IP Library Granted Patent US 8,828,766
Granted Patent B2
US 8,828,766 · App. 13/448,629 · Granted Sep 9, 2014

Light-emitting device and method of fabricating the same

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Quick Facts
Patent No.
US 8,828,766
App. No.
13/448,629
Granted
Sep 9, 2014
Kind
B2
Abstract

A light-emitting device and a method of fabricating the same, in which the light emission characteristics of the light-emitting device in the UV range are maximized such that a high-efficiency light-emitting device can be produced at low cost. For this, the method includes the step of forming a zinc oxide light-emitting layer on a base substrate, the zinc oxide light-emitting layer including zinc oxide doped with a dopant; and activating the dopant by rapidly heat-treating the zinc oxide light-emitting layer, so that light emission in an ultraviolet range is increased.

Claims (16)

1. A method of fabricating a light-emitting device, comprising:

forming a zinc oxide light-emitting layer on a base substrate, the zinc oxide light-emitting layer comprising zinc oxide doped with a dopant; and

activating the dopant by rapidly heat-treating the zinc oxide light-emitting layer to increase light emission in an ultraviolet range;

wherein the dopant is added in an amount of 4˜7 wt %;

wherein the rapidly heat-treating comprises rapid thermal annealing;

wherein the rapidly heat-treating is carried out at a temperature ranging from 200° C. to 500° C. for 1 to 5 minutes.

2. The method of claim 1 , wherein the base substrate comprises glass or sapphire.

3. The method of claim 1 , wherein the zinc oxide light-emitting layer is formed using one selected from the group consisting of pulse laser deposition, sputtering, spray coating, chemical vapor deposition coating, evaporation and molecular beam epitaxy.

4. The method of claim 1 , wherein the dopant comprises at least one selected from the group consisting of gallium, aluminum, silicon, boron and fluorine.

5. The method of claim 1 , wherein the dopant is gallium or fluorine.

6. The method of claim 1 , wherein the rapidly heat-treating is carried out in a nitrogen atmosphere.

7. The method of claim 1 , wherein the light-emitting device comprises:

a first cladding layer formed between the base substrate and the zinc oxide light-emitting layer; and

a second cladding layer formed on the zinc oxide light-emitting layer.

8. The method of claim 7 , wherein the first cladding layer comprises zinc oxide doped with an n-dopant, and the second cladding layer comprises zinc oxide doped with a p-dopant.

9. The method of claim 8 , wherein the light-emitting device comprises an ultraviolet light-emitting diode.

Assignments (2)
CHANGE OF NAME Recorded Jan 16, 2015
From: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
To: CORNING PRECISION MATERIALS CO., LTD.
Reel/Frame 034774/0676 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 23, 2012
From: YOO, YOUNGZO; KIM, SEOHYUN; PARK, JEONGWOO; PARK, TAEJUNG; YOON, GUN SANG
To: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
Reel/Frame 028120/0532 →