Semiconductor device and method of manufacturing the same
View Patent ↗A semiconductor device in accordance with one embodiment of the invention can include a semiconductor substrate having a groove, a bit line, a pocket implantation region, a bottom insulating membrane, and a charge accumulation region. The bit line is formed on a side of the groove in the semiconductor substrate and acts as a source and a drain. The pocket implantation region is formed to touch (or contact) the bit line, has a similar conductivity type as the semiconductor substrate, and has a dopant concentration higher than that of the semiconductor substrate. The bottom insulating membrane is formed on and touches (or contacts) a side surface of the groove. The charge accumulation layer is formed on and touches (or contacts) a side surface of the bottom insulating membrane.
1. A semiconductor device comprising:
a semiconductor substrate comprising a groove;
a bit line that is formed on both sides of the groove in the semiconductor substrate and acts as a source and a drain, the bit line has a different conductivity type than the semiconductor substrate;
a pocket implantation region that has a similar conductivity type as the semiconductor substrate and has a dopant concentration higher than that of the semiconductor substrate, the pocket implantation region and the bit line form a PN junction, the bit line is located on a part of the pocket implantation region, side surfaces of the lower half of the groove are free of the pocket implantation region;
a bottom insulating membrane that is formed on and contacts a side surface of the groove; and
a charge accumulation layer that is formed on and contacts a side surface of the bottom insulating membrane.
2. The semiconductor device of claim 1 , wherein the groove comprises a first groove that is formed in the bit line, and a second groove that has a width narrower than that of the first groove and is formed in the semiconductor substrate under the first groove.
3. The semiconductor device of claim 1 , wherein the bit line is thicker than the pocket implantation region.
4. The semiconductor device of claim 1 , wherein the charge accumulation layer is a silicon nitride membrane.
5. The semiconductor device of claim 1 , wherein the charge accumulation layer is a floating gate.
6. The semiconductor device of claim 1 , further comprising a top insulating membrane covering the charge accumulation layer.
7. The semiconductor device of claim 6 , further comprising a word line that is formed on a side surface of the top insulating membrane and acts as a gate.
8. A semiconductor device comprising:
a semiconductor substrate comprising a groove;
a bit line that is formed in the semiconductor substrate and acts as a source and a drain, the bit line has a different conductivity type than the semiconductor substrate;
a pocket implantation region that has a similar conductivity type as the semiconductor substrate and a dopant concentration higher than that of the semiconductor substrate, the pocket implantation region and the bit line form a PN junction, the bit line is located on a part of the pocket implantation region, side surfaces of the lower half of the groove are free of the pocket implantation region;
an insulating membrane that is formed on a surface of the groove; and
a charge accumulation layer that is formed on a surface of the insulating membrane.
9. The semiconductor device of claim 8 , wherein the groove comprises a first groove and a second groove having a width narrower than that of the first groove.
10. The semiconductor device of claim 9 , wherein the second groove is formed in the semiconductor substrate under the first groove.
11. The semiconductor device of claim 10 , wherein the second groove extends beyond the pocket implantation region.
12. The semiconductor device of claim 10 , wherein the insulating membrane is touching a side surface of the first groove and a side surface of the second groove.
13. The semiconductor device of claim 8 , wherein the bit line is thicker than the pocket implantation region.
14. The semiconductor device of claim 8 , wherein the charge accumulation layer is a silicon nitride membrane
15. The semiconductor device of claim 8 , wherein the charge accumulation layer is a floating gate.
16. The semiconductor device of claim 8 , further comprising a top insulating membrane covering the charge accumulation layer.
17. The semiconductor device of claim 16 , further comprising a word line that is formed on a side surface of the top insulating membrane and acts as a gate.
18. A semiconductor device comprising:
a semiconductor substrate comprising a first groove;
a bit line that is formed in the semiconductor substrate and acts as a source and a drain, the bit line has a different conductivity type than the semiconductor substrate;
a pocket implantation region that has a similar conductivity type as the semiconductor substrate and a dopant concentration higher than that of the semiconductor substrate, the pocket implantation region and the bit line form a PN junction, the bit line is located on a part of the pocket implantation region;
a second groove formed in the bottom surface of the first groove that extends beyond the pocket implantation region in the semiconductor substrate, the second groove having a width narrower than that of the first groove, the pocket implantation region is formed on both sides of the second groove, a side surface of the second groove comprises a portion of the pocket implantation region, side surfaces of the lower half of the second groove are free of the pocket implantation region;
an insulating membrane that is formed on a surface of the first groove and a surface of the second groove; and
a charge accumulation layer that is formed on a surface of the insulating membrane.
19. The semiconductor device of claim 18 , wherein the insulating membrane extends below the pocket implantation region.
20. The semiconductor device of claim 18 , wherein the bottom surface of the second groove is free of the pocket implantation region.