IP Library Granted Patent US 8,780,950
Granted Patent B2
US 8,780,950 · App. 13/596,698 · Granted Jul 15, 2014

Surface emitting semiconductor laser, surface emitting semiconductor laser device, light transmission apparatus, and information processing apparatus

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Quick Facts
Patent No.
US 8,780,950
App. No.
13/596,698
Granted
Jul 15, 2014
Kind
B2
Abstract

A surface emitting semiconductor laser includes a substrate, a first semiconductor multi-layer reflector formed on the substrate and including a pair of a high refractive index layer having a relatively high refractive index and a low refractive index layer having a relatively low refractive index which are laminated, a semi-insulating i type AlGaAs layer formed on the first semiconductor multi-layer reflector, an n type semiconductor layer formed on the AlGaAs layer, an active region formed on the semiconductor layer, a p type second semiconductor multi-layer reflector formed on the active region and including a pair of a high refractive index layer having a relatively high refractive index and a low refractive index layer having a relatively low refractive index which are laminated, an n side first electrode electrically connected to the semiconductor layer, and a p side second electrode electrically connected to the second semiconductor multi-layer reflector.

Claims (56)

1. A surface emitting semiconductor laser comprising:

a substrate;

a first semiconductor multi-layer reflector formed on the substrate and including a pair of a high refractive index layer having a relatively high refractive index and a low refractive index layer having a relatively low refractive index which are laminated;

a semi-insulating i type AlGaAs layer formed on the first semiconductor multi-layer reflector and having an optical film thickness larger than an oscillation wavelength;

an n type semiconductor layer formed on the AlGaAs layer, not having a deep level due to an impurity, or the deep level being higher than a Γ level, and capable of having a lattice matching with the substrate;

an active region formed on the semiconductor layer;

a p type second semiconductor multi-layer reflector formed on the active region and including a pair of a high refractive index layer having a relatively high refractive index and a low refractive index layer having a relatively low refractive index which are laminated;

an n side first electrode electrically connected to the semiconductor layer; and

a p side second electrode electrically connected to the second semiconductor multi-layer reflector;

wherein

a length of a resonator defined by the first semiconductor multi-layer reflector the AlGaAs layer, the semiconductor layer, the active region, and the second semiconductor multi-layer reflector is greater than the oscillation wavelength,

at least two resonant wavelengths are included in a reflection band of the resonator, and

a selected resonant wavelength is oscillated.

2. The surface emitting semiconductor laser according to claim 1 , wherein the semiconductor layer is made of an n type GaInP.

3. The surface emitting semiconductor laser according to claim 1 , wherein the first semiconductor multi-layer reflector is of a semi-insulating i type.

4. The surface emitting semiconductor laser according to claim 2 , wherein the first semiconductor multi-layer reflector is of a semi-insulating i type.

5. The surface emitting semiconductor laser according to claim 1 , wherein

a columnar structure from the second semiconductor multi-layer reflector to the semiconductor layer is formed,

the second electrode electrically connected to the second semiconductor multi-layer reflector is formed on a top portion of the columnar structure, and

the first electrode electrically connected to the second semiconductor multi-layer reflector is formed on the semiconductor layer which is exposed at a bottom portion of the columnar structure.

6. The surface emitting semiconductor laser according to claim 1 , wherein a current confining layer is formed inside the second semiconductor multi-layer reflector.

7. The surface emitting semiconductor laser according to claim 1 , wherein

the first semiconductor multi-layer reflector includes a pair of an AlGaAs layer having a relatively high Al composition and an AlGaAs layer having a relatively low Al composition, and

the second semiconductor multi-layer reflector includes a pair of an AlGaAs layer having a relatively high Al composition and an AlGaAs layer having a relatively low Al composition.

8. The surface emitting semiconductor laser according to claim 1 , wherein the semiconductor layer is made of n type AlGaInP.

9. The surface emitting semiconductor laser according to claim 1 , wherein the semiconductor layer is made of n type AlGaAsP.

10. A surface emitting semiconductor laser comprising:

a p type semiconductor substrate;

a p type first semiconductor multi-layer reflector formed on the semiconductor substrate and including a pair of a high refractive index layer having a relatively high refractive index and a low refractive index layer having a relatively low refractive index which are laminated;

an active region formed on the first semiconductor multi-layer reflector;

an n type semiconductor layer formed on the active region, not having a deep level due to an impurity, or the deep level being higher than a Γ level, and capable of having a lattice matching with the substrate;

a semi-insulating i type AlGaAs layer formed on the semiconductor layer;

a second semiconductor multi-layer reflector formed on the AlGaAs layer and including a pair of a high refractive index layer having a relatively high refractive index and a low refractive index layer having a relatively low refractive index which are laminated;

an n side first electrode electrically connected to the semiconductor layer; and

a p side second electrode electrically connected to the first semiconductor multi-layer reflector.

11. The surface emitting semiconductor laser according to claim 10 , wherein the semiconductor layer is made of n type GaInP.

12. The surface emitting semiconductor laser according to claim 10 , wherein

a length of a resonator defined by the first semiconductor multi-layer reflector, the active region, the semiconductor layer, the AlGaAs layer, and the second semiconductor multi-layer reflector is greater than the oscillation wavelength,

at least two resonant wavelengths are included in a reflection band of the resonator, and

a selected resonant wavelength is oscillated.

13. The surface emitting semiconductor laser according to claim 10 , wherein

a columnar structure from the second semiconductor multi-layer reflector to the semiconductor layer is formed,

the first electrode electrically connected to the second semiconductor multi-layer reflector is formed on the semiconductor layer which is exposed at a bottom portion of the columnar structure, and

the second electrode electrically connected to the first semiconductor multi-layer reflector is formed on a rear surface of the semiconductor substrate.

14. The surface emitting semiconductor laser according to claim 10 , wherein the semiconductor layer is made of n type AlGaInP.

15. The surface emitting semiconductor laser according to claim 10 , wherein the semiconductor layer is made of n type AlGaAsP.

16. A surface emitting semiconductor laser device comprising:

the surface emitting semiconductor laser according to claim 1 ; and

an optical member to which light from the surface emitting semiconductor laser is incident.

17. A light transmission apparatus comprising:

the surface emitting semiconductor laser device according to claim 16 ; and

a transmission unit that transmits laser light emitted from the surface emitting semiconductor laser device via an optical medium.

18. An information processing apparatus comprising:

the surface emitting semiconductor laser according to claim 1 ;

a condenser that collects laser light emitted from the surface emitting semiconductor laser at a recording medium; and

a mechanism that scans the laser light collected by the condenser on the recording medium.

Assignments (2)
CHANGE OF NAME Recorded Aug 12, 2021
From: FUJI XEROX CO., LTD.
To: FUJIFILM BUSINESS INNOVATION CORP.
Reel/Frame 058287/0056 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 28, 2012
From: KONDO, TAKASHI
To: FUJI XEROX CO., LTD.
Reel/Frame 028856/0926 →