FLAT PANEL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

1 . A flat panel display device, comprising:

a substrate having an emission area in which an image is displayed and a pad area that is outside of the emission area;

a semiconductor layer on the substrate, the semiconductor layer having crystallization areas and amorphous areas;

an electrostatic protecting circuit on a portion of at least one of the amorphous areas corresponding to the pad area; and

a panel circuit unit on a portion of at least one of the crystallization areas corresponding to the pad area.

2 . The flat panel display device of claim 1 , wherein the crystallization areas each include polycrystalline silicon and the amorphous area each include amorphous silicon.

3 . The flat panel display device of claim 1 , wherein the crystallization areas and the amorphous areas are elongated a first direction of the substrate.

4 . The flat panel display device of claim 3 , wherein the crystallization areas and the amorphous areas are alternately arranged in a second direction, the second direction crossing the first direction of the substrate.

5 . The flat panel display device of claim 4 , wherein the first direction and the second direction are perpendicular to each other.

6 . The flat panel display device of claim 1 , wherein the panel circuit unit includes a scan driver or a data driver.

7 . The flat panel display device of claim 1 , wherein the emission area is in a central portion of the substrate, and the pad area is adjacent to at least one side of the emission area.

8 . The flat panel display device of claim 1 , further comprising a pixel circuit unit on a portion of at least one of the crystallization areas corresponding to the emission area.

9 . The flat panel display device of claim 8 , wherein the pixel circuit unit has at least one of a thin film transistor (TFT) and a capacitor.

10 . The flat panel display device of claim 9 , wherein the pixel circuit unit includes the TFT, and an active layer of the TFT includes the portion of the at least one of the crystallization areas corresponding to the emission area.

11 . A method of manufacturing a flat panel display device, the method comprising:

preparing a substrate having an emission area in which an image is displayed and a pad area that is outside of the emission area;

forming a semiconductor layer on the substrate;

forming crystallization areas and amorphous areas by selectively crystallizing the semiconductor layer;

forming an electrostatic protecting circuit on a portion of at least one of the amorphous areas corresponding to the pad area; and

forming a panel circuit unit on a portion of at least one of the crystallization areas corresponding to the pad area.

12 . The method of claim 11 , wherein the crystallization areas are formed of polycrystalline silicon, and the amorphous areas each include amorphous silicon.

13 . The method of claim 11 , wherein the crystallization areas and the amorphous areas are formed to extend in a first direction of the substrate.

14 . The method of claim 13 , wherein the crystallization areas and the amorphous areas are alternately formed in a second direction, the second direction crossing the first direction of the substrate.

15 . The method of claim 11 , wherein the panel circuit unit has a scan driver or a data driver.

16 . The method of claim 11 , wherein the emission area is in a central portion of the substrate, and the pad area is adjacent to at least one side of the emission area.

17 . The method of claim 11 , further comprising forming a pixel circuit unit on a portion of at least one of the crystallization areas corresponding to the emission area.

18 . The method of claim 17 , wherein the pixel circuit unit has at least one of a thin film transistor (TFT) and a capacitor.