Fluorinated sol-gel low refractive index hybrid optical cladding and electro-optic devices made therefrom
View Patent ↗A low index of refraction hybrid optical cladding may be formed from a fluorinated sol-gel. An electro-optic device may include a poled organic chromophore-loaded modulation layer (electro-optic polymer) and at least one adjacent fluorinated hybrid sol-gel cladding layer.
1. A method for making an optical cladding, comprising:
forming a monomer mixture including
in the molar ratio n 1 :n 2 :n 3 , respectively,
where:
M is Si, Ti, Al, Zr, or B,
OR is a hydrolysable group,
R 1 is an organic crosslinker,
R 2 is a fluorinated organic group or fluorine, and
n 1 , n 2 , and n 3 are each between 1 and 10;
applying the monomer mixture to be disposed adjacent to an electro-optic polymer layer including a poled chromophore;
exposing the monomer mixture to hydrolysis conditions; and
gelling and crosslinking the monomer mixture to form an optical cladding layer adjacent to the electro-optic polymer layer;
wherein the optical cladding layer does not include the poled chromophore.
2. The method for making an optical cladding of claim 1 , wherein M is Si.
3. The method for making an optical cladding of claim 1 , wherein (n 1 +n 2 )>n 3 .
4. The method for making an optical cladding of claim 1 , wherein n 1 is about 4, n 2 is 1, and n 3 is about 2.
5. The method for making an optical cladding of claim 1 , wherein n 1 is about 2, n 2 is 1, and n 3 is about 2.
6. The method for making an optical cladding of claim 1 , wherein n 1 is about 2, n 2 is 1, and n 3 is about 1.
7. The method for making an optical cladding of claim 1 , wherein R is, independently at each occurrence, —CH 3 , —CH 2 CH 3 , —CH(CH 3 ) 2 , or —O(CH 2 ) n —CH 3 where n is two or more.
8. The method for making an optical cladding of claim 1 , wherein R 1 comprises an epoxy or an acrylate.
9. The method for making an optical cladding of claim 8 , wherein R 1 comprises:
where R 3 , R 4 , and R 5 are alkyl or aromatic groups.
10. The method for making an optical cladding of claim 1 , wherein R 2 comprises:
—F, —CH 2 —CH 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 3 , —CH 2 —CH 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 3 , or
11. The method for making an optical cladding of claim 1 , wherein gelling and crosslinking the monomer mixture forms an optical cladding layer comprising the structure
wherein R 1 ′ is an organic crosslinkage formed by the organic crosslinker R 1 .
12. The method for making an optical cladding of claim 1 , wherein gelling and crosslinking the monomer mixture forms an optical cladding layer comprising the structure
wherein R is a residual unhydrolised group, and
R 1 ′ is an organic crosslinkage formed by the organic crosslinker R 1 .
13. The method for making an optical cladding of claim 1 , wherein the monomer mixture further comprises 3% or less of a lithium salt.
14. The method for making an optical cladding of claim 1 , wherein forming the monomer mixture includes adding the monomers sequentially or simultaneously to a solvent or adding the solvent to one or more of the monomers.
15. The method for making an optical cladding of claim 14 , further comprising:
applying the monomer mixture or a partially gelled monomer mixture over a semiconductor, glass, or semiconductor-on-glass wafer;
wherein gelling and crosslinking the monomer mixture further comprises:
applying heat, spin drying, or vacuum evaporation to drive off at least a portion of the solvent; and
applying heat, ultraviolet radiation, or heat and ultraviolet radiation to perform, increase, or complete the crosslinking and gelling to form a mechanically tough, optically transparent optical cladding having a thickness between 10 nanometers and 100 micrometers.
16. The method for making an optical cladding of claim 15 , wherein applying the monomer mixture or a partially gelled monomer mixture over a semiconductor, glass, or semiconductor-on-glass wafer includes spin coating, spraying, or dipping the monomer mixture or partially gelled monomer mixture over an electro-optic polymer.
17. The method for making an optical cladding of claim 15 , further comprising:
filtering or centrifuging the monomer mixture or partially gelled monomer mixture to substantially prevent any nonhomogeneity from being applied to the wafer surface.
18. The method for making an optical cladding of claim 14 , wherein the solvent includes water.
19. The method for making an optical cladding of claim 14 , further comprising adding the monomer mixture to a catalyst or adding the catalyst to the monomer mixture.
20. An optical cladding formed from a monomer mixture comprising:
in the ratio n 1 :n 2 :n 3 , respectively,
wherein:
M is Si, Ti, Al, Zr, or B,
R is a hydrolysable group,
R 1 is an organic crosslinker,
R 2 is a fluorinated organic group or fluorine, and
n 1 , n 2 , and n 3 are each between 1 and 10;
wherein the optical cladding is disposed adjacent to an optical core including a poled chromophore;
wherein the optical cladding does not contain the poled chromophore; and
wherein the optical cladding is configured to guide light at an infrared wavelength along the optical core.
21. The optical cladding of claim 20 , wherein M is Si.
22. The optical cladding of claim 20 , wherein (n 1 +n 2 )>n 3 .
23. The optical cladding of claim 20 , wherein n 1 is about 4, n 2 is 1, and n 3 is about 2.
24. The optical cladding of claim 20 , wherein n 1 is about 2, n 2 is 1, and n 3 is about 2.
25. The optical cladding of claim 20 , wherein n 1 is about 2, n 2 is 1, and n 3 is about 1.
26. The optical cladding of claim 20 , wherein R is, independently at each occurrence, H, —CH 3 , —CH 2 CH 3 , or —CH(CH 3 ) 2 .
27. The optical cladding of claim 20 , wherein R 1 comprises an epoxy or an acrylate.
28. The optical cladding of claim 20 , wherein R 1 comprises:
where R 3 , R 4 , and R 5 are alkyl or aromatic groups.
29. The optical cladding of claim 20 , wherein R 2 comprises:
—F, —CH 2 —CH 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 3 , —CH 2 —CH 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 3 , or
30. The optical cladding of claim 20 , wherein gelling and crosslinking the monomer mixture forms an optical cladding layer comprising the structure
wherein R 1 ′ is an organic crosslinkage formed by the organic crosslinker R 1 .
31. The optical cladding of claim 20 , wherein gelling and crosslinking the monomer mixture forms an optical cladding layer comprising the structure
wherein R is a residual unreacted group, and
R 1 ′ is an organic crosslinkage formed by the organic crosslinker R 1 .
32. The optical cladding of claim 20 , further comprising 3% or less of a lithium salt.
33. The optical cladding of claim 20 , wherein the optical cladding is formed over a semiconductor, glass, or semiconductor-on-glass wafer at a thickness between 10 nanometers and 100 micrometers.
34. The optical cladding of claim 33 , wherein the optical cladding is formed over an electro-optic polymer.
35. An optical device including at least one optical cladding comprising the structure:
wherein:
M is Si, Ti, Al, Zr, or B,
R 1 ′ is an organic crosslinkage,
R 2 is a fluorinated organic group or fluorine, and
n 1 , n 2 , and n 3 are each between 1 and 10; and
an optical core including a poled chromophore disposed adjacent to the optical cladding;
wherein the optical cladding does not include the poled chromophore.
36. The optical device of claim 35 , wherein M is Si.
37. The optical device of claim 35 , wherein (n 1 +n 2 )>n 3 .
38. The optical device of claim 35 , wherein n 1 is about 4, n 2 is 1, and n 3 is about 2.
39. The optical device of claim 35 , wherein n 1 is about 2, n 2 is 1, and n 3 is about 2.
40. The optical device of claim 35 , wherein n 1 is about 2, n 2 is 1, and n 3 is about 1.
41. The optical device of claim 35 , wherein R 1 ′ comprises an epoxy or an acrylic crosslinkage.
42. The optical device of claim 35 , wherein R 2 comprises:
—F, —CH 2 —CH 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 3 , —CH 2 —CH 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 2 —CF 3 , or
43. The optical device of claim 35 , wherein the structure forms a network
wherein
R 1 is an organic crosslinker, and
R 1 ′ is the organic crosslinkage formed by the organic crosslinker R 1 .
44. The optical device of claim 35 , wherein the optical cladding forms a portion of an optical polymer stack over a semiconductor, glass, or semiconductor-on-glass wafer.
45. The optical device of claim 44 , wherein the optical cladding is formed over an electro-optic polymer, and wherein the optical cladding and the electro-optic polymer form portions of an optical polymer stack.
46. The optical device of claim 35 , wherein the optical cladding has a thickness between 10 nanometers and 100 micrometers.
47. The optical device of claim 35 , wherein the optical device includes a Mach-Zehnder modulator, a phase modulator, an optical multiplexer, and optical demultiplexer, or a ring modulator.
48. The optical device of claim 35 , wherein:
the optical cladding includes a bottom cladding and a top cladding disposed under and over an electro-optic core, respectively;
the bottom cladding is about 1-2.0 microns thick under a trench waveguide;
the electro-optic core is about 3 microns thick at the trench waveguide; and
the top cladding is about 0.5 to 2.0 microns thick.
49. The optical device of claim 35 , wherein:
the optical cladding includes a bottom cladding and a top cladding disposed under and over an electro-optic core, respectively;
the bottom cladding is about 2.0-3.0 microns thick;
the electro-optic core is about 3 microns thick; and
the top cladding is about 0.5 to 2.0 microns thick.
50. A method comprising:
(1) making an optical cladding by:
combining a silane monomer, an organically modified trialkoxysilane monomer including an organic cross-linking group, and a fluorinated silane monomer in a solvent to form a sol-gel solution;
hydrolyzing the sol-gel solution to begin a gelling reaction;
applying the sol-gel solution over a semiconductor, glass, or semiconductor-on-glass wafer; and
removing excess solvent, gelling, and crosslinking the applied sol-gel solution to form at least one optical cladding having a thickness of about 2.0 to 3.0 microns;
wherein the sol-gel solution does not contain a poled chromophore; and
(2) applying to the optical cladding a polymer core layer including a poled chromophore.
51. The method of making the optical cladding of claim 50 , wherein the silane monomer includes at least one selected from the group consisting of tetraalkoxysilane, alkyltrialkoxysilane, dialkyldialkoxysilane, alkyltrichlorosilane, dialkoxydisiloxane, and trialkoxydisiloxane.
52. The method of making the optical cladding of claim 50 , wherein the organically modified trialkoxysilane monomer including an organic cross-linking group includes at least one selected from the group consisting of glycidoxypropyltrimethoxysilane, glycidoxypropyltriethoxysilane, epoxytrimethoxysilane, epoxytriethoxysilane, acryltrimethoxysilane, and acryltriethoxysilane.
53. The method of making the optical cladding of claim 50 , wherein the fluorinated silane monomer includes at least one selected from the group consisting of tridecafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane, tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane, 1H,1H,2H,2H-perfluorododecyl-triethoxysilane, 1H,1H,2H,2H-perfluorododecyl-trimethoxysilane, 1H,1H,2H,2H-perfluorotetradecyl-triethoxysilane, 1H,1H,2H,2H-perfluorotetradecyl-trimethoxysilane, pentafluorobenzyltriethoxysilane, pentafluorobenzyltrimethoxysilane, fluorotriethoxysilane, and fluorotrimethoxysilane.
54. The method of making the optical cladding of claim 50 , wherein applying the combined monomers includes at least one of casting a thin film from sol-gel by spin coating, dipping, printing, or spraying.
55. The method of making the optical cladding of claim 54 , wherein casting a thin film from sol-gel includes removing a majority of the solvent used for the sol-gel solution preparation.
56. The method of making the optical cladding of claim 50 , wherein removing excess solvent includes performing spin drying, vacuum evaporation, heating, baking or a combination thereof.
57. The method of making the optical cladding of claim 50 , wherein gelling and crosslinking the applied sol-gel solution comprises:
curing the applied sol-gel solution to produce a mechanically strong, stable film.
58. The method of making the optical cladding of claim 57 , wherein curing the applied sol-gel solution transforms the sol-gel materials from a soluble state to a insoluble state.
59. The method of making the optical cladding of claim 50 , wherein the index of refraction of the cured optical cladding is between about 1.35 and 1.44 at about 1550 nanometers wavelength.
60. The method of making the optical cladding of claim 59 , wherein the index of refraction is between about 1.391 and 1.404 at 1550 nanometers wavelength.