Dual lasers for removing glass-side debris during the manufacture of thin film photovoltaic devices
Methods and systems for forming a scribe line in a thin film stack on an inner surface of a thin film photovoltaic superstrate are provided via the use of a cleaning laser beam and a scribing laser beam. The cleaning laser beam is focused directly onto the exposed surface of the superstrate such that the cleaning laser beam removes debris from the exposed surface of the superstrate, and the scribing laser beam is focused through the exposed surface of the superstrate and onto the thin film stack such that the scribing laser beam passes through the superstrate to form a scribe within the thin film stack on the inner surface of the superstrate. The method and system can further utilize a conveyor to transport the superstrate in a machine direction to move the superstrate past the cleaning laser source and the scribing laser source.
1. A method of forming a scribe line in a thin film stack on an inner surface of a thin film photovoltaic superstrate, wherein the superstrate defines an exposed surface opposite from the inner surface, the method comprising:
focusing a cleaning laser beam generated by a cleaning laser source directly onto the exposed surface of the superstrate such that the cleaning laser beam removes debris from the exposed surface of the superstrate; and,
focusing a scribing laser beam generated by a scribing laser source through the exposed surface of the superstrate and onto the thin film stack such that the scribing laser beam passes through the superstrate to form a scribe within the thin film stack on the inner surface of the superstrate.
2. The method as in claim 1 , further comprising:
transporting the superstrate in a machine direction to move the superstrate past the cleaning laser source and the scribing laser source.
3. The method as in claim 1 , wherein the cleaning laser beam is oriented at an angle with respect to the exposed surface of the superstrate.
4. The method as in claim 3 , wherein the scribing laser beam is oriented substantially perpendicular to the exposed surface of the superstrate.
5. The method as in claim 1 , wherein the cleaning laser beam and the scribing laser beam are sequentially directed toward the exposed surface of the superstrate such that the cleaning laser beam removes debris on the exposed surface of the superstrate prior to the scribing laser beam forming the scribe within the thin film stack.
6. The method as in claim 1 , wherein the cleaning laser beam has a first wavelength and the scribing laser beam has a second wavelength, and wherein the first wavelength and the second wavelength are different.
7. The method as in claim 6 , wherein the first wavelength is about 100 nm to about 500 nm.
8. The method as in claim 1 , wherein focusing the cleaning laser beam onto the exposed surface of the superstrate to remove debris results in a cleaned, exposed surface of the superstrate; and focusing the scribing laser beam further includes passing the scribing laser beam through the cleaned, exposed surface of the superstrate.
9. A method of forming a scribe line in a thin film stack on an inner surface of a thin film photovoltaic superstrate, wherein the superstrate defines an exposed surface opposite from the inner surface, the method comprising:
focusing a cleaning laser beam generated by a cleaning laser source directly onto the exposed surface of the superstrate such that the cleaning laser beam removes debris from the exposed surface of the superstrate; and,
focusing a scribing laser beam generated by a scribing laser source through the exposed surface of the superstrate and onto the thin film stack such that the scribing laser beam passes through the superstrate to form a scribe within the thin film stack on the inner surface of the superstrate,
wherein the cleaning laser beam and the scribing laser beam are coaxial to each other when contacting the exposed surface of the superstrate.
10. The method as in claim 9 , wherein the cleaning laser beam forms a sheath surrounding the scribing laser beam.
11. The method as in claim 9 , wherein the cleaning laser beam and the scribing laser beam are oriented substantially perpendicular to the exposed surface of the superstrate.
12. The method as in claim 9 , wherein the at least a portion of the cleaning laser beam is reflected off of a beam splitter and redirected toward the exposed surface of the superstrate, and wherein at least a portion of the scribing laser beam passes through the beam splitter toward the exposed surface of the superstrate.
13. The method as in claim 9 , wherein the at least a portion of the scribing laser beam is reflected off of a beam splitter and redirected toward the exposed surface of the superstrate, and wherein at least a portion of the cleaning laser beam passes through the beam splitter toward the exposed surface of the superstrate.
14. A system for forming a scribe line in a thin film stack on an inner surface of a thin film photovoltaic superstrate, wherein the superstrate defines an exposed surface opposite from the inner surface, the system comprising:
a conveyor configured to transport the superstrate in a machine direction;
a cleaning laser source configured to generate a cleaning laser beam focused directly onto the exposed surface of the superstrate to remove debris from the exposed surface of the superstrate; and,
a scribing laser source configured to generate a scribing laser beam through the exposed surface of the superstrate and focused on the inner surface of the superstrate in order to form a scribe within the thin film stack on the inner surface of the superstrate.
15. The system as in claim 14 , wherein the cleaning laser source and the scribing laser source are sequentially positioned such that the superstrate is exposed to the cleaning laser beam prior to the scribing laser beam.
16. The system as in claim 14 , wherein the cleaning laser beam is oriented at an angle with respect to the exposed surface of the superstrate.
17. A system for forming a scribe line in a thin film stack on an inner surface of a thin film photovoltaic superstrate, wherein the superstrate defines an exposed surface opposite from the inner surface, the system comprising:
a conveyor configured to transport the superstrate in a machine direction;
a cleaning laser source configured to generate a cleaning laser beam focused directly onto the exposed surface of the superstrate to remove debris from the exposed surface of the superstrate; and,
a scribing laser source configured to generate a scribing laser beam through the exposed surface of the superstrate and focused on the inner surface of the superstrate in order to form a scribe within the thin film stack on the inner surface of the superstrate;
wherein the cleaning laser beam and the scribing laser beam are coaxial to each other when contacting the exposed surface of the superstrate.
18. The system as in claim 17 , wherein the cleaning laser beam forms a sheath surrounding the scribing laser beam.
19. The system as in claim 17 , wherein the cleaning laser beam and the scribing laser beam are oriented substantially perpendicular to the exposed surface of the superstrate.
20. The system as in claim 17 , further comprising:
a beam splitter, wherein the at least a portion of the cleaning laser beam is reflected off of the beam splitter and redirected toward the exposed surface of the superstrate, and wherein at least a portion of the scribing laser beam passes through the beam splitter toward the exposed surface of the superstrate.
21. The system as in claim 17 , further comprising:
a beam splitter, wherein the at least a portion of the scribing laser beam is reflected off of the beam splitter and redirected toward the exposed surface of the superstrate, and wherein at least a portion of the cleaning laser beam passes through the beam splitter toward the exposed surface of the superstrate.