Analyzing structured light patterns
Systems and methods may include utilizing a structured light pattern that may be, among other things, decoded in the three directions (e.g., vertical, horizontal, and diagonal). In one example, the method may include detecting a first feature of a target image in a return image, designating a feature type of the first feature, and an index with the letter, wherein the index is associated with the pattern slide. The method may also include calculating a horizontal position in the pattern slide of the first feature, calculating a vertical position in the pattern slide of the first feature, and calculating a depth of the first feature.
1. A system, comprising:
a projection device to emit light; and
a computing device to analyze a return image of the emitted light including,
a first detection module to detect a first feature of a target image in the return image, wherein the return image is to be captured onto a pattern slide fabricated according to a pattern image,
a first designation module to designate a feature type of the first feature, including assigning a first letter to the first feature,
a first association module to associate an index with the first letter, wherein the index is associated with the pattern slide,
a horizontal position module to calculate a horizontal position in the pattern slide of the first feature,
a vertical position module to calculate a vertical position in the pattern slide of the first feature, and
a depth calculation module to calculate a depth of the first feature using structured light.
2. The system of claim 1 , further including:
a second detection module to detect a second feature of the target image;
a second designation module to designate a feature type of the second feature, including assigning a second letter to the second feature; and
a second association module to associate the index with the second letter.
3. The system of claim 2 , further including a word module to associate the first letter and the second letter to form a feature word.
4. The system of claim 3 , wherein the word module is to analyze the feature word utilizing the index to calculate a horizontal position in the pattern slide of the first feature.
5. The system of claim 3 , wherein the feature word is one of a vertical feature word, a horizontal feature word, and a diagonal feature word.
6. The system of claim 1 , wherein the horizontal position module is to analyze a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word utilizing the index to calculate a horizontal position in the pattern slide of the first feature.
7. The system of claim 1 , wherein the vertical position module is to analyze a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word to determine a vertical position of the feature in a pattern slide.
8. A method of analyzing a structured light pattern, comprising:
assigning a first letter to a first feature of a target image in a return image of a structured light pattern, wherein the return image is to be captured onto a pattern slide fabricated according to a pattern image;
assigning a second letter to a second feature of the target image;
associating an index with the first letter and the second letter;
associating the first letter and the second letter to form a feature word;
calculating a horizontal position in the pattern slide of the first feature including analyzing the feature word utilizing the index; and
calculating a depth of the first feature.
9. The method of claim 8 , wherein the feature word is one of a vertical feature word, a horizontal feature word, and a diagonal feature word.
10. The method of any of claims 9 , wherein calculating a horizontal position in the pattern slide of the first feature includes analyzing a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word utilizing the index.
11. The method of claim 8 , further including calculating a vertical position in the pattern slide of the first feature.
12. The method of claim 11 , wherein calculating the vertical position in the pattern slide of the first feature includes analyzing a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word.
13. The method of claim 8 , wherein calculating a depth of the first feature includes utilizing triangulation to calculate the depth of the first feature.
14. At least one non-transitory computer readable storage medium comprising a set of instructions which, if executed by a processor, cause a computing device to:
assign a first letter to a first feature of a target image in a return image of a structured light pattern, wherein the return image is to be captured onto a pattern slide fabricated according to a pattern image;
assign a second letter to a second feature of the target image;
associate an index with the first letter and the second letter;
associate the first letter and the second letter to form a feature word;
calculate a horizontal position in the pattern slide of the first feature including analyzing the feature word utilizing the index; and
calculate a depth of the first feature.
15. The at least one medium of claim 14 , wherein the feature word is to be one of a vertical feature word, a horizontal feature word, and a diagonal feature word.
16. The at least one medium of claim 15 , wherein calculating a horizontal position in the pattern slide of the first feature is to include analyzing a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word utilizing the index.
17. The at least one medium of claim 14 , wherein, if executed, the instructions cause a computing device to calculate a vertical position in the pattern slide of the first feature.
18. The at least one medium of claim 17 , wherein if executed, the instructions cause a computing device to analyze a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word to calculate the vertical position in the pattern slide of the first feature.
19. The at least one medium of claim 18 , wherein calculating a depth of the first feature is to include utilizing triangulation to calculate the depth of the first feature.
20. An apparatus comprising:
a first assignment module to assign a first letter to a first feature of a target image in a return image of a structured light pattern, wherein the return image is to be captured onto a pattern slide fabricated according to a pattern image;
a second assignment module to assign a second letter to a second feature of the target image;
an index module to associate an index with the first letter and the second letter;
a word module to associate the first letter and the second letter to form a feature word;
a horizontal position module to calculate a horizontal position in the pattern slide of the first feature including analyzing the feature word utilizing the index; and
a depth calculation module to calculate a depth of the first feature.
21. The apparatus of claim 20 , wherein the feature word is one of a vertical feature word, a horizontal feature word, and a diagonal feature word.
22. The apparatus of claim 21 , wherein calculating a horizontal position in the pattern slide of the first feature is to include analyzing a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word utilizing the index.
23. The apparatus of claim 20 , further including a vertical position module to calculate a vertical position in the pattern slide of the first feature.
24. The apparatus of claim 23 , wherein the vertical position module is to analyze a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word to calculate the vertical position in the pattern slide of the first feature.
25. The apparatus of claim 20 , wherein calculating a depth of the first feature is to include utilizing triangulation to calculate the depth of the first feature.
26. A system comprising:
a projector;
a first assignment module to assign a first letter to a first feature of a target image in a return image of a structured light pattern, wherein the return image is to be captured onto a pattern slide fabricated according to a pattern image;
a second assignment module to assign a second letter to a second feature of the target image;
an index module to associate an index with the first letter and the second letter;
a word module to associate the first letter and the second letter to form a feature word;
a horizontal position module to calculate a horizontal position in the pattern slide of the first feature including analyzing the feature word utilizing the index; and
a depth calculation module to calculate a depth of the first feature.
27. The system of claim 26 , wherein the feature word is one of a vertical feature word, a horizontal feature word, and a diagonal feature word.
28. The system of claim 27 , wherein calculating a horizontal position in the pattern slide of the first feature is to include analyzing a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word utilizing the index.
29. The system of claim 26 , further including a vertical position module to calculate a vertical position in the pattern slide of the first feature.
30. The system of claim 26 , wherein the vertical position module is to analyze a plurality of a horizontal feature word, a vertical feature word, and a diagonal feature word to calculate the vertical position in the pattern slide of the first feature.