Thin film transistor and thin film transistor array panel including the same
A thin film transistor, a thin film transistor array panel including the same, and a method of manufacturing the same are provided, wherein the thin film transistor includes a channel region including an oxide semiconductor, a source region and a drain region connected to the channel region and facing each other at both sides with respect to the channel region, an insulating layer positioned on the channel region, and a gate electrode positioned on the insulating layer, wherein an edge boundary of the gate electrode and an edge boundary of the channel region are substantially aligned.
1. A thin film transistor comprising:
a channel region including an oxide semiconductor;
a source region and a drain region respectively connected to two opposite sides of the channel region, wherein the source region and the drain region face each other;
an insulating layer on the channel region;
a gate electrode on the insulating layer;
a passivation layer on the gate electrode; and
a data input electrode and a data output electrode on the passivation layer, the data input electrode connected to the source region, the data output electrode connected to the drain region,
wherein an edge of the gate electrode is aligned or substantially aligned with an edge of the channel region, and wherein the data output electrode is in a same layer as a pixel electrode for displaying an image.
2. The thin film transistor of claim 1 , wherein the source region and the drain region include a reduced material of the channel region.
3. The thin film transistor of claim 2 , wherein the edge of the gate electrode is aligned or substantially aligned with an edge of the insulating layer.
4. The thin film transistor of claim 1 , wherein the passivation layer directly contacts a side surface of the insulating layer.
5. A thin film transistor array panel comprising:
an insulation substrate;
a channel region on the insulation substrate, the channel region including an oxide semiconductor;
a source region and a drain region respectively connected to two opposite sides of the channel region, wherein the source region and the drain region face each other;
an insulating layer on the channel region;
a gate electrode on the insulating layer;
a passivation layer on the gate electrode; and
a data input electrode and a data output electrode on the passivation layer, the data input electrode connected to the source region, the data output electrode connected to the drain region,
wherein an edge of the gate electrode is aligned or substantially aligned with an edge of the channel region, and wherein the data output electrode is in a same layer as a pixel electrode for displaying an image.
6. The thin film transistor array panel of claim 5 , wherein the source region and the drain region include a reduced material of the channel region.
7. The thin film transistor array panel of claim 6 , wherein the edge of the gate electrode is aligned or substantially aligned with an edge of the insulating layer.
8. The thin film transistor array panel of claim 7 , further comprising a buffer layer between the insulation substrate and the channel region.
9. The thin film transistor array panel of claim 8 , wherein at least one of the buffer layer or the insulating layer includes an insulating oxide.
10. The thin film transistor array panel of claim 5 , wherein the passivation layer directly contacts a side surface of the insulating layer.
11. A thin film transistor comprising:
a substrate;
a semiconductor pattern including a source region, a drain region, and a channel region between the source region and the drain region;
a gate electrode on the semiconductor pattern;
a passivation layer on the gate electrode; and
a data input electrode and a data output electrode on the passivation layer, the data input electrode connected to the source region, the data output electrode connected to the drain region,
wherein the gate electrode overlaps the channel region but does not overlap the source region or the drain region; and
the data output electrode is in a same layer as a pixel electrode for displaying an image.
12. The thin film transistor of claim 11 , further comprising a light blocking film between the substrate and the semiconductor pattern, wherein the semiconductor pattern overlaps the light blocking film.
13. The thin film transistor of claim 11 , wherein the passivation layer directly contacts a side surface of the insulating layer.