Photoresist composition for color filter and method for forming color filter

1. A photoresist composition for a color filter, comprising:

a) a coloring agent, b) a binder resin, c) a photopolymerization initiator, d) a photopolymerizable monomer, and e) a solvent,

wherein a siloxane-based material is bonded to the binder resin by a silicon-oxygen (Si—O) linkage, and wherein the coloring agent is covalently bonded to the binder resin.

2. The photoresist composition for a color filter of claim 1 , wherein:

the siloxane-based material is represented by the following Formula 1:

(R1, R2, and R3 are each independently selected from the group consisting of hydrogen (H), NO2, OH, and an alkyl group).

3. The photoresist composition for a color filter of claim 2 , wherein:

the coloring agent comprises a dye-based material.

4. The photoresist composition for a color filter of claim 1 , wherein:

the siloxane-based material is bonded to the photopolymerizable monomer.

5. The photoresist composition for a color filter of claim 4 , wherein:

the dye-based coloring agent comprises at least one selected from the group consisting of the compounds represented by the following Formula A, Formula B, Formula C, Formula D, Formula E, Formula F, Formula G, Formula H, and Formula I:

(R′, R″, R″′, and R″″ each independently includes at least one selected from the group consisting of an alkyl group, a nitro group, a carbonyl group, an azo group, —C═C—, —C═N—, —C═S—, —N═O—, —OH, —NH 2 , and —COOH).

6. The photoresist composition for a color filter of claim 1 , wherein: the binder resin to which the siloxane-based material and the coloring agent are bonded is cured at a temperature of 200° C. or less.