Customized manufacturing method for an optoelectrical device
View Patent ↗The disclosure provides a customized manufacturing method for an optoelectrical device. The customized manufacturing method comprises the steps of providing a manufacturing flow including a front-end flow, a customized module subsequent to the front-end flow, and a pause step between the front-end flow and the customized module, processing a predetermined amount of semi-manufactured products queued at the pause step, tuning the customized module in accordance with a customer's request, and processing the semi-manufactured products by the tuned customized module to fulfill the customer's request.
1. A method for manufacturing an optoelectronic device comprising the steps of:
providing a growth wafer;
growing an epitaxial stack having optoelectrical properties on the growth wafer to form a semi-manufactured product;
detecting the optoelectrical criteria of the semi-manufactured product;
providing a pause step after the detecting step, wherein the semi-manufactured product is queued at the pause step for a predetermined time period;
providing a predetermined request with respect to a customized module; and
processing the semi-manufactured product by the customized module in response to the predetermined request, wherein the processing step is after the detecting step,
wherein the predetermined request comprises brightness, light-field or luminous wavelength.
2. The method for manufacturing the optoelectronic device according to claim 1 , further comprising a step of forming a plurality of chip regions on the growth wafer.
3. The method for manufacturing the optoelectronic device according to claim 2 , further comprising a step of forming a p-side electrode and an n-side electrode on each of the chip regions.
4. The method for manufacturing the optoelectronic device according to claim 1 , further comprising a step of comparing the optoelectrical criteria with the predetermined request.
5. The method for manufacturing the optoelectronic device according to claim 1 , further comprising a step of dicing the growth wafer to form a plurality of chips.
6. The method for manufacturing the optoelectronic device according to claim 1 , wherein the step of processing the semi-manufactured product by a corresponding customized module is tuning a parameter according to a pre-formed lookup table or a relation curve of the customized module.
7. A method for manufacturing an optoelectronic device, comprising the steps of:
providing a growth wafer;
growing an epitaxial stack having optoelectrical properties on the growth wafer to form a semi-manufactured product;
detecting the optoelectrical criteria of the semi-manufactured product;
providing a pause step after the detecting step, wherein the semi-manufactured product is queued at the pause step for a predetermined time period;
providing a predetermined request with respect to a customized module; and
processing the semi-manufactured product by the customized module in response to the predetermined request, wherein the processing step is after the detecting step,
wherein the optoelectrical criteria comprises peak wavelength or half-peak width.
8. The method for manufacturing an optoelectronic device according to claim 1 , further comprising the step of dicing the growth wafer to form a plurality of chips after detecting the optoelectrical criteria of the semi-manufactured product.