IP Library Granted Patent US 9,127,222
Granted Patent B2
US 9,127,222 · App. 13/549,385 · Granted Sep 8, 2015

System and method for protecting gasifier quench ring

Inventors: Paromita Bhattacharya (Bangalore, IN); Atul Kumar Vij (Bangalore, IN); Rajeshwar Sripada (Bangalore, IN)
Assignee: General Electric Company
C10J3/845C10J3/485C10J3/723C10J2300/1653C10J2300/1656C10J2300/1678C10K1/005Y02E20/16Y02E20/18Y10T137/0318Y10T137/8593
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Quick Facts
Patent No.
US 9,127,222
App. No.
13/549,385
Granted
Sep 8, 2015
Kind
B2
Abstract

A system includes a gasifier. The gasifier includes a reaction chamber configured to convert a feedstock into a synthetic gas, a quench chamber configured to cool the synthetic gas, and a transition section between the reaction chamber and the quench chamber. The gasifier also includes a quench ring configured to provide a first flow of a coolant to the quench chamber and a shielding gas system configured to provide a second flow of a shielding gas to protect at least one of the quench ring or the transition section.

Claims (34)

1. A system, comprising:

a gasifier, comprising:

a reaction chamber configured to convert a feedstock into a synthetic gas;

a quench chamber configured to cool the synthetic gas;

a flow path of the synthetic gas in a flow direction through the reaction chamber and the quench chamber;

a quench chamber sump configured to receive a coolant;

a dip tube disposed above the quench chamber sump, wherein the dip tube extends circumferentially about an axis of the gasifier;

a quench ring disposed above the dip tube, wherein the quench ring extends circumferentially about the axis of the gasifier, and the quench ring is configured to provide a first flow of the coolant along a surface of the dip tube to the quench chamber;

a transition section between the reaction chamber and the quench chamber;

a shielding gas system disposed downstream of the reaction chamber and upstream of the dip tube relative to the flow direction of the synthetic gas, wherein the shielding gas system comprises a shielding gas injector having at least one shielding gas outlet configured to provide a second flow of a shielding gas into the flow path of synthetic gas to protect at least one of the quench ring or the transition section.

2. The system of claim 1 , wherein the shielding gas injector is coupled to the quench ring in a side-by-side arrangement.

3. The system of claim 1 , wherein the shielding gas injector is configured to provide the second flow of the shielding gas ring along an inner circumferential surface of the quench ring exposed to the synthetic gas.

4. The system of claim 1 , wherein the shielding gas injector is configured to provide the second flow of the shielding gas ring along a bottom surface of the transition section exposed to the synthetic gas.

5. The system of claim 1 , wherein the transition section comprises a tapered refractory section and a floor section, the quench ring is disposed in the quench chamber, and the shielding gas injector is disposed downstream of the transition section between the quench ring and the floor section.

6. The system of claim 1 , wherein the shielding gas injector extends circumferentially about the axis of the gasifier.

7. The system of claim 6 , wherein the shielding gas injector comprises a hollow annular enclosure extending circumferentially about the axis of the gasifier, and the shielding gas injector comprises at least one shielding gas inlet and the at least one shielding gas outlet.

8. The system of claim 7 , wherein the at least one shielding gas outlet comprises an annular slot extending circumferentially about the axis of the gasifier.

9. The system of claim 7 , wherein the hollow annular enclosure comprises inner and outer annular chambers divided by a flow conditioning barrier.

10. The system of claim 9 , wherein the flow conditioning barrier comprises one or more openings configured to distribute the second flow of the shielding gas from the outer annular chamber to the inner annular chamber.

11. The system of claim 1 , wherein the shielding gas injector is disposed downstream from the transition section.

12. The system of claim 1 , wherein the shielding gas system is configured to provide the second flow of the shielding gas in a region to inhibit recirculation of the synthetic gas, to inhibit thermal stress, or to inhibit corrosion in the region.

13. The system of claim 1 , wherein the shielding gas system is configured to provide the second flow of the shielding gas comprising carbon dioxide or an inert gas.

14. The system of claim 13 , comprising an air separation unit configured to separate air into oxygen and nitrogen, wherein the air separation unit is configured to provide at least a portion of the nitrogen to the shielding gas system.

15. The system of claim 13 , comprising a carbon capture system configured to capture carbon dioxide from the synthetic gas, and the carbon capture system is configured to provide the carbon dioxide to the shielding gas system.

16. A system, comprising:

a shielding gas system comprising a shielding gas injector configured to provide a flow of a shielding gas through at least one shielding gas outlet into a region to protect at least one of a quench ring in a quench chamber or a transition section between reaction and quench chambers of a gasifier, wherein the region is disposed downstream of the transition section or between the reaction chamber and a dip tube below the quench ring.

17. The system of claim 16 , comprising the quench ring having an inner circumference disposed about an axis, a first axial side, and a second axial side, wherein the shielding gas injector is coupled to the first axial side.

18. The system of claim 17 , wherein the dip tube is coupled to the second axial side of the quench ring.

19. The system of claim 16 , wherein the shielding gas injector comprises a hollow enclosure extending circumferentially about a central axis, the hollow enclosure comprises at least one shielding gas inlet and the at least one shielding gas outlet, the at least one shielding gas outlet extends circumferentially about the central axis, the hollow enclosure comprises inner and outer annular chambers divided by a flow conditioning barrier, and the flow conditioning barrier comprises a plurality of openings, wherein the shielding gas injector is configured to flow the shielding gas through a flow path along the at least one shielding gas inlet, the outer annular chamber, the flow conditioning barrier, the inner annular chamber, and the at least one shielding gas outlet.

20. The system of claim 16 , wherein the region is disposed downstream of the transition section.

21. The system of claim 16 , wherein the region is disposed between the reaction chamber and a dip tube below the quench ring.

22. A method, comprising:

providing a flow of a shielding gas through at least one shielding gas outlet into a region to protect at least one of a quench ring or a transition section of a gasifier, wherein the quench ring is disposed in a quench chamber of the gasifier, and the transition section is disposed between the quench chamber and a reaction chamber of the gasifier, wherein the region is disposed downstream of the transition section or between the reaction chamber and a dip tube below the quench ring.

23. The method of claim 22 , wherein providing the flow of the shielding gas comprises receiving a nitrogen flow from an air separation unit, a carbon dioxide flow from a carbon capture system, or a combination thereof.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 22, 2019
From: GENERAL ELECTRIC COMPANY
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 050798/0659 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 17, 2012
From: BHATTACHARYA, PAROMITA; VIJ, ATUL KUMAR; SRIPADA, RAJESHWAR
To: GENERAL ELECTRIC COMPANY
Reel/Frame 028570/0789 →
Continuity (1)
Related Publication 20140014186A1 · Jan 16, 2014