Nanopatterning method and apparatus
Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.
1. A method of nanopatterning comprising:
a) providing a substrate having a radiation-sensitive layer on said substrate surface;
b) providing a movable nanostructured film, having a surface relief, wherein said nanostructured film is a phase mask which causes radiation to form an interference pattern in said radiation-sensitive layer;
c) contacting said nanostructured film with said radiation-sensitive layer on said substrate along a surface of contact, wherein the nanostructured film hangs from a first and second drum and is sufficiently tacky that contact with the radiation-sensitive layer is made over a distance between the first and second drums without applied pressure;
d) distributing radiation through said contact such that the radiation source provides radiation along the distance between the drums, while translating said substrate against said film.
2. A method in accordance with claim 1 , wherein said nanostructured film causes modulation of light intensity in the plane of said radiation-sensitive layer.
3. A method in accordance with claim 2 , wherein said nanostructured film is made of conformable elastomeric material.
4. A method in accordance with claim 2 , wherein said nanostructured film is made of a more than one layer of transparent flexible materials.
5. A method in accordance with claim 4 , wherein the outer layer is made of elastomeric material.
6. A method in accordance with claim 4 , wherein the outer layer is made of silane material.
7. A method in accordance with claim 1 , wherein said surface relief is fabricated by molding or casting from nano structured master substrate.
8. A method in accordance with claim 1 , wherein a movable arm is present, but not applying pressure between the radiation sensitive layer and the nanostructured film during exposure of the radiation sensitive layer to the distributing radiation.
9. A method in accordance with claim 8 , wherein said movable arm is a cylinder.
10. A method in accordance with claim 9 , wherein said cylinder has flexible walls and is pressurized by a gas.
11. A method in accordance with claim 9 , wherein a light source is positioned inside such cylinder.
12. A method in accordance with claim 1 , wherein said substrate is translated in a direction toward or away from a contact line of said nanostructured film during distribution of radiation from said contact line.
13. A method in accordance with claim 1 , wherein said nanostructured film is moved in a closed loop.
14. A method in accordance with claim 1 , wherein said nanostructured film is translated between the first and second drums.
15. A method in accordance with claim 1 , wherein said substrate is rigid plate.
16. A method in accordance with claim 1 , wherein said substrate is has a curvature.
17. A method in accordance with claim 1 , wherein said substrate is a flexible film.
18. A method in accordance with claim 1 , wherein an additional nanostructured flexible film and a light source are provided on the other side of the substrate coated with photo-sensitive layer on both surfaces for nanopatterning on both sides of the substrate.
19. A method in accordance with claim 1 , wherein said radiation-sensitive layer is a UV-curable liquid resist.
20. An apparatus to carry out nanopatterning, comprising:
a) a nanostructured film that hangs from a first and second drum and is sufficiently tacky that contact with a radiation-sensitive layer can be made over a distance between the drums without applied pressure, wherein said nanostructured film is a phase mask which causes radiation to form an interference pattern in said radiation-sensitive layer, and;
b) a radiation source which supplies radiation of a wavelength of 650 nm or less through a portion of said nanostructured film along the distance between the first and second drums, while said portion is in contact with a radiation-sensitive layer of material.
21. An apparatus in accordance with claim 20 , wherein nanostructured film is a polymer having surface relief.
22. An apparatus in accordance with claim 20 , wherein said nanostructured film has more than one layer.
23. An apparatus in accordance with claim 20 , wherein a movable cylinder is provided to control nanostructured film contact with said radiation-sensitive layer.
24. An apparatus in accordance with claim 23 , wherein such cylinder is pressurized by a gas.
25. An apparatus in accordance with claim 20 , wherein said nanostructured film is configured to translate between the first and second drums.
26. An apparatus in accordance with claim 20 , wherein said nanostructured film is configured to move in a closed loop.