Vapor deposition apparatus, vapor deposition method, and method of manufacturing organic light-emitting display apparatus
View Patent ↗A vapor deposition apparatus and method for efficiently performing a deposition process to form a thin film with improved characteristics on a substrate, and a method of manufacturing an organic light-emitting display apparatus. The vapor deposition apparatus includes a chamber including an exhaust port; a stage disposed in the chamber, and including a mounting surface on which the substrate is to be disposed; an injection portion including at least one injection opening through which a gas is injected in a direction parallel with a surface of the substrate on which the thin film is to be formed; and a plasma generator disposed apart from the substrate to face the substrate.
1. A vapor deposition method of forming a thin film on a substrate, the vapor deposition method comprising:
mounting the substrate on a mounting surface of a movable stage disposed in a chamber;
injecting a source gas toward a space between the substrate and a movable plasma generator disposed to face the substrate via an injection portion and in a direction parallel with a surface of the substrate on which the thin film is to be deposited;
performing an exhaust process by using an exhaust port of the chamber;
generating plasma by using the plasma generator to discharge the plasma toward the substrate;
performing another exhaust process by using the exhaust port of the chamber; and
moving both the plasma generator and the stage with the substrate mounted thereon,
wherein the mounting surface is positioned in parallel with a direction in which a gravitational force acts.
2. The vapor deposition method of claim 1 , wherein the plasma generator comprises:
a supply portion;
a first plasma electrode;
a second plasma electrode spaced apart from the first plasma electrode; and
an outlet,
wherein a reaction gas is supplied to the plasma generator via the supply portion, is changed into plasma via the first and second plasma electrodes, and is then discharged toward the substrate via the outlet of the plasma generator.
3. The vapor deposition method of claim 1 , wherein a reaction gas is supplied to the plasma generator via the injection portion, is changed into plasma via the plasma generator, and is then discharged toward the substrate.
4. The vapor deposition method of claim 3 , wherein the injection portion comprises an injection hole, and
the source gas and the reaction gas are sequentially injected via the injection hole.
5. The vapor deposition method of claim 3 , wherein the injection portion comprises a plurality of injection holes, and
the source gas and the reaction gas are injected via different injection holes.
6. The vapor deposition method of claim 1 , wherein the exhaust process is performed using a pump.
7. The vapor deposition method of claim 1 , wherein the mounting of the substrate comprises disposing a mask on the substrate, wherein the mask has apertures for depositing the thin film in a desired pattern on the substrate.
8. The vapor deposition method of claim 1 , wherein a deposition process is performed while the substrate mounted on the stage is moved concurrently with the plasma generator within the chamber in a direction perpendicular to the surface of the substrate on which the thin film is to be deposited.
9. The vapor deposition method of claim 1 , wherein the stage comprises a plurality of mounting surfaces,
wherein, during the mounting of the substrate on the stage, a plurality of substrates are respectively mounted on the plurality of mounting surfaces of the stage.
10. The vapor deposition method of claim 9 , wherein a plurality of plasma generators are disposed to correspond to the plurality of substrates.
11. A method of manufacturing an organic light-emitting display apparatus in which a thin film is formed on a substrate, and comprising a first electrode, a second electrode, and an intermediate layer having an organic emission layer between the first electrode and the second electrode, the method comprising:
mounting the substrate on a mounting surface of a movable stage disposed in a chamber;
injecting a source gas toward a space between the substrate and a movable plasma generator disposed to face the substrate via an injection portion and in a direction parallel with a surface of the substrate on which the thin film is to be deposited;
performing an exhaust process by using an exhaust port of the chamber;
generating plasma by using the plasma generator to discharge the plasma toward the substrate to form a layer of the thin film;
performing another exhaust process by using the exhaust port of the chamber; and
moving both the plasma generator and the stage with the substrate mounted thereon,
wherein the mounting surface is positioned in parallel with a direction in which a gravitational force acts.
12. The method of claim 11 , wherein the method forms an encapsulating layer on the second electrode.
13. The method of claim 11 , wherein the layer of the thin film is an insulating layer.
14. The method of claim 11 , wherein the layer of the thin film is a conductive layer.