IP Library Granted Patent US 8,815,989
Granted Patent B2
US 8,815,989 · App. 13/509,481 · Granted Aug 26, 2014

Resin composition for coating material

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Quick Facts
Patent No.
US 8,815,989
App. No.
13/509,481
Granted
Aug 26, 2014
Kind
B2
Abstract

The invention aims to provide a resin composition having favorable stain resistance and storage stability even in the form of a one-pack coating material. Provided is a resin composition for a coating material, including: (I) a synthetic resin emulsion; (II) a silicon compound represented by the formula (1): (R 1 O) 4-a SiR 2 a   (1) wherein R 1 s are the same or different and each represent an alkyl group having 1-10 carbon atoms, an aryl group having 6-10 carbon atoms, or an aralkyl group having 7-10 carbon atoms; R 2 s are the same or different and each represent an alkyl group having 1-10 carbon atoms, an aryl group having 6-10 carbon atoms, or an aralkyl group having 7-10 carbon atoms; and a represents an integer from 0 to 2; and/or a partial hydrolysis condensation product thereof and/or a modified product thereof; and (III) a photosensitizer.

Claims (57)

1. A resin composition for a water-based coating material, comprising:

(I) a synthetic resin emulsion;

(II) a silicon compound represented by the formula (2):

(R 3 O) 4 Si  (2)

wherein R 3 s are the same or different and each represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms;

and/or a partial hydrolysis condensation product thereof and/or a modified product thereof; and

(III) a photosensitizer.

2. The resin composition for a water-based coating material according to claim 1 , further comprising:

(IV) a photoacid generator and/or (V) a photobase generator.

3. A resin composition for a water-based coating material, comprising:

(I) a synthetic resin emulsion;

(II) a silicon compound represented by the formula (2):

(R 3 O) 4 Si  (2)

wherein R 3 s are the same or different and each represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms;

and/or a partial hydrolysis condensation product thereof and/or a modified product thereof; and

(IV) a photoacid generator and/or (V) a photobase generator.

4. The resin composition for a water-based coating material according to any one of claims 1 to 2 ,

wherein (II) the silicon compound and/or a partial hydrolysis condensation product thereof and/or a modified product thereof is dispersed in an aqueous medium using a nonionic surfactant and/or an anionic surfactant.

5. The resin composition for a water-based coating material according to claim 4 ,

wherein the surfactant used for an emulsion of (II) the silicon compound and/or a partial hydrolysis condensation product thereof and/or a modified product thereof is an alkali metal salt of an anionic surfactant.

6. The resin composition for a water-based coating material according to any one of claims 1 to 2 ,

wherein the synthetic resin emulsion is an acrylic resin emulsion including an alkoxysilyl group-containing monomer unit.

7. The resin composition for a water-based coating material according to any one of claims 1 to 2 ,

wherein a surfactant used for (I) the synthetic resin emulsion is an alkali metal salt of an anionic surfactant.

8. The resin composition for a water-based coating material according to claim 1 or 2 ,

wherein (III) the photosensitizer is at least one selected from the group consisting of anthracene derivatives, acetophenone derivatives, benzophenone derivatives, thioxanthone derivatives, and anthraquinone derivatives.

9. The resin composition for a water-based coating material according to claim 8 ,

wherein (III) the photosensitizer is a compound having a benzophenone skeleton and/or an anthracene skeleton.

10. The resin composition for a water-based coating material according to claim 3 or 2 ,

wherein (IV) the photoacid generator is an organic halogen compound.

11. The resin composition for a water-based coating material according to claim 10 ,

wherein (IV) the photoacid generator is a halogen-containing triazine compound, a vinylidene chloride copolymer, a vinyl chloride copolymer, or a chlorinated polyolefin.

12. The resin composition for a water-based coating material according to claim 3 or 2 ,

wherein (IV) the photoacid generator is a sulfonium salt or an iodonium salt.

13. The resin composition for a water-based coating material according to claim 3 or 2 ,

wherein (V) the photobase generator is at least one selected from the group consisting of cobalt amine complexes, O-acyloximes, carbamic acid derivatives, formamide derivatives, quaternary ammonium salts, tosylamines, carbamates, and amineimide compounds.

14. The resin composition for a water-based coating material according to claim 13 ,

wherein (V) the photobase generator is an O-acyloxime compound.

15. The resin composition for a water-based coating material according to claim 14 ,

wherein (V) the photobase generator is an O-acyloxime containing an aryl group represented by the formula (3):

wherein R 4 , R 5 , and R 6 are each independently hydrogen, an alkyl group having 1 to 10 carbon atoms, an aryl group having 1 to 10 carbon atoms, or an aralkyl group having 1 to 10 carbon atoms, and at least one of the R 4 , R 5 , and R 6 has an aryl group.

16. The resin composition for a water-based coating material according to any one of claims 1 to 2 , further comprising

(VI) an ultraviolet absorber,

wherein (VI) the ultraviolet absorber is a compound having at least one skeleton selected from the group consisting of a triazine skeleton, a benzophenone skeleton, a benzotriazole skeleton, a phenyl salicylate skeleton, and a phenyl benzoate skeleton.

17. The resin composition for a water-based coating material according to any one of claims 1 to 2 , further comprising

(VII) a hindered amine light stabilizer,

wherein (VII) the hindered amine light stabilizer is a compound containing a piperidine ring represented by the formula (4):

—C(CH 3 ) 2 —N(OR′)—C(CH 3 ) 2 —  (4)

wherein R′ represents an organic group having 1 to 20 carbon atoms.

18. The resin composition for a water-based coating material according to claim 3 or 2 , further comprising

(VIII) a compound capable of being activated by acid to promote hydrolysis and condensation of an alkoxysilyl group.

19. The resin composition for a water-based coating material according to claim 18 ,

wherein (VIII) the compound capable of being activated by acid to promote hydrolysis and condensation of an alkoxysilyl group is a salt of an acidic phosphate compound.

20. The resin composition for a water-based coating material according to any one of claims 1 to 2 , further comprising

(IX) an inorganic pigment.

21. A resin composition for a one-pack water-based coating material, comprising the resin composition for a water-based coating material according to any one of claims 1 to 2 .

22. A coated article and a coat film obtained from the resin composition for a one-pack water-based coating material according to claim 21 .

Assignments (2)
CHANGE OF ADDRESS Recorded Sep 12, 2013
From: KANEKA CORPORATION
To: KANEKA CORPORATION
Reel/Frame 031207/0283 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 26, 2012
From: SAITO, TAKAHIRO; KAGITANI, SHINJI; MATSUO, YOUICHI
To: KANEKA CORPORATION
Reel/Frame 028645/0993 →