Thin-film magnetic head and method of making where the head includes an antireflection film covering a leading shield
View Patent ↗A thin-film magnetic head has a high write performance because its shape is smooth without roughness. The thin-film magnetic head includes a slider substrate, a write element and an antireflection film. The slider substrate has an air bearing surface at one side and supports a first support layer. The first support layer has a leading shield, and the leading shield has a low-level flat part, a slope part and a high-level flat part continuously arranged at one side in the recited order toward the air bearing surface. The antireflection film entirely covers the low-level flat part, the slope part and the high-level flat part of the leading shield. The write element has a recording magnetic pole film, and the recording magnetic pole film is formed above the antireflection film.
1. A thin-film magnetic head comprising a slider substrate, an antireflection film and a write element, the slider substrate having an air bearing surface at one side and supporting a first support layer, the first support layer having a leading shield, the leading shield having a low-level flat part, a slope part and a high-level flat part continuously arranged at one side in the name order toward the air bearing surface, the antireflection film entirely covering the low-level flat part, the slope part and the high-level flat part of the leading shield, the write element having a recording magnetic pole film, the recording magnetic pole film being formed above the antireflection film.
2. The thin-film magnetic head as claimed in claim 1 , wherein the antireflection film has a light absorption layer and an antireflection protective film.
3. The thin-film magnetic head as claimed in claim 1 , wherein the antireflection film has a composite layer, the composite layer being composed of a single light absorption layer and an adjacent single transparent film.
4. The thin-film magnetic head as claimed in claim 3 , wherein the antireflection film has an antireflection protective film.
5. The thin-film magnetic head as claimed in claim 4 , wherein the antireflection film has a plurality of the composite layers.
6. The thin-film magnetic head as claimed in claim 3 , wherein the antireflection film has a plurality of the composite layers.
7. A thin-film magnetic head device comprising a thin-film magnetic head and a head support device, the thin-film magnetic head being claimed in claim 1 , the head support device supporting the thin-film magnetic head.
8. A magnetic recording/reproducing apparatus comprising a thin-film magnetic head device and a magnetic recording medium, the thin-film magnetic head device being claimed in claim 7 , the thin-film magnetic head device being capable of performing magnetic recording and reproducing with the magnetic recording medium.
9. A method for manufacturing a thin-film magnetic head, the thin-film head having a slider substrate, an antireflection film and a write element, the slider substrate having an air bearing surface at one side and supporting a first support layer, the first support layer having a leading shield, the leading shield having a low-level flat part, a slope part and a high-level flat part continuously arranged at one side in the name order toward the air bearing surface, the antireflection film entirely covering the low-level flat part, the slope part and the high-level flat part of the leading shield, the write element having a recording magnetic pole film, the recording magnetic pole film being formed above the antireflection film,
the thin-film magnetic head manufacturing method comprising the steps of:
depositing the antireflection film over the low-level flat part, the slope part and the high-level flat part of the leading shield;
applying a photoresist film; and
performing a photolithography process on the photoresist film according to a pattern required for the recording magnetic pole film so as to form a cut-out pattern by exposure and developing.
10. The thin-film magnetic head manufacturing method as claimed in claim 9 , further comprising, after the formation of the cut-out pattern, steps of forming the recording magnetic pole film within the cut-out pattern and removing the photoresist film.
11. The thin-film magnetic head manufacturing method as claimed in claim 10 , further comprising, after the removal of the photoresist film, a step of forming a second support layer around the recording magnetic pole film.
12. The thin-film magnetic head manufacturing method as claimed in claim 9 , further comprising a step of removing a part of the antireflection film.
13. The thin-film magnetic head manufacturing method as claimed in claim 12 , further comprising, after the formation of the cut-out pattern, steps of forming the recording magnetic pole film within the cut-out pattern and removing the photoresist film and further removing a part of the antireflection film.
14. The thin-film magnetic head manufacturing method as claimed in claim 13 , further comprising, after the removal of the photoresist film and a part of the antireflection film, a step of forming a second support layer around the recording magnetic pole film.
15. The thin-film magnetic head manufacturing method as claimed in claim 12 , wherein the antireflection film has a light absorption layer and an antireflection protective film.
16. The thin-film magnetic head manufacturing method as claimed in claim 12 , wherein the antireflection film has a composite layer, the composite layer being composed of a single light absorption layer and an adjacent single transparent film.
17. The thin-film magnetic head manufacturing method as claimed in claim 16 , wherein the antireflection film has an antireflection protective film.
18. The thin-film magnetic head manufacturing method as claimed in claim 17 , wherein the antireflection film has a plurality of the composite layers.
19. The thin-film magnetic head manufacturing method as claimed in claim 16 , wherein the antireflection film has a plurality of the composite layers.
20. The thin-film magnetic head manufacturing method as claimed in claim 9 , wherein the antireflection film has a light absorption layer and an antireflection protective film.
21. The thin-film magnetic head manufacturing method as claimed in claim 9 , wherein the antireflection film has a composite layer, the composite layer being composed of a single light absorption layer and an adjacent single transparent film.
22. The thin-film magnetic head manufacturing method as claimed in claim 21 , wherein the antireflection film has an antireflection protective film.
23. The thin-film magnetic head manufacturing method as claimed in claim 22 , wherein the antireflection film has a plurality of the composite layers.
24. The thin-film magnetic head manufacturing method as claimed in claim 21 , wherein the antireflection film has a plurality of the composite layers.
25. A method for manufacturing a thin-film magnetic head, the thin-film magnetic head having a slider substrate and a write element, the slider substrate having an air bearing surface at one side and supporting a first support layer, the first support layer having a leading shield, the leading shield having a low-level flat part, a slope part and a high-level flat part continuously arranged at one side in the name recited order toward the air bearing surface, the write element having a recording magnetic pole film, the recording magnetic pole film being formed above the leading shield, the thin-film magnetic head manufacturing method comprising the steps of:
depositing an antireflection film over the low-level flat part, the slope part and the high-level flat part of the leading shield;
applying a photoresist film;
performing a photolithography process on the photoresist film according to a pattern required for the recording magnetic pole film so as to form a cut-out pattern by exposure and developing; and
removing the entire antireflection film.
26. The thin-film magnetic head manufacturing method as claimed in claim 25 , further comprising, after the formation of the cut-out pattern, steps of forming the recording magnetic pole film within the cut-out pattern and removing the photoresist film and further removing the entire antireflection film.
27. The thin-film magnetic head manufacturing method as claimed in claim 26 , further comprising, after the removal of the photoresist film and the entire antireflection film, a step of forming a second support layer around the recording magnetic pole film.
28. The thin-film magnetic head manufacturing method as claimed in claim 25 , wherein the antireflection film has a light absorption layer and an antireflection protective film.
29. The thin-film magnetic head manufacturing method as claimed in claim 25 , wherein the antireflection film has a composite layer, the composite layer being composed of a single light absorption layer and an adjacent single transparent film.
30. The thin-film magnetic head manufacturing method as claimed in claim 29 , wherein the antireflection film has an antireflection protective film.
31. The thin-film magnetic head manufacturing method as claimed in claim 30 , wherein the antireflection film has a plurality of the composite layers.
32. The thin-film magnetic head manufacturing method as claimed in claim 29 , wherein the antireflection film has a plurality of the composite layers.