Thin-film photoelectric conversion device and method for production thereof

1. A thin-film photoelectric conversion device, comprising: a first electrode layer; one or more photoelectric conversion units; and a second electrode layer, arranged in this order on a substrate,

each photoelectric conversion unit comprising a photoelectric conversion layer sandwiched between a p-type semiconductor layer and an n-type semiconductor layer, wherein

at least one photoelectric conversion unit is a crystalline germanium photoelectric conversion unit including a crystalline germanium photoelectric conversion layer,

the crystalline germanium photoelectric conversion layer is a substantially intrinsic or a weak n-type layer consisting of a crystalline germanium semiconductor layer essentially free of silicon atoms,

a first interface layer comprising a substantially intrinsic amorphous silicon semiconductor layer is arranged between the p-type semiconductor layer and the crystalline germanium photoelectric conversion layer in the crystalline photoelectric conversion unit, and

the first interface layer has a thickness in the range of 1 nm or more and 20 nm or less.

2. The thin-film photoelectric conversion device according to claim 1 , wherein the first interface layer has a hydrogen concentration, detected by secondary ion mass spectroscopy, of 7×10 21 atom/cm 3 or more and 1.5×10 22 atom/cm 3 or less.

3. The thin-film photoelectric conversion device according to claim 1 , wherein the p-type semiconductor layer is arranged on the crystalline germanium semiconductor layer at a side close to the substrate, and the n-type semiconductor layer is arranged on the crystalline germanium semiconductor layer at a side far from the substrate.

4. The thin-film photoelectric conversion device according to claim 1 , wherein the crystalline germanium photoelectric conversion layer has a thickness in the range of 50 nm or more and 100 nm or less.

5. The thin-film photoelectric conversion device according to claim 1 , wherein a second interface layer consisting of a substantially intrinsic non-single crystal silicon semiconductor layer is arranged between the n-type semiconductor layer and the crystalline germanium photoelectric conversion layer.

6. The thin-film photoelectric conversion device according to claim 5 , wherein the second interface layer is a layer comprising: a substantially intrinsic amorphous silicon semiconductor layer; and a substantially intrinsic crystalline silicon layer, arranged in this order from a side close to the n-type semiconductor layer.

7. The thin-film photoelectric conversion device according to claim 1 , wherein the p-type semiconductor layer of the crystalline germanium photoelectric conversion unit is one or more selected from the group consisting of crystalline silicon, amorphous silicon, crystalline silicon germanium, amorphous silicon germanium, crystalline germanium and amorphous germanium.

8. The thin-film photoelectric conversion device according to claim 7 , wherein the p-type semiconductor layer is crystalline silicon.

9. The thin-film photoelectric conversion device according to claim 1 , wherein the n-type semiconductor layer of the crystalline germanium photoelectric conversion unit is one or more selected from the group consisting of crystalline silicon, amorphous silicon, crystalline silicon germanium, amorphous silicon germanium, crystalline germanium and amorphous germanium.

10. The thin-film photoelectric conversion device according to claim 9 , wherein the n-type semiconductor layer is amorphous silicon.

11. The thin-film photoelectric conversion device according to claim 1 , wherein, between a transparent electrode layer and the crystalline germanium photoelectric conversion unit, an amorphous silicon photoelectric conversion unit and a crystalline silicon photoelectric conversion unit are arranged in this order from a light incident side.

12. A method for producing a thin-film photoelectric conversion device, the method comprising:

arranging a first electrode layer, one or more photoelectric conversion units, and a second electrode layer, in this order on a substrate, each photoelectric conversion unit comprising a photoelectric conversion layer sandwiched between a p-type semiconductor layer and an n-type semiconductor layer, wherein at least one photoelectric conversion unit is a crystalline germanium photoelectric conversion unit including a crystalline germanium photoelectric conversion layer, the crystalline germanium photoelectric conversion layer being a substantially intrinsic or a weak n-type layer consisting of a crystalline germanium semiconductor layer essentially free of silicon atoms;

providing a first interface layer comprising a substantially intrinsic amorphous silicon semiconductor layer that is arranged between the p-type semiconductor layer and the crystalline germanium photoelectric conversion layer in the crystalline photoelectric conversion unit, wherein the first interface layer has a thickness in the range of 1 nm or more and 20 nm or less; and

forming the crystalline germanium photoelectric conversion layer by a plasma-enhanced CVD method with a substrate temperature being within a range from 120° C. or higher and 250° C. or lower.

13. The method for producing the thin-film photoelectric conversion device according to claim 12 , wherein

in the step of forming the crystalline germanium photoelectric conversion layer by the plasma-enhanced CVD method, a gas is supplied to a deposition chamber through a shower plate which is a plate perforated with numerous open holes, and a flow velocity of the gas at a time when the gas passes through the shower plate is set to 0.1 m/s or more and 10 m/s or less.

14. A method for producing a thin-film photoelectric conversion device, the method comprising:

arranging a first electrode layer, an amorphous silicon photoelectric conversion unit, a crystalline silicon photoelectric conversion unit, a crystalline germanium photoelectric conversion unit, and a second electrode layer, in this order on a substrate, each photoelectric conversion unit comprising a photoelectric conversion layer sandwiched between a p-type semiconductor layer and an n-type semiconductor layer, the crystalline germanium photoelectric conversion unit including a crystalline germanium photoelectric conversion layer, wherein the crystalline germanium photoelectric conversion layer is a substantially intrinsic or a weak n-type layer consisting of a crystalline germanium semiconductor layer essentially free of silicon atoms;

providing a first interface layer comprising a substantially intrinsic amorphous silicon semiconductor layer that is arranged between the p-type semiconductor layer and the crystalline germanium photoelectric conversion layer in the crystalline photoelectric conversion unit, wherein the first interface layer has a thickness in the range of 1 nm or more and 20 nm or less, and wherein between a transparent electrode layer and the crystalline germanium photoelectric conversion unit, the amorphous silicon photoelectric conversion unit and the crystalline silicon photoelectric conversion unit are arranged in this order from a light incident side; and

forming the crystalline germanium photoelectric conversion layer by a plasma-enhanced CVD method with a substrate temperature being within a range from 120° C. or higher and 250° C. or lower, wherein

in the step of forming the crystalline germanium photoelectric conversion layer by the plasma-enhanced CVD method, a gas is supplied to a deposition chamber through a shower plate which is a plate perforated with numerous open holes, and a flow velocity of the gas at a time when the gas passes through the shower plate is set to 0.1 m/s or more and 10 m/s or less.