Composite semiconductor device with integrated diode
There are disclosed herein various implementations of composite semiconductor devices. In one implementation, such a composite semiconductor device includes a transition body formed over a diode, the transition body including more than one semiconductor layer. The composite semiconductor device also includes a transistor formed over the transition body. The diode may be connected across the transistor using through-semiconductor vias, external electrical connectors, or a combination of the two.
1. A composite semiconductor device comprising:
a diode including an anode having first and second anode layers, and a cathode having first and second cathode layers disposed over said first and second anode layers;
a transition body formed over said cathode, said transition body including a plurality of semiconductor layers;
a transistor formed over said transition body, said transistor including a source and a drain;
said source being connected to said diode by a first electrical connector;
said drain being connected to said diode by a second electrical connector.
2. The composite semiconductor device of claim 1 , wherein said transition body is compositionally graded.
3. The composite semiconductor device of claim 1 , wherein said transistor comprises a group III-V high electron mobility transistor (HEMT).
4. The composite semiconductor device of claim 1 , wherein said diode is a PN junction diode.
5. The composite semiconductor device of claim 4 , wherein said PN junction diode is lifetime engineered to reduce a recovery time for the stored charge of the diode.
6. The composite semiconductor device of claim 1 , wherein said diode is a PIN diode.
7. The composite semiconductor device of claim 1 , wherein said diode comprises a group IV diode.
8. The composite semiconductor device of claim 1 , wherein said first electrical connector connects said anode of said diode to said source of said transistor and said second electrical connector connects said cathode of said diode to said drain of said transistor.
9. The composite semiconductor device of claim 1 , wherein a breakdown voltage of said transistor is greater than a breakdown voltage of said diode.
10. The composite semiconductor device of claim 1 , wherein said first and second electrical connectors are implemented using respective first and second through-semiconductor vias.
11. The composite semiconductor device of claim 10 , wherein at least one of said first and second through-semiconductor vias includes a sidewall dielectric.
12. The composite semiconductor device of claim 1 , wherein at least one of a cathode electrode and an anode electrode of said diode is connected through a backside contact of said composite semiconductor device.
13. The composite semiconductor device of claim 1 , wherein one of said first and second electrical connectors is implemented using a through-semiconductor via and another one of said first and second electrical connectors is implemented using an external electrical connector.
14. A composite semiconductor device comprising:
a group IV diode including an anode having first and second anode layers, and a cathode having first and second cathode layers disposed over said first and second anode layers;
a group III-V transition body formed over said cathode, said group III-V transition body including plurality of group III-V semiconductor layers;
a group III-V transistor formed over said group III-V transition body, said group III-V transistor including a source and a drain;
said source being connected to said group IV diode by a first electrical connector,
said drain being connected to said group IV diode by a second electrical connector.
15. The composite semiconductor device of claim 14 , wherein said group III-V transition body is compositionally graded.
16. The composite semiconductor device of claim 14 , wherein said group III-V transistor comprises a group III-V high electron mobility transistor (HEMT).
17. The composite semiconductor device of claim 14 , wherein said group IV diode is a group IV PN junction diode.
18. The composite semiconductor device of claim 17 , wherein said group IV PN junction diode layer is lifetime engineered to reduce a recovery time for the stored charge of the diode.
19. The composite semiconductor device of claim 14 , wherein said group IV diode is a group IV PIN diode.
20. The composite semiconductor device of claim 14 , wherein said group IV diode is coupled across said group III-V transistor in an antiparallel configuration.
21. The composite semiconductor device of claim 14 , wherein a breakdown voltage of said group III-V transistor is greater than a breakdown voltage of said group IV diode.
22. The composite semiconductor device of claim 14 , wherein said first and second electrical connectors are implemented using respective first and second through-semiconductor vias.
23. The composite semiconductor device of claim 22 , wherein at least one of said first and second through-semiconductor vias includes a sidewall dielectric.
24. The composite semiconductor device of claim 14 , wherein at least one of a cathode electrode and an anode electrode of said group IV diode is connected through a backside contact of said composite semiconductor device.
25. The composite semiconductor device of claim 14 , wherein one of said first and second electrical connectors is implemented using a through-semiconductor via and another one of said first and second electrical connectors is implemented using an external electrical connector.