ABRASIVE MATERIAL
The present invention provides an abrasive material capable of polishing difficult-to-polish silicon carbide at a high degree of surface precision. The present invention relates to an abrasive material including manganese dioxide particles having a non-needle-like shape possessing a ratio of the longitudinal axis to the transverse axis of the particles observed with a scanning electron microscope of 3.0 or less. The abrasive material is preferable if the average particle size D SEM of the longitudinal axis of the observed particles is 1.0 μm or less, and if the particle size D 50 of the volume-based cumulative fraction of 50% in laser diffraction/scattering particle size distribution measurement is 2.0 μm or less.
1 . An abrasive material comprising manganese dioxide particles having a non-needle-like shape having a longitudinal axis and a transverse axis, wherein a ratio of the longitudinal axis to the transverse axis of the particles is 3.0 or less.
2 . The abrasive material according to claim 1 , wherein the average particle size D 50 of the longitudinal axis of the particles is 1.0 μm or less.
3 . The abrasive material according to claim 1 wherein the particle size D 50 of the volume-based cumulative fraction of 50% in laser diffraction/scattering particle size distribution measurement is 2.0 μm or less.
4 . The abrasive material according to claim 1 wherein the specific surface area is 20 m 2 /g or more.
5 . The abrasive material according to claim 1 wherein the crystal structure of manganese dioxide is of the γ-type.
6 . The abrasive material according to claim 1 wherein the crystal structure of manganese dioxide is of the β-type.
7 . An abrasive material slurry comprising the abrasive material according claim 1 .
8 . A method for producing the abrasive material according to claim 5 , comprising a dry pulverization step of dry pulverizing the γ-type manganese dioxide deposited on an anode by electrolysis.
9 . A method for producing the abrasive material according to claim 6 , comprising:
a heating step of heating the γ-type manganese dioxide deposited on an anode by electrolysis in a hot atmosphere set at 200° C. to 600° C.; and a dry pulverization step of dry pulverizing the heated manganese dioxide.
10 . A method for producing an abrasive material slurry comprising forming a slurry comprising the abrasive material obtained by the method for producing the abrasive material, according to claim 8 .
11 . The abrasive material according to claim 2 wherein the particle size D 50 of the volume-based cumulative fraction of 50% in laser diffraction/scattering particle size distribution measurement is 2.0 μm or less.
12 . The abrasive material according to claim 2 wherein the specific surface area is 20 m 2 /g or more.
13 . The abrasive material according to claim 3 wherein the specific surface area is 20 m 2 /g or more.
14 . The abrasive material according to claim 11 wherein the specific surface area is 20 m 2 /g or more.
15 . The abrasive material according to claim 2 wherein the crystal structure of manganese dioxide is of the γ-type.
16 . The abrasive material according to claim 3 wherein the crystal structure of manganese dioxide is of the γ-type.
17 . The abrasive material according to claim 4 wherein the crystal structure of manganese dioxide is of the γ-type.
18 . The abrasive material according to claim 11 wherein the crystal structure of manganese dioxide is of the γ-type.
19 . The abrasive material according to claim 12 wherein the crystal structure of manganese dioxide is of the γ-type.
20 . The abrasive material according to claim 13 wherein the crystal structure of manganese dioxide is of the γ-type.