IP Library Granted Patent US 8,675,323
Granted Patent B2
US 8,675,323 · App. 13/432,464 · Granted Mar 18, 2014

Method of manufacturing a package

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Quick Facts
Patent No.
US 8,675,323
App. No.
13/432,464
Granted
Mar 18, 2014
Kind
B2
Abstract

Provided is an ESD protection circuit for CDM capable of preventing a high current from flowing and preventing breakage when a battery is connected with reverse polarity. The ESD protection circuit employs a circuit configuration in which transistor elements are interposed in series to OFF transistors ( 11 and 13 ) included in the ESD protection circuit for CDM so that parasitic diodes of the transistor elements are connected to parasitic diodes of the OFF transistors in a reverse direction.

Claims (19)

1. An ESD protection circuit for a semiconductor integrated circuit comprising at least a positive power supply terminal, a negative power supply terminal, an input terminal, and an internal circuit being connected to the input terminal,

the ESD protection circuit comprising:

an N-channel transistor including a gate, a source, and a substrate each connected to the negative power supply terminal; and

a first P-channel transistor including a gate connected to the negative power supply terminal, a drain connected to a gate of the internal circuit, and a source and a substrate each connected to a drain of the N-channel transistor, the source including a P-N junction, such that a parasitic diode resides between the source and the drain that is forward biased from the drain to the source.

2. An ESD protection circuit according to claim 1 , wherein the N-channel transistor and the first P-channel transistor each have a width of 50 μm or less.

3. An ESD protection circuit for a semiconductor integrated circuit comprising at least a positive power supply terminal, a negative power supply terminal, an input terminal, and an internal circuit being connected to the input terminal,

the ESD protection circuit comprising:

a N-channel transistor including a gate, a source, and a substrate each connected to the negative power supply terminal;

a first P-channel transistor including a gate connected to the negative power supply terminal, a drain connected to a gate of the internal circuit, and a source and a substrate each connected to a drain of the N-channel transistor, the source including a P-N junction, such that a parasitic diode resides between the source and the drain that is forward biased from the drain to the source;

a second P-channel transistor including a gate connected to the positive power supply terminal and a drain connected to the gate of the internal circuit; and

a third P-channel transistor including a gate connected to the gate of the internal circuit, a drain connected to the positive power supply terminal, and a source and a substrate each connected to a source and a substrate of the second P-channel transistor, the source including a P-N junction, such that a parasitic diode resides between the source and the drain that is forward biased from the drain to the source.

4. An ESD protection circuit according to claim 3 , wherein the N-channel transistor and the first P-channel transistor each have a width of 50 μm or less.

5. An ESD protection circuit for a semiconductor integrated circuit comprising at least a positive power supply terminal, a negative power supply terminal, an input terminal, and an internal circuit being connected to the input terminal,

the ESD protection circuit comprising:

an N-channel transistor including a gate, a source, and a substrate which are connected to the negative power supply terminal;

a first P-channel transistor including a gate connected to the negative power supply terminal, a drain connected to a gate of the internal circuit, and a source and a substrate each connected to a drain of the N-channel transistor, the source including a P-N junction, such that a parasitic diode resides between the source and the drain that is forward biased from the drain to the source;

a second P-channel transistor including a gate, a source, and a substrate each connected to the positive power supply terminal; and

a third P-channel transistor including a gate, a source, and a substrate each connected to the gate of the internal circuit, and a drain connected to a drain of the second P-channel transistor, the source including a P-N junction, such that a parasitic diode resides between the source and the drain that is forward biased from the drain to the source.

6. An ESD protection circuit according to claim 5 , wherein the N-channel transistor and the first P-channel transistor each have a width of 50 μm or less.

Assignments (5)
CHANGE OF ADDRESS Recorded Jun 8, 2023
From: ABLIC INC.
To: ABLIC INC.
Reel/Frame 064021/0575 →
CHANGE OF NAME Recorded Mar 12, 2018
From: SII SEMICONDUCTOR CORPORATION
To: ABLIC INC.
Reel/Frame 045567/0927 →
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED AT REEL: 037783 FRAME: 0166. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Feb 23, 2016
From: SEIKO INSTRUMENTS INC
To: SII SEMICONDUCTOR CORPORATION
Reel/Frame 037903/0928 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 11, 2016
From: SEIKO INSTRUMENTS INC
To: SII SEMICONDUCTOR CORPORATION .
Reel/Frame 037783/0166 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 28, 2012
From: SUDO, MINORU
To: SEIKO INSTRUMENTS INC.
Reel/Frame 027948/0147 →