Nonvolatile semiconductor memory apparatus and manufacturing method thereof
View Patent ↗A nonvolatile semiconductor memory apparatus including a substrate, lower-layer electrode wires provided on the substrate, an interlayer insulating layer provided with contact holes at locations respectively opposite to the lower-layer electrode wires, resistance variable layers which are respectively connected to the lower-layer electrode wires; and non-ohmic devices which are respectively provided on the resistance variable layers. The non-ohmic devices each has a laminated-layer structure including plural semiconductor layers, a laminated-layer structure including a metal electrode layer and an insulator layer, or a laminated-layer structure including a metal electrode layer and a semiconductor layer. One layer of the laminated-layer structure is embedded to fill each of the contact holes and the semiconductor layer or the insulator layer which is the other layer of the laminated-layer structure has a larger area than an opening of each of the contact holes and is provided on the interlayer insulating layer.
1. A method of manufacturing a nonvolatile semiconductor memory apparatus comprising:
a step for forming stripe-shaped lower-layer electrode wires on a substrate;
a step for forming an interlayer insulating layer on the substrate including the lower-layer electrode wires;
a step for forming contact holes in an interlayer insulating layer at locations respectively opposite to the lower-layer electrode wires;
a step for embedding resistance variable layers to fill the contact holes except for portions at an upper side of the interlayer insulating layer;
a step for embedding at least one layers of laminated-layer structures respectively forming non-ohmic devices to fill the portions at the upper side of the contact holes; and
a step for forming, on the interlayer insulating layer, the other layers of the laminated-layer structures respectively forming the non-ohmic devices such that the other layers have a larger area than openings of the contact holes.
2. The method of manufacturing the nonvolatile semiconductor memory apparatus according to claim 1 , wherein
the step for embedding the resistance variable layers to fill the contact holes includes a step for forming, inside the contact holes and on the interlayer insulating layer, a first deposited film which is made of a material for the resistance variable layers and a step for removing a portion of the first deposited film which covers a surface of the interlayer insulating layer; and
the step for embedding at least one layers of laminated-layer structures respectively forming non-ohmic devices to fill the portions at the upper side of the contact holes includes a step for removing portions of the first deposited film inside the contact holes to form recesses formed by the contact holes and the first deposited film, a step for forming, inside the recesses and on the interlayer insulating layer, a second deposited film which is made of a material for the at least one layers, and a step for removing a portion of the second deposited film which covers the surface of the interlayer insulating layer.
3. A method of manufacturing a nonvolatile semiconductor memory apparatus comprising the steps as recited in claim 1 plural times to stack the resistance variable layers and the non-ohmic devices to form a layer structure.
4. The method of manufacturing the nonvolatile semiconductor memory apparatus according to claim 1 , wherein the other layers of the laminated-layer structures respectively forming the non-ohmic devices are formed in stripe shape on the interlayer insulating layer so as to respectively cross the lower-layer electrode wires.
5. The method of manufacturing the nonvolatile semiconductor memory apparatus according to claim 1 , further comprising:
forming stripe-shaped upper-layer electrode wires on the non-ohmic devices such that the upper-layer electrode wires are respectively connected to the non-ohmic devices and respectively cross the lower-layer electrode wires.