Bath deposition solution for the wet-chemical deposition of a metal sulfide layer and related production method
View Patent ↗A bath deposition solution for the chemical bath deposition of a metal sulfide layer, a process for the production of such a bath deposition solution, and a process for producing a metal sulfide layer on a substrate using such a bath deposition solution are provided. The bath deposition solution contains a metal salt, an organosulfide, a chelating agent which with metal ions of the metal salt forms a chelate complex and ammonium hydroxide.
1. A bath deposition solution for chemical bath deposition of a metal sulfide layer, the bath deposition solution comprising:
a metal salt;
an organosulfide;
a chelating agent which with metal ions of the metal salt forms a chelate complex; and
ammonium hydroxide, wherein
the organosulfide is thioacetamide, and
the chelating agent is one of nitrilotriacetic acid, iminodiacetic acid, and a metal salt thereof.
2. The bath deposition solution as claimed in claim 1 , wherein:
the metal salt is at least one of a Zn and an In salt.
3. The bath deposition solution as claimed in claim 2 , wherein at least one of:
the metal salt is present in a concentration of from about 1 mM to about 50 mM,
the organosulfide is present in a concentration of from about 1 mM to about 150 mM,
the chelating agent is present in a concentration of from about 0.01 M to about 1.0 M, and
the ammonium hydroxide is present in a concentration of from about 0.01 M to about 3.0 M.
4. The bath deposition solution as claimed in claim 1 , wherein at least one of:
the metal salt is present in a concentration of from about 1 mM to about 50 mM,
the organosulfide is present in a concentration of from about 1 mM to about 150 mM,
the chelating agent is present in a concentration of from about 0.01 M to about 1.0 M, and
the ammonium hydroxide is present in a concentration of from about 0.01 M to about 3.0 M.
5. The bath deposition solution as claimed in claim 1 , wherein the solution has a pH in the basic range up to the neutral range.
6. The bath deposition solution as claimed in claim 2 , wherein the solution has a pH in the basic range up to the neutral range.
7. The bath deposition solution as claimed in claim 3 , wherein the solution has a pH in the basic range up to the neutral range.