IP Library Granted Patent US 9,340,064
Granted Patent B2
US 9,340,064 · App. 13/530,148 · Granted May 17, 2016

Artificial marble with transparent and amorphous pattern

Inventors: Dong Hee Kim (Uiwang-si, KR); Eung Seo Park (Uiwang-si, KR); Chang Ho Son (Uiwang-si, KR)
Assignee: Cheil Industries Inc.
B44F9/04C04B26/06C04B26/14C04B26/16C08L33/068C08L33/14C08L33/16C09D4/00C04B2111/545C04B2111/805C08L2205/02Y10T428/24802
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Quick Facts
Patent No.
US 9,340,064
App. No.
13/530,148
Granted
May 17, 2016
Kind
B2
Abstract

Artificial marble having a transparent amorphous pattern includes a base or matrix material portion and a transparent pattern portion. The pattern portion has a specific gravity or about 1.60 or more and is formed by hardening or curing a resin composition comprising a binder selected from halogenated urethane acrylates, halogenated epoxy acrylates and combinations thereof and an acrylic polymerizable monomer.

Claims (14)

1. An artificial marble having an amorphous pattern comprising a matrix and a pattern part, wherein said pattern part has a specific gravity of about 1.6 to about 2.0, and wherein said pattern part comprises a cured pattern part forming resin composition (A) comprising a binder, an acrylic polymerizable monomer, and an inorganic filler in an amount of about 0.1 to about 15 parts by weight based on about 100 parts by weight of a mixture of the binder and the acrylic polymerizable monomer.

2. The artificial marble having an amorphous pattern of claim 1 , wherein said pattern part has a transparency of more than about 70%.

3. The artificial marble having an amorphous pattern of claim 1 , wherein the binder comprises an halogenated urethane acrylate, halogenated epoxy acrylate, or a combination thereof.

4. The artificial marble having an amorphous pattern of claim 3 , wherein the pattern part forming resin composition (A) comprises about 50 to about 90 parts by weight of the binder and about 10 to about 50 parts by weight of the acrylic polymerizable monomer, based on the total weight of the pattern part forming resin composition (A).

5. The artificial marble having an amorphous pattern of claim 3 , wherein the pattern part forming resin composition (A) further comprises a reactive monomer in an amount of about 1 to about 100 parts by weight based on about 100 parts by weight of the acrylic polymerizable monomer.

6. The artificial marble having an amorphous pattern of claim 3 , wherein said acrylic polymerizable monomer comprises methyl (meth)acrylate, ethyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, dodecyl (meth)acrylate, octadecyl (meth)acrylate, methylcyclohexyl (meth)acrylate, isobornyl (meth)acrylate, phenyl (meth)acrylate, benzyl (meth)acrylate, chlorophenyl (meth)acrylate, methoxyphenyl (meth)acrylate, bromophenyl (meth)acrylate, ethylene glycol di(meth)acrylate, 1,2-propylene glycol (meth)acrylate, 1,3-butanediol di(meth)acrylate, 1,3-propylene glycol (meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,5-pentanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, dipropylene glycol di(meth)acrylate, diallyl terephthalate, diallyl phthalate, diallyl carbonate, trimethy- lolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, ethoxy ethoxyethyl acrylate, epoxy acrylate of glycidyl methacrylic acid, 1,6-hexanediol di(meth)acrylate, glycerol tri(meth)acrylate, methylpropanediol di(meth)acrylate, polyethylene glycol di(meth)acrylate, or a combination thereof.

7. The artificial marble having an amorphous pattern of claim 3 , wherein said pattern part forming resin composition further comprises an additive comprising a colorant, defoaming agent, coupling agent, ultraviolet absorber, light diffusing agent, polymerization inhibitor, antistatic agent, flame retardant, heat stabilizer or a combination thereof.

8. A method for preparing an artificial marble having an amorphous pattern, the method comprising:

mixing a polymerizable acrylic monomer with a binder comprising a halogenated urethane acrylate, halogenated epoxy acrylate or a combination of thereof and an inorganic filler in an amount of about 0.1 to about 15 parts by weight based on about 100 parts by weight of a mixture of the binder and the acrylic polymerizable monomer to prepare a pattern part forming resin composition (A) having a specific gravity of about 1.6 to about 2.0;

dissolving polyacrylate in an acrylic monomer to prepare a matrix forming slurry (B);

non-uniformly supplying both of the pattern forming resin composition (A) and the matrix forming slurry (B) into a molding cell; and

curing the pattern part forming resin composition (A) and the matrix forming slurry (B).

9. The method of claim 8 , wherein the pattern part forming resin composition (A) comprises about 50 to about 90 parts by weight of the binder and about 10 to about 50 parts by weight of the acrylic polymerizable monomer, based on the total weight of the pattern part forming resin composition (A).

10. The method of claim 8 , wherein the pattern part forming resin composition (A) further comprises a reactive monomer in an amount of about 1 to about 100 parts by weight based on about 100 parts by weight of the acrylic polymerizable monomer.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 30, 2017
From: SAMSUNG SDI CO., LTD.
To: LOTTE ADVANCED MATERIALS CO., LTD.
Reel/Frame 042114/0895 →
MERGER Recorded Jul 14, 2016
From: CHEIL INDUSTRIES INC.
To: SAMSUNG SDI CO., LTD.
Reel/Frame 039360/0858 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 22, 2012
From: KIM, DONG HEE; PARK, EUNG SEO; SON, CHANG HO
To: CHEIL INDUSTRIES INC.
Reel/Frame 028423/0758 →
Priority Claims (2)
KR 10-2009-0129746 · Dec 23, 2009 · national
KR 10-2010-0100649 · Oct 15, 2010 · national
Continuity (2)
Continuation In Part PCTKR2010007801 · Nov 5, 2010
Related Publication 20120258290A1 · Oct 11, 2012