance heater of claim 14 , wherein recess is formed in portions of both first and second surfaces of the body forming a generally I-shaped cross-sectional shape.
17. The resistance heater of claim 16 , wherein the first and second surfaces are top and bottom surfaces of the body, respectively.
18. The resistance heater of claim 14 , wherein recess is formed in portions of both first and second surfaces of the body forming a generally H-shaped cross-sectional shape.
19. The resistance heater of claim 18 , wherein the first and second surfaces are opposite side surfaces of the body.
20. The resistance heater of claim 14 , wherein the body has a substantially uniform width along its length.
21. The method of claim 9 , wherein the cross-sectional shape of at least a portion of the body is selected from the group consisting of: generally U shape, generally I-shape, and generally H-shape.
22. The method of claim 21 , wherein the cross-sectional shape comprises a majority of the length of the body.