Valve devices, systems, and methods for controlling the distribution of materials
The various embodiments of the present invention are directed to valve devices, systems, and methods for controlling the distribution of materials to multiple locations. The improved valve devices, materials distribution systems, and materials distribution methods disclosed herein are particularly suitable for use in applications where the materials being distributed are, for example but not limited to, non-gaseous fluid materials (e.g., raw liquids, solutions, slurries, colloids, suspensions, and the like) and solid materials having some level of tackiness, moisture content, or like property. The valves, systems, and methods disclosed herein can be operated without having to stop the flow of materials therethrough in order to change the position of the valve from one outlet to another. Further, the valves and systems disclosed herein have few directional changes, therefore there are few, if any, points within the system where the material can get stuck and/or lodged.
1. A rotary valve device, comprising:
an inlet and a plurality of tapering outlets;
a curved, arcuate discharge chute disposed between the inlet and the plurality of outlets;
a funnel trough above the plurality of tapering outlets, the funnel trough configured to direct material flowing out of the discharge chute into one or more outlets of the plurality of tapering outlets; and
a main shaft coupled to the discharge chute and a gear box, the main shaft extending through a bearing located proximate the top of the shaft and the gear box located proximate the bottom of the shaft.
2. The device of claim 1 , wherein the plurality of outlets are equidistant from each other.
3. The device of claim 1 , wherein the inlet has a tapered interior structure.
4. The device of claim 1 , wherein a top portion of the discharge chute is tapered.
5. The device of claim 1 , further comprising a gasket ring surrounding a top portion of the discharge chute.
6. The device of claim 1 , wherein the gear box comprises a gear reduction unit adapted to rotate the main shaft which subsequently rotates the discharge chute.
7. The device of claim 6 , wherein the gear box is substantially enclosed.
8. The device of claim 6 , wherein the main shaft and the gear box are correspondingly keyed such that additional couplings are not needed to couple the main shaft and the gear box.
9. The device of claim 6 , further comprising an electrical motor configured to power the gear box.
10. The device of claim 9 , wherein the electrical motor is coupled to the gear box at a right angle.
11. The device of claim 1 , further comprising an encoder coupled to the main shaft, the encoder configured to indicate the position of the discharge chute at any given position of the discharge chute.
12. The device of claim 11 , wherein the encoder provides precise position feedback at any given position of the discharge chute with an accuracy of less than one degree of rotation.
13. The device of claim 1 , wherein the discharge chute is of an angle of 10° to 80° with respect to the vertical.
14. The device of claim 13 , wherein the discharge chute is of an angle of about 22.5° with respect to the vertical.
15. The device of claim 13 , wherein the discharge chute is of an angle of about 45° with respect to the vertical.
16. The device of claim 1 , wherein at least a portion of one interior component of the continuous rotary valve device is surface treated with corrosion protection, wear and abrasion resistance, surface traction, low friction, non-conductive, conductive coatings, or combinations thereof.
17. The device of claim 16 , further comprising surface treating at least one component layer by cleaning, degreasing, etching, primer coating, roughening, grit-blasting, sand-blasting, peening, pickling, acid-wash, base-wash, nitriding, carbonitriding, electroplating, electroless plating, flame spraying including high velocity applications, thermal spraying, plasma spraying, sintering, dip coating, powder coating, vacuum deposition, chemical vapor deposition, physical vapor deposition, sputtering techniques, spray coating, roll coating, rod coating, extrusion, rotational molding, slush molding, and reactive coatings utilizing thermal, radiational, and/or photoinitiation cure techniques, nitriding, carbonitriding, phosphating, or combinations thereof.
18. The device of claim 16 , wherein the surface treatment is at least one of metals, inorganic salts, inorganic oxides, inorganic carbides, inorganic nitrides, inorganic carbonitrides, corrosion inhibitors, sacrificial electrodes, primers, conductors, optical reflectors, pigments, passivating agents, radiation modifiers, topcoats, adhesives, and polymers including urethanes and fluorourethanes, polyolefins and substituted polyolefins, polyesters, polyamides, fluoropolymers, polycarbonates, polyacetals, polysulfides, polysulfones, polyamideimides, polyethers, polyetherketones, silicones, or combinations thereof.
19. The device of claim 1 , further comprising an inlet pipe assembly that receives the discharge chute, rotates with the discharge chute, is disposed around the discharge chute, and is coupled to the discharge chute and the main shaft.
20. The device of claim 1 , wherein the curved, arcuate discharge chute has only one change of direction.
21. The device of claim 1 , further comprising:
a lid between the inlet and the plurality of tapering outlets, the lid comprising one or more doors, the one or more doors permitting access to the interior of the rotary valve device; and
one or more removable guards that enable access to the bearing.
22. The device of claim 1 , wherein one or more outlets of the plurality of tapering outlets feeds into a bagging system.
23. The device of claim 1 , wherein one or more outlets of the plurality of tapering outlets feeds into a conditioning system.