IP Library Granted Patent US 9,383,282
Granted Patent B2
US 9,383,282 · App. 13/462,582 · Granted Jul 5, 2016

MEMS capacitive pressure sensor, operating method and manufacturing method

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Quick Facts
Patent No.
US 9,383,282
App. No.
13/462,582
Granted
Jul 5, 2016
Kind
B2
Abstract

A MEMS pressure sensor wherein at least one of the electrode arrangements comprises an inner electrode and an outer electrode arranged around the inner electrode. The capacitances associated with the inner electrode and the outer electrode are independently measured and can be differentially measured. This arrangement enables various different read out schemes to be implemented and also enables improved compensation for variations between devices or changes in device characteristics over time.

Claims (53)

1. A MEMS pressure sensor comprising:

a plurality of opposing electrode arrangements, wherein one of the electrode arrangements is suspended over the other such that it is movable in response to an applied pressure, and wherein another of the electrode arrangements is suspended over the other such that is movable in response to an applied bias voltage and the applied pressure;

an element for deriving an output from a capacitance between at least one of the electrode arrangements, wherein at least one of the electrode arrangements comprises an inner electrode and an outer electrode arranged around the inner electrode; and

an element for applying a voltage bias to one of the inner electrode and the outer electrode, wherein the other electrode of the same electrode arrangement is used for capacitance measurement.

2. A sensor as claimed in claim 1 , wherein the inner electrode is circular and the outer electrode is annular, and the inner electrode and the outer electrode have the same area.

3. A sensor as claimed in claim 1 , further comprising:

an element for applying a voltage bias to one of the inner electrode and the outer electrode, and

a feedback system for maintaining a fixed ratio between the capacitance associated with the inner electrode and the outer electrode such as to maintain the suspended electrode arrangement in a predefined deflection configuration.

4. A sensor as claimed in claim 1 , wherein the element for deriving an output is configured to enable the output to be derived from at least one of:

the capacitance associated with the inner electrode alone;

the capacitance associated with the outer electrode alone; and

the combined capacitances associated with the inner and outer electrodes.

5. An article of manufacture comprising a MEMS pressure sensor according to claim 1 , wherein the pressure sensor comprises a plurality of opposing electrode arrangements, wherein one of the electrode arrangements is suspended over the other such that it is movable in response to an applied pressure, wherein at least one of the electrode arrangements comprises an inner electrode and an outer electrode arranged around the inner electrode, and further comprising a non-transitory, tangible machine readable storage medium containing executable machine instructions said instructions including:

measuring independently a capacitance associated with the inner electrode and the outer electrode to derive an output signal representing the pressure.

6. The article as claimed in claim 5 , further comprising:

applying a voltage bias to one of the inner electrode and the outer electrode, and using the other electrode for capacitance measurement; or

applying a voltage bias to at least one of the inner electrode and the outer electrode, and measuring simultaneously the capacitance change and using this information for determining a state of membrane deflection and/or mechanical compliance of a membrane and storing the measurement data in a memory for calibration purposes; or

applying a voltage bias to at least one of the inner electrode and the outer electrode, and determining a resonance frequency and a quality factor of an electrostatic excited membrane and using this information for determining the state of membrane deflection and/or mechanical compliance of the membrane and storing the measurement data in a memory for calibration purposes; or

applying a voltage bias to at least one of the inner electrode and the outer electrode, to tune a pressure sensitivity to a desired range.

7. The article as claimed in claim 5 , the instructions further comprising applying a voltage bias to one of the inner electrode and the outer electrode, and adjusting the voltage bias to maintain a fixed ratio between the capacitance associated with the inner electrode and the outer electrode such as to maintain the suspended electrode arrangement in a predefined configuration, wherein the output signal is derived from an adjustment level of the voltage bias.

8. The article as claimed in claim 5 , the instructions further comprising deriving a differential capacitance between the capacitances associated with the inner electrode and the outer electrode and using the differential capacitance to determine when the movable electrode arrangement has reached its limit of movement.

9. The article as claimed in claim 8 , the instructions further comprising selecting which electrode to use for deriving the output based on whether the limit of movement has been reached.

10. The article as claimed in claim 5 , the instructions further comprising deriving an output from one of:

the capacitance associated with the inner electrode alone;

the capacitance associated with the outer electrode alone;

the combined capacitances associated with the inner and outer electrodes, wherein the selection is based on at least one of a desired sensitivity, signal to noise ratio and dynamic range.

11. A method of fabricating a MEMS pressure sensor according to claim 1 , comprising:

forming opposing electrode arrangements over a substrate, wherein one of the electrode arrangements is fixed to the substrate and the other is suspended over the top such that it is movable in response to an applied pressure,

wherein the forming of at least one of the electrode arrangements comprises forming an inner electrode and an outer electrode arranged around the inner electrode, and forming separate read out terminals for the inner and outer electrodes.

12. A method as claimed in claim 11 , further comprising:

forming a lower metal layer over a substrate arrangement and defining the one electrode arrangement;

forming a sacrificial layer over the lower metal layer to define a cavity;

forming a passivation layer over the sacrificial layer;

forming a top metal layer and defining the other electrode arrangement, wherein the passivation layer ( 160 ) avoids electrical contact between the lower metal layer and the top metal layer;

forming a capping layer over the top metal layer;

forming an etch opening in the capping layer leading to the sacrificial layer;

removing the sacrificial layer through the etch opening;

forming a plugging layer for plugging the etch opening; and

removing the plugging layer other than over the etch opening.

13. A method as claimed in claim 12 , wherein the etch opening is formed laterally to a side of the electrode arrangements.

14. A method as claimed in claim 12 , wherein the plugging layer is a metal formed by PVD.

15. A MEMS pressure sensor comprising:

first and second separated electrode segments on a flexible membrane, wherein the first and second separated electrode segments are configured to move in response to an applied pressure;

third and fourth separated electrode segments, wherein the first and third separated electrode elements form a first capacitor and the second and fourth separated electrode elements form a second capacitor; and

readout electronics for determining the capacitance value of the first and second capacitors, wherein the readout electronics applies a voltage bias to the first electrode segment, and the second electrode segment is used for capacitance measurement.

16. A sensor as claimed in claim 15 , wherein the first and second electrode segments comprise an inner electrode and an outer electrode arranged around the inner electrode.

17. A sensor as claimed in claim 16 , wherein the inner electrode is circular and the outer electrode is annular, and the inner electrode and the outer electrode have the same area.

18. A sensor as claimed in claim 15 , further comprising:

a feedback system for maintaining a fixed ratio between the capacitance associated with the first and second capacitors such as to maintain the electrode suspension in a predefined deflection configuration.

19. A sensor as claimed in claim 15 , wherein the readout electronics are configured to produce an output that is derived from at least one of:

the capacitance of the first capacitor;

the capacitance of the second capacitor; and

the combined capacitances of the first and second capacitors.

Assignments (13)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 27, 2020
From: AMS AG; AMS INTERNATIONAL AG; AMS SENSORS UK LIMITED; AMS SENSORS GERMANY GMBH
To: SCIOSENSE B.V.
Reel/Frame 052769/0820 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12298143 PREVIOUSLY RECORDED ON REEL 042985 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Oct 22, 2019
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 051029/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12298143 PREVIOUSLY RECORDED ON REEL 039361 FRAME 0212. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Oct 22, 2019
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 051029/0387 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12298143 PREVIOUSLY RECORDED ON REEL 038017 FRAME 0058. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Oct 22, 2019
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 051030/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12298143 PREVIOUSLY RECORDED ON REEL 042762 FRAME 0145. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Oct 22, 2019
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 051145/0184 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050745/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12681366 PREVIOUSLY RECORDED ON REEL 039361 FRAME 0212. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded May 9, 2017
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 042762/0145 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12681366 PREVIOUSLY RECORDED ON REEL 038017 FRAME 0058. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded May 9, 2017
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 042985/0001 →
PATENT RELEASE Recorded Aug 17, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 039707/0471 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12092129 PREVIOUSLY RECORDED ON REEL 038017 FRAME 0058. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Jul 14, 2016
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039361/0212 →
SECURITY AGREEMENT SUPPLEMENT Recorded Mar 7, 2016
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 038017/0058 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 7, 2015
From: NXP B.V.
To: AMS INTERNATIONAL AG
Reel/Frame 036015/0613 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 16, 2012
From: BESLING, WILLEM FREDERIK ADRIANUS; REIMANN, KLAUS; STEENEKEN, PETER; WUNNICKE, OLAF; WOLTJER, REINOUT
To: NXP B.V.
Reel/Frame 028220/0814 →