Modular system and process for continuous deposition of a thin film layer on a substrate
View Patent ↗A system for vapor deposition of a thin film layer on a photovoltaic module substrate is provided. The system includes a vacuum chamber having a pre-heat section, a vapor deposition apparatus, and a cool-down section; and a conveyor system operably disposed within said vacuum chamber and configured for conveying the substrates in a serial arrangement from said pre-heat section and through said vapor deposition apparatus at a controlled constant linear speed. The vapor deposition apparatus is configured for depositing a thin film of a sublimed source material onto an upper surface of the substrates as the substrates are continuously conveyed by said conveyor system through said vapor deposition apparatus.
1. A system for vapor deposition of a thin film layer on photovoltaic module substrates, comprising:
a vacuum chamber, said vacuum chamber further comprising a pre-heat section, a vapor deposition apparatus, and a cool-down section;
a conveyor system operably disposed within said vacuum chamber and configured for conveying the substrates in a serial arrangement from said pre-heat section and through said vapor deposition apparatus at a controlled constant linear speed;
an entry vacuum lock station upstream of said vacuum chamber,
an exit vacuum lock station downstream of said vacuum chamber in a conveyance direction of the substrates through said vacuum chamber; and
said vapor deposition apparatus configured for depositing a thin film of a sublimed source material onto an upper surface of the substrates as the substrates are continuously conveyed by said conveyor system through said vapor deposition apparatus.
2. The system as in claim 1 , further comprising:
a post-heat section disposed within said vacuum chamber between said vapor deposition apparatus and said cool-down section, said post-heat section having a length so as to maintain the substrates conveyed from said vapor deposition apparatus at a desired heated temperature until the entire substrate has exited said vapor deposition apparatus.
3. The system as in claim 1 , wherein said vacuum chamber comprises a plurality of interconnected modular units, with each of said modular units having an independent conveyor, said conveyors individually controlled so that the substrates are conveyed through said vacuum chamber at a desired heating rate, vapor deposition rate, and cool down rate.
4. The system as in claim 3 , wherein said pre-heat section and said cool-down section each comprise a plurality of said modular units.
5. The system as in claim 4 , wherein said vapor deposition apparatus comprises a modular unit interconnected between a last one of said pre-heat section modular units and a first one of said cool-down section modular units.
6. The system as in claim 4 , wherein said vapor deposition apparatus comprises a modular unit connected to a last one of said pre-heat section modular units, and further comprising a post-heat modular unit connected between said vapor deposition modular unit and a first one of said cool-down section modular units.
7. The system as in claim 3 , wherein each of said modular units comprise a respective controller such that function and conveyance speed of each respective said modular unit is independently controllable, said controllers connected to a central control system.
8. The system as in claim 1 , further comprising:
a feed system configured with said vapor deposition apparatus to supply source material without interrupting the continuous vapor deposition process or conveyance of the substrates through said vapor deposition apparatus, said feed system configured to continuously introduce metered doses of the source material into said vapor deposition apparatus, said feed system connectable to an external supply source of the source material.