Compact ion accelerator source
An ion source includes a conductive substrate, the substrate including a plurality of conductive nanostructures with free-standing tips formed on the substrate. A conductive catalytic coating is formed on the nanostructures and substrate for dissociation of a molecular species into an atomic species, the molecular species being brought in contact with the catalytic coating. A target electrode placed apart from the substrate, the target electrode being biased relative to the substrate with a first bias voltage to ionize the atomic species in proximity to the free-standing tips and attract the ionized atomic species from the substrate in the direction of the target electrode.
1. An ion source comprising:
a conductive substrate;
a plurality of conductive nanostructures with free-standing tips, the plurality of conductive nanostructures being disposed on the conductive substrate;
a catalytic coating disposed on the plurality of conductive nanostructures and the conductive substrate, the catalytic coating configured to dissociate a molecular species into an atomic species; and
a target electrode positioned apart from the conductive substrate, the target electrode configured to be biased relative to the conductive substrate with a first bias voltage to ionize the atomic species proximate the free-standing tips of the plurality of conductive nanostructures and to attract ionized atomic species from the conductive substrate in the direction of the target electrode.
2. The apparatus of claim 1 , wherein the plurality of conductive nanostructures are at least one of carbon nanotubes, silicon carbide nanostructures, and silicon nano structures.
3. The apparatus of claim 1 , wherein the catalytic coating is at least one or more of Pt, Pd, Ti, and Ru.
4. The apparatus of claim 1 , wherein the molecular species is at least one of H 2 , D 2 , and T 2 .
5. The apparatus of claim 1 , wherein the ionized atomic species is at least one of H + , D + , T + , H − , D − , and T − .
6. The apparatus of claim 1 , further comprising:
a grid electrode positioned between the conductive substrate and the target electrode, wherein the grid electrode is configured to be biased with a second bias voltage to ionize the atomic species proximate the free-standing tips of the plurality of conductive nanostructures and to attract the ionized atomic species in the direction of the grid electrode, wherein the second bias voltage is less than the first bias voltage and generates a greater electric field than an electric field generated by the first bias voltage.
7. The apparatus of claim 6 , wherein a change in a value of the second bias voltage is configured to change a rate of ionization of the atomic species.