Method of forming a straight top main pole for PMR bevel writer
View Patent ↗A method of forming a magnetic recording head is provided. The method comprises the steps of forming a damascene trench comprising a lower region having a substantially trapezoidal cross-section and an upper region having a substantially rectangular cross-section, and providing a magnetic material within the damascene trench.
1. A method of forming a magnetic recording head, comprising:
forming a damascene trench comprising a lower region having a trapezoidal cross-section and an upper region having a rectangular cross-section;
providing a magnetic material within the damascene trench, wherein the magnetic material forms a throat region extending to an air bearing surface of the magnetic recording head, the throat region comprising:
a lower portion having a trapezoidal cross-section at the air bearing surface; and
an upper portion having a rectangular cross-section at the air bearing surface; and
removing a portion of the magnetic material in the upper portion to form a beveled surface such that the beveled surface is confined in the upper portion.
2. The method according to claim 1 , wherein the beveled surface extends from the air bearing surface of the magnetic recording head partway along the throat region of the magnetic recording head.
3. The method according to claim 1 , wherein the removing the portion of the magnetic material comprises ion beam etching.
4. The method according to claim 1 , further comprising:
disposing a trailing shield over the magnetic material in the upper region of the trench near the air bearing surface of the magnetic recording head.
5. The method according to claim 1 , wherein the trapezoidal cross-section of the lower portion is substantially constant along the throat region of the magnetic recording head.
6. The method according to claim 1 , wherein the upper portion comprises substantially parallel side walls.
7. The method according to claim 1 , wherein the forming the damascene trench comprises:
providing a first substrate;
disposing a sacrificial material in the shape of the upper region over the first substrate;
providing a second substrate over the first substrate and around the sacrificial material;
removing the sacrificial material; and
reactive ion etching the lower region out of the first substrate.
8. The method according to claim 7 , wherein the first and second substrates are alumina.
9. The method according to claim 7 , wherein the sacrificial material is photoresist.
10. The method according to claim 1 , wherein the magnetic material is provided within the damascene trench via electroplating.