Stacked composite device including a group III-V transistor and a group IV lateral transistor
View Patent ↗In one implementation, a stacked composite device comprises a group IV lateral transistor and a group III-V transistor stacked over the group IV lateral transistor. A drain of the group IV lateral transistor is in contact with a source of the group III-V transistor, a source of the group IV lateral transistor is coupled to a gate of the group III-V transistor to provide a composite source on a top side of the stacked composite device, and a drain of the group III-V transistor provides a composite drain on the top side of the stacked composite device. A gate of the group IV lateral transistor provides a composite gate on the top side of the stacked composite device, and a substrate of the group IV lateral transistor is on a bottom side of the stacked composite device.
1. A stacked composite device having a composite drain, a composite source, and a composite gate, said stacked composite device comprising:
a group IV lateral transistor;
a group III-V transistor stacked over said group IV lateral transistor;
a drain electrode of said group IV lateral transistor being in direct contact with a source electrode of said group III-V transistor, said source electrode of said group III-V transistor situated on said drain electrode of said group IV lateral transistor;
a source of said group IV lateral transistor being coupled to a gate of said group III-V transistor to provide said composite source on a top side of said stacked composite device;
a drain of said group III-V transistor providing said composite drain on said top side of said stacked composite device;
a gate of said group IV lateral transistor providing said composite gate on said top side of said stacked composite device;
a substrate of said group IV lateral transistor being on a bottom side of said stacked composite device;
one of a drain electrode of said group III-V transistor and said source electrode of said group III-V transistor being electrically coupled to a respective drain or source pad on an opposite side of said group III-V transistor by at least one through-substrate via.
2. The stacked composite device of claim 1 , wherein said group III-V transistor is a normally ON device and said stacked composite device is a normally OFF device.
3. The stacked composite device of claim 1 , wherein said group III-V transistor is a high′-voltage transistor.
4. The stacked composite device of claim 1 , wherein said group III-V transistor is a III-Nitride transistor.
5. The stacked composite device of claim 1 , wherein said group IV lateral transistor is a low-voltage transistor.
6. The stacked composite device of claim 1 , wherein at least one of a die of said group IV lateral transistor and a die of said group III-V transistor has a thickness of less than approximately 60 μm.
7. The stacked composite device of claim 1 , wherein said group IV lateral transistor comprises silicon.
8. The stacked composite device of claim 1 , wherein said source of said group IV lateral transistor is coupled to said gate of said group III-V transistor through at least one bond wire.
9. A composite device package comprising:
a group IV lateral transistor in a first active die;
a group III-V transistor stacked over said group IV lateral transistor in a second active die, a lateral area of said first active die being greater than a lateral area of said second active die;
a drain electrode of said group IV lateral transistor being in direct contact with a source electrode of said group III-V transistor, said source electrode of said group III-V transistor situated on said drain electrode of said group IV lateral transistor;
a source of said group IV lateral transistor being coupled to a gate of said group III-V transistor to provide a composite source on a top side of said composite device package;
a drain of said group III-V transistor providing a composite drain on said top side of said composite device package;
a gate of said group IV lateral transistor providing a composite gate on said top side of said composite device package;
a substrate of said group IV lateral transistor being on a bottom side of said composite device package;
one of a drain electrode of said group III-V transistor and said source electrode of said group III-V transistor being electrically coupled to a respective drain or source pad on an opposite side of said second active die by at least one through-substrate via.
10. The composite device package of claim 9 , wherein said group III-V transistor is a normally ON device and a composite device formed of said group III-V transistor and said group IV lateral transistor is a normally OFF device.
11. The composite device package of claim 9 , wherein said group III-V transistor is a high-voltage transistor and said group IV lateral transistor is a low-voltage transistor.
12. The composite device package of claim 9 , wherein said group III-V transistor is a III-Nitride transistor.
13. The composite device package of claim 9 , wherein at least one of said first active die and said second active die has a thickness of less than approximately 60 μm.
14. The composite device package of claim 9 , wherein said group IV lateral transistor comprises silicon.
15. The composite device package of claim 9 , wherein said source of said group IV lateral transistor is coupled to said gate of said group III-V transistor through at least one bond wire.
16. A stacked composite device having a composite drain, a composite source, and a composite gate, said stacked composite device comprising:
a silicon lateral FET;
a III-Nitride transistor stacked over said silicon lateral FET;
a drain electrode of said silicon lateral FET being in direct contact with a source electrode of said III-Nitride transistor, said source electrode of said III-Nitride transistor situated on said drain electrode of said silicon lateral FET;
a source of said silicon lateral FET being coupled to a gate of said III-Nitride transistor to provide said composite source on a top side of said stacked composite device;
a drain of said III-Nitride transistor providing said composite drain on said top side of said stacked composite device;
a gate of said silicon lateral FET providing said composite gate on said top side of said stacked composite device;
a substrate of said silicon lateral FET being on a bottom side of said stacked composite device;
one of a drain electrode of said III-Nitride transistor and said source electrode of said III-Nitride transistor being electrically coupled to a respective drain or source pad on an opposite side of said III-Nitride transistor by at least one through-substrate via.
17. The stacked composite device of claim 16 , wherein said III-Nitride transistor is a normally ON device and said stacked composite device is a normally OFF device.
18. The stacked composite device of claim 16 , wherein said III-Nitride transistor is a high-voltage transistor and said silicon lateral FET is a low-voltage transistor.
19. The stacked composite device of claim 16 , wherein said III-Nitride transistor comprises gallium nitride (GaN).
20. The stacked composite device of claim 16 , wherein said source of said silicon lateral FET is coupled to said gate of said III-Nitride transistor through at least one bond wire.