Porous silicon-based electrode active material and secondary battery comprising the same

1. A porous silicon-based electrode active material comprising:

a silicon phase,

a SiO x (0<x<2) phase, and

a silicon dioxide phase dispersed in the SiO x phase,

wherein the silicon dioxide phase is crystalline and comprises cristoballite,

wherein the silicon dioxide phase is present in an amount of 2-50 wt % based on the weight of the silicon-based anode active material,

wherein the porous silicon-based anode active material has a porosity of 7-71%, and

wherein a concentration of the silicon phase is higher center portion than center-periphery portion of the electrode active material and a concentration of the silicon dioxide phase is higher center-periphery portion than center portion of the electrode active material.

2. The porous silicon-based electrode active material of claim 1 , wherein x in the SiO x is 0.5-1.2 or the SiO x is silicon monoxide.

3. The porous silicon-based electrode active material of claim 1 , wherein the electrode active material comprises honeycomb-shaped pores on at least a surface thereof.

4. The porous silicon-based electrode active material of claim 1 , wherein the silicon phase and the silicon dioxide phase is formed by disproportionation of SiO x (0<x<2).

5. A secondary battery, which comprises a cathode comprising a cathode active material, a separator, an anode comprising an anode active material, and an electrolyte, wherein the cathode active material or the anode active material comprises the electrode active material of any one of claims 1 to 4 .

6. The secondary battery of claim 5 , wherein the cathode active material or the anode active material further comprises one or more selected from the group consisting of graphite, soft carbon, hard carbon, and lithium titanium oxide.

7. A method for preparing a porous silicon-based electrode active material, the method comprising:

mixing a fluorine-based solution and a metal precursor solution and bringing the mixture into contact with SiO x (0<x<2)-containing particles, thus electrodepositing metal particles on the surface of the SiO x -containing particles;

bringing the metal particle-electrodeposited, SiO x -containing particles into contact with an etching solution, thus etching the SiO x -containing particles;

bringing the etched SiO x -containing particles into contact with a metal removing solution, thus removing the metal particles;

mixing the SiO x -containing particles, from which the metal particles have been removed, with a solution of an alkaline hydroxide in a polar solvent; and

evaporating the polar solvent from the SiO x -containing particles, and then heat-treating the SiO x -containing particles.

8. The method of claim 7 , wherein the fluorine-based solution is one or more selected from the group consisting of hydrogen fluoride (HF), fluorosilicate (H 2 SiF 6 ) and ammonium fluoride (NH 4 F) and the metal precursor solution comprises one or more selected from the group consisting of silver, gold, platinum and copper and the fluorine-based solution and the metal precursor solution are mixed with each other at a volume ratio of 10-90:90-10.

9. The method of claim 7 , wherein the SiO x -containing particles are used in an amount of 0.001-50 parts by weight based on 100 parts by weight of the mixed solution of the fluorine-based solution and the metal precursor solution.

10. The method of claim 7 , wherein the etching occurs under the metal particles of the metal particle-electrodeposited, SiO x -containing particles.

11. The method of claim 7 , wherein the etching solution is a mixed solution of hydrogen fluoride (HF) and hydrogen peroxide (H 2 O 2 ) and the hydrogen fluoride (HF) and hydrogen peroxide (H 2 O 2 ) are mixed with each other at a volume ratio of 10-90:90-10.

12. The method of claim 7 , wherein the metal removing solution is one or more selected from the group consisting of nitric acid, sulfuric acid and hydrochloric acid.

13. The method of claim 7 , wherein the alkaline hydroxide is one or more selected from the group consisting of LiOH, NaOH, KOH, Be(OH) 2 , Mg(OH), Ca(OH) 2 , and hydrates thereof.

14. The method of claim 7 , wherein the SiO x , from which metal particles have been removed, is mixed in an amount of 0.01-30 wt % based on the weight of the alkaline hydroxide.

15. The method of claim 7 , wherein the heat treatment is carried out at 750-1000° C. for 5-120 minutes.

16. The method of claim 7 , wherein the SiO x -containing particles are disproportionated into silicon and silicon dioxide by the heat treatment.

17. The method of claim 7 , wherein the method further comprises filtering the heat-treated SiO x -containing particles.

18. The method of claim 7 , wherein the method further comprises coating the heat-treated SiO x -containing particles with carbon.

19. The method of claim 18 , wherein the carbon is used in an amount of 1-30 wt % based on the total weight of the electrode active material.