Semiconductor device and semiconductor device manufacturing method
A semiconductor device includes: a semiconductor substrate; a first transistor which is formed on the semiconductor substrate and includes a source/drain region and a gate electrode; an insulating film which covers the source/drain region and the gate electrode of the first transistor; and a first contact plug which is formed in the insulating film and is connected to the source/drain region or the gate electrode of the first transistor, wherein the first contact plug includes a first column section which extends in a thickness direction of the insulating film and is in contact with the source/drain region or the gate electrode of the first transistor, and a first flange section which juts out from an upper portion of the first column section in a direction parallel to a surface of the insulating film, and an upper surface of the first flange section is planarized.
1. A semiconductor device comprising:
a semiconductor substrate;
a first transistor, that includes a first source/drain region and a first gate electrode, formed on the semiconductor substrate;
a second transistor, that includes a second source/drain region and a second gate electrode, formed on the semiconductor substrate;
an insulating film that covers the first and second source/drain regions and the first and second gate electrodes; and
a first contact plug formed in the insulating film and connected to the first source/drain region and the second gate electrode,
wherein:
the first contact plug includes a first column section, a second column section and a first flange section,
the first column section extends from the first flange section to the first source/drain region and is in contact with the first source/drain region,
the second column section extends from the first flange section to the second gate electrode and is in contact with the second gate electrode,
the first flange section juts out from an upper portion of the first column section and an upper portion of the second column section in a plan view, and an upper surface of the first flange section is planarized,
the first column section, the second column section and the flange section include a same material, and
the first flange section is connected to the first column section and the second column section.
2. The semiconductor device according to claim 1 , wherein the first transistor and the second transistor are load transistors in an SRAM.
3. The semiconductor device according to claim 1 , wherein
the first column section and the second column section are disposed side by side in a direction intersecting an extending direction of the gate electrode of the second transistor, and
the first flange section juts out in a direction intersecting the extending direction of the gate electrode of the second transistor.
4. The semiconductor device according to claim 1 ,
further comprising
a third transistor, that includes a third source/drain region and a third gate electrode, formed on the semiconductor substrate; and
a second contact plug formed in the insulating film and connected to the third source/drain region or the third gate electrode,
wherein:
the insulating film covers the third source/drain region and the third gate electrode,
the second contact plug includes a third column section and a second flange section,
the third column section extends from the second flange section to the third source/drain region or third gate electrode and is in contact with the third source/drain region or the third gate electrode, and
the second flange section juts out from an upper portion of the third column section in a plan view and has a planarized upper surface; and
a cross section of the third column section has a same shape of a cross section of the first column shape or a cross section of the second column shape.
5. The semiconductor device according to claim 1 , wherein the first flange section juts out either in a direction intersecting the extending direction of the first gate electrode, or in a direction parallel to the extending direction of the first gate electrode.
6. The semiconductor device according to claim 5 , wherein with respect to a direction intersecting the direction in which the first flange section juts out, a dimension of the first flange section and a dimension of the first column section are equal to each other.
7. The semiconductor device according to claim 1 , wherein:
the insulating film includes
a first insulating film and
a second insulating film, that includes a material different from a material of the first insulating film, formed on the first insulating film;
the first column section is disposed in the first insulating film;
the first flange section is disposed in the second insulating film; and
an upper surface of the second insulating film and an upper surface of the first flange section are flush with each other.
8. The semiconductor device according to claim 1 , further comprising a wiring layer formed on the first flange section.