Evaporative systems and methods for dampening fluid control in a digital lithographic system
View Patent ↗A system and corresponding methods are disclosed for controlling the thickness of a layer of dampening fluid applied to a reimageable surface of an imaging member in a variable data lithography system. Following deposition of the dampening fluid layer, a gas is passed over a region of the fluid layer prior to pattern forming. The gas causes a controlled amount of the dampening fluid layer to evaporate such that the remaining layer is of a desired and controlled thickness. Among other advantages, improved print quality is obtained.
1. An evaporative thickness control subsystem for controlling the thickness of a dampening fluid layer in a variable data lithography system of the type in which the dampening fluid layer is applied by a dampening fluid subsystem over a reimageable surface of an imaging member, comprising:
a gas source;
a gas-directing nozzle, communicatively coupled to said gas source, configured to be disposed proximate said reimageable surface, and further disposed in a direction of travel of said imaging member following said dampening fluid subsystem and before an optical patterning system for patterning said dampening fluid layer,
wherein said gas-directing nozzle configured to direct a gas from said source in a direction toward a surface of said dampening fluid layer such that a portion of said dampening fluid layer may be caused to evaporate to obtain a dampening layer of a desired thickness;
a thickness sensor for determining the thickness of said dampening fluid layer at a location following said gas-directing nozzle; and
a barrier structure configured to be disposed between said gas-directing nozzle and said optical patterning subsystem in the direction of travel of said imaging member to prevent evaporated dampening fluid from settling on said dampening fluid layer following evaporation and to otherwise prevent disturbing the dampening fluid layer between the point of evaporation and the optical patterning subsystem.
2. The evaporative thickness control subsystem of claim 1 , further comprising a valve disposed between said gas source and said gas-directing nozzle and regulating the flow of gas to said gas-directing nozzle to thereby control the extent of evaporation of said dampening fluid.
3. The evaporative thickness control subsystem of claim 2 , further comprising:
a controller communicatively coupled to said thickness sensor and said valve such that said thickness determined by said thickness sensor is compared to a target thickness and in response to said comparison said controller provides a signal to said valve to adjust the flow of said gas to said nozzle to thereby control the extent of evaporation of said dampening fluid;
wherein said controller is communicatively coupled to a control mechanism for actuating, in response to said comparison of said thickness and said target thickness, an apparatus for controlling aspects of the extent of evaporation of said dampening fluid layer selected from the group consisting of:
an apparatus that controls spacing between said gas-directing nozzle and said reimageable surface;
an apparatus that controls a temperature of the gas flowing to and through said gas-directing nozzle;
an apparatus that controls the humidity of the gas flowing to and through said gas-directing nozzle;
an apparatus that controls temperature of an ambient proximate said reimageable surface;
an apparatus that controls humidity of an ambient proximate said reimageable surface;
an apparatus that controls temperature of the reimageable surface; and,
an apparatus that controls exposure time of the dampening fluid to the gas exiting said gas-directing nozzle.
4. The evaporative thickness control subsystem of claim 1 , wherein said gas source is selected from the group consisting of: a gas generator, and a gas storage container.
5. The evaporative thickness control subsystem of claim 1 , wherein said gas is air and said gas source is a region of the ambient remote from said reimageable surface.
6. The evaporative thickness control subsystem of claim 1 , further comprising a pressure source communicatively coupled to said gas source and said gas directing nozzle to provide transport pressure to the gas.
7. The evaporative thickness control subsystem of claim 1 , further comprising an extraction subsystem for extracting evaporated dampening fluid from a region proximate said dampening fluid layer.
8. The evaporative thickness control subsystem of claim 7 , further comprising a reservoir, communicatively coupled to said extraction subsystem, for collecting and recycling evaporated dampening fluid extracted from said region proximate said dampening fluid layer for reuse by said dampening fluid subsystem.
9. An evaporative thickness control subsystem for controlling the thickness of a dampening fluid layer in a variable data lithography system of the type in which the dampening fluid layer is applied by a dampening fluid subsystem over a reimageable surface of an imaging member, comprising:
a gas source;
a gas-directing nozzle, communicatively coupled to said gas source by way of a valve, configured to be disposed proximate said reimageable surface, and further disposed in a direction of travel of said imaging member following said dampening fluid subsystem and before an optical patterning system for patterning said dampening fluid layer, said gas-directing nozzle configured to direct a gas from said source in a direction toward a surface of said dampening fluid layer such that a portion of said dampening fluid layer may be caused to evaporate to obtain a dampening layer of a desired thickness;
a thickness sensor for determining the thickness of said dampening fluid layer at a location following said gas directing nozzle;
a controller communicatively coupled to said thickness sensor and said valve such that said thickness determined by said thickness sensor is compared to a target thickness and in response to said comparison said controller provides a signal that may be used to control the extent of evaporation of said dampening fluid; and
a barrier structure configured to be disposed between said gas-directing nozzle and said optical patterning subsystem in the direction of travel of said imaging member to prevent evaporated dampening fluid from settling on said dampening fluid layer following evaporation and to otherwise prevent disturbing the dampening fluid layer between the point of evaporation and the optical patterning subsystem.
10. The evaporative thickness control subsystem of claim 9 , wherein said controller is communicatively coupled to a control mechanism for actuating, in response to said comparison of said thickness and said target thickness, an apparatus for controlling aspects of the extent of evaporation of said dampening fluid layer selected from the group consisting of:
an apparatus that controls spacing between said gas-directing nozzle and said reimageable surface;
an apparatus that controls a temperature of the gas flowing to and through said gas-directing nozzle;
an apparatus that controls the humidity of the gas flowing to and through said gas-directing nozzle;
an apparatus that controls temperature of an ambient proximate said reimageable surface;
an apparatus that controls humidity of an ambient proximate said reimageable surface;
an apparatus that controls temperature of the reimageable surface; and,
an apparatus that controls exposure time of the dampening fluid to the gas exiting said gas-directing nozzle;
wherein the valve controls the volume of gas that may flow through said nozzle.
11. The evaporative thickness control subsystem of claim 9 , further comprising: an extraction subsystem for extracting evaporated dampening fluid from a region proximate said dampening fluid layer; and
a reservoir, communicatively coupled to said extraction subsystem, for collecting and recycling evaporated dampening fluid extracted from said region proximate said dampening fluid layer for reuse by said dampening fluid subsystem.
12. A variable data lithography system, comprising:
an imaging member having an arbitrarily reimageable imaging surface;
a dampening fluid subsystem for applying a layer of dampening fluid to said imaging surface;
a patterning subsystem for selectively removing portions of the dampening fluid layer so as to produce an image in the dampening fluid;
an evaporative thickness control subsystem, comprising: a gas source; and
a gas-directing nozzle, communicatively coupled to said gas source, disposed proximate said reimageable surface, and further disposed in a direction of travel of said imaging member following said dampening fluid subsystem and before said patterning system, said gas-directing nozzle configured to direct a gas from said source in a direction toward a surface of said dampening fluid layer such that a portion of said dampening fluid layer may be caused to evaporate to obtain a dampening layer of a desired thickness;
a thickness sensor for determining the thickness of said dampening fluid layer at a location following said gas-directing nozzle;
a barrier structure disposed between said gas-directing nozzle and an optical patterning subsystem in the direction of travel of said imaging member to prevent evaporated dampening fluid from settling on said dampening fluid layer following evaporation and to otherwise prevent disturbing the dampening fluid layer between the point of evaporation and the optical patterning subsystem;
an inking subsystem for applying ink over the imaging surface such that said ink selectively occupies regions where dampening fluid was removed by the patterning subsystem to thereby form an inked image;
an image transfer subsystem for transferring the inked image to a substrate; and
a cleaning subsystem for removing residual ink and dampening fluid from the reimageable imaging surface.
13. A subsystem for controlling the thickness of a dampening fluid layer in a variable data lithography system of the type in which the dampening fluid layer is applied by a dampening fluid subsystem over a reimageable surface of an imaging member, comprising:
a dampening fluid reservoir configured to provide said dampening fluid to said reimageable surface;
a gas source;
a gas-directing nozzle, communicatively coupled to said gas source by way of a valve, to direct a gas from said gas source in a direction toward a surface of said dampening fluid layer such that a portion of said dampening fluid layer may be caused to evaporate to obtain a dampening layer of a desired thickness;
a pressure source communicatively coupled to said gas source and said gas directing nozzle to provide transport pressure to the gas;
an extraction subsystem for extracting evaporated dampening fluid from a region proximate said dampening fluid layer;
said reservoir being communicatively coupled to said extraction subsystem for collecting and recycling evaporated dampening fluid extracted from said region proximate said dampening fluid layer for reuse by said dampening fluid subsystem;
a thickness sensor for determining the thickness of said dampening fluid layer at a location following said gas directing nozzle;
a barrier structure configured to be disposed between said gas directing nozzle and an optical patterning subsystem in the direction of travel of said imaging member to prevent evaporated dampening fluid from settling on said dampening fluid layer following evaporation and to otherwise prevent disturbing the dampening fluid layer between the point of evaporation and the optical patterning subsystem; and
a controller communicatively coupled to said thickness sensor and said valve such that said thickness determined by said thickness sensor is compared to a target thickness and in response to said comparison said controller provides a signal to said valve to adjust the flow of said gas to said nozzle to thereby control the extent of evaporation of said dampening fluid.
14. The subsystem of claim 13 , wherein said gas source is selected from the group consisting of: a gas generator, and a gas storage container.