Methods for providing run to run process control using a dynamic tuner

1. A method for providing run to run process control of a process control parameter using a dynamic tuner, the method comprising:

receiving a data point for a process output parameter at a processor;

determining, by the processor, whether the data point is within a desired range for the process output parameter;

setting, by the processor, when the data point is within the desired range, a dynamic lambda value equal to a preselected base lambda value;

setting, by the processor, when the data point is not within the desired range, the dynamic lambda value equal to a value based on the preselected base lambda value, a degree of difference between the data point and a target for the process output parameter, and a scale factor;

calculating, by the processor, an exponentially weighted moving average using the dynamic lambda value;

adjusting, by the processor, the process control parameter in accordance with the exponentially weighted moving average to produce an adjusted process control parameter; and

controlling a manufacturing device using the adjusted process control parameter.

2. The method of claim 1 , further comprising calculating a predicted control process parameter based on the data point, wherein the calculating the exponentially weighted moving average using the dynamic lambda value comprises using the predicted process control parameter.

3. The method of claim 1 , wherein the desired range is determined based on empirical data.

4. The method of claim 1 , wherein the scale factor represents a preselected degree of aggression for tuning the process control parameter to meet the target for the process output parameter.

5. The method of claim 1 , wherein a higher value for the scale factor corresponds to a higher degree of aggression for tuning the process control parameter to meet the target for the process output parameter.

6. The method of claim 1 , wherein the scale factor is a number greater than 0.

7. The method of claim 1 , wherein the process control parameter is selected from the group consisting of a polishing rate, a deposition rate, an etch rate, and an angle control for a material removal process.

8. The method of claim 1 , wherein the process control parameter comprises a back pressure for a chemical mechanical planarization process.

9. The method of claim 1 , wherein the setting, when the data point is not within the desired range, the dynamic lambda value comprises setting the dynamic lambda value equal to a first value of the preselected base lambda value plus an absolute value of the data point minus the target for the process output parameter where the first value is multiplied by the scale factor.

10. The method of claim 1 , wherein the setting, when the data point is not within the desired range, the dynamic lambda value comprises decreasing the dynamic lambda value when a value, equal to an absolute value of the data point minus the target for the process output parameter, decreases.

11. The method of claim 1 , wherein the setting, when the data point is not within the desired range, the dynamic lambda value comprises increasing the dynamic lambda value when a value, equal to an absolute value of the data point minus the target for the process output parameter, increases.

12. The method of claim 1 , wherein the scale factor is selected based on a degree of difference between the data point and the target for the process output parameter such that the dynamic lambda value is greater than 0 and less than 1.

13. The method of claim 1 , wherein the preselected base lambda value is greater than 0 and less than 1.

14. The method of claim 1 , wherein the dynamic lambda value is greater than 0 and less than 1.