Wavelength converting material deposition methods and associated articles
Systems and methods related to the arrangement of regions containing wavelength-converting materials, and associated articles, are provided.
1. A method, comprising:
providing a substrate over which a mask material and a wavelength-converting material are positioned, wherein:
the mask material covers at least a first portion of an exterior surface of the substrate,
the mask material does not cover at least a second portion of the exterior surface of the substrate, and
the wavelength-converting material is positioned over the mask material and the second portion of the exterior surface of the substrate;
removing a portion of the wavelength-converting material such that wavelength-converting material is no longer positioned over at least a portion of the mask material and at least a portion of the wavelength-converting material remains positioned over the second portion of the exterior surface of the substrate; and
after the portion of the wavelength-converting material has been removed, removing at least a portion of the mask material.
2. The method of claim 1 , comprising forming the mask material over the substrate.
3. The method of claim 2 , comprising, after forming the mask material over the substrate, removing at least a portion of the mask material from the substrate such that the mask material does not cover the second portion of the exterior surface of the substrate.
4. The method of claim 1 , comprising forming the wavelength-converting material over the mask material and the second portion of the exterior surface of the substrate.
5. The method of claim 1 , wherein removing the portion of the wavelength-converting material comprises grinding the wavelength-converting material.
6. The method of claim 1 , wherein removing the portion of the wavelength-converting material comprises forming a substantially planar surface across the wavelength-converting material and the mask material.
7. The method of claim 1 , wherein the mask material comprises a polymer.
8. The method of claim 1 , wherein the mask material comprises a photoresist.
9. The method of claim 1 , wherein the wavelength-converting material comprises at least one phosphor.
10. The method of claim 1 , wherein removing at least a portion of the mask material exposes a surface of an electrically conductive material underneath the mask material.
11. The method of claim 1 , wherein the substrate comprises a light-emitting device.
12. The method of claim 11 , wherein the light-emitting device comprises a light-emitting diode.
13. The method of claim 11 , wherein the light-emitting device has an edge having a length of at least about 1 mm.
14. The method of claim 11 , wherein the exterior surface corresponds to an emission surface of the light-emitting device, and at least about 75% of the light that is emitted by the light-emitting device is emitted through the exterior surface.
15. The method of claim 1 , wherein the first portion of the exterior surface of the substrate comprises an electrical contact.
16. The method of claim 15 , wherein substantially none of the electrical contact is covered by the wavelength-converting material.
17. The method of claim 15 , wherein a portion of the electrical contact is covered by the wavelength-converting material.
18. The method of claim 1 , wherein the exterior surface is part of a semiconductor layer.
19. The method of claim 18 , wherein the semiconductor layer comprises an n-doped semiconductor layer.
20. The method of claim 18 , wherein the semiconductor layer comprises a III-V semiconductor.
21. A method, comprising:
providing a substrate over which a mask material and a wavelength-converting material are positioned, wherein:
the mask material covers at least a first portion of an exterior surface of the substrate,
the mask material does not cover at least a second portion of the exterior surface of the substrate, and
the wavelength-converting material is positioned over the mask material and the second portion of the exterior surface of the substrate; and
grinding at least a portion of the wavelength-converting material positioned over the mask material to remove at least a portion of the wavelength-converting material positioned over the mask material; and
removing at least a portion of the mask material.
22. The method of claim 21 , wherein the substrate comprises a light-emitting device.
23. The method of claim 21 , wherein the wavelength-converting material comprises at least one phosphor.