Organic electroluminescent display device and method of fabricating the same

1. An organic electroluminescent display device, comprising:

a substrate;

a first electrode on the substrate;

an organic layer including a light-emitting layer on the first electrode;

a second electrode including lower and upper conductive layers sequentially stacked on the organic layer;

a hole penetrating the lower conductive layer and at least a portion of the organic layer, the hole not penetrating the upper conductive layer; and

an insulating pattern provided in the hole.

2. The device of claim 1 , wherein a height of the insulating pattern is smaller than or equivalent to a total thickness of the organic layer and the lower conductive layer.

3. The device of claim 1 , wherein the insulating pattern comprises at least one of a silicon oxide layer or a silicon nitride layer.

4. The device of claim 1 , wherein the first electrode comprises a layer of transparent conductive oxide, and the second electrode comprises a metal layer whose work function is lower than that of the first electrode.

5. The device of claim 1 , wherein a thickness of the upper conductive layer is greater than that of the lower conductive layer.

6. A method of fabricating an organic electroluminescent display device, comprising:

forming a first electrode on a substrate;

forming an organic layer including a light-emitting layer on the first electrode;

forming a lower conductive layer on the organic layer;

illuminating a laser onto the organic layer through an upper surface of the lower conductive layer to remove an extraneous matter from the organic layer and form a hole penetrating the lower conductive layer;

forming an insulating pattern to fill the hole; and

forming an upper conductive layer to cover the insulating pattern and the lower conductive layer, wherein the hole does not penetrate the upper conductive layer.

7. The method of claim 6 , further comprising analyzing a position of an electric short between the first electrode and the lower conductive layer.

8. The method of claim 7 , wherein the illuminating of the laser is performed in such a way that the laser is irradiated onto a region corresponding to the position of the electric short.

9. The method of claim 6 , wherein a depth of the hole is smaller than or equal to a total thickness of the organic layer and the lower conductive layer.

10. The method of claim 9 , wherein a depth of the hole is substantially equal to a height of the insulating pattern.

11. The method of claim 6 , wherein the insulating pattern is formed by depositing at least one of silicon oxide or silicon nitride.

12. The method of claim 6 , wherein a thickness of the upper conductive layer is greater than that of the lower conductive layer.

13. A method of fabricating an organic electroluminescent display device, comprising:

forming a first electrode on a substrate;

forming an organic layer including a light-emitting layer on the first electrode;

forming a lower conductive layer on the organic layer;

analyzing a position of an electric short between the first electrode and the lower conductive layer;

illuminating a laser onto the organic layer through an upper surface of the lower conductive layer to remove an extraneous matter from the organic layer and form the hole penetrating the lower conductive layer, wherein the illuminating of the laser is performed in such a way that the laser is irradiated onto a region corresponding to the position of the electric short;

forming an insulating pattern to fill the hole; and

forming an upper conductive layer to cover the insulating patter and the lower conductive layer.