Signal processing method and signal processing apparatus
View Patent ↗In accordance with an embodiment, a signal processing method includes scanning a pattern on a substrate with a charged particle beam, detecting secondary charged particles emitted from the substrate by using a detector, outputting a signal, and filtering the signal. The detector is separated or divided into a plurality of regions, and the secondary charged particles are detected separately in each region of the detector. Intensity of the filtering is defined in dependence on a function f(θ) of an angle θ between a reference axis and a direction along which the secondary charged particles enter a detector plane. The reference axis is an arbitrary direction in a plane parallel to a surface of the substrate.
1. A signal processing apparatus comprising:
a charged particle source configured to generate charged particles and irradiates a substrate with a charged particle beam;
an energy filter configured to selectively allows secondary charged particle having arbitrary energy intensity in the secondary charged particles emitted from the substrate to pass therethrough, based on an angle θ formed between a reference axis and a direction along which the secondary charged particles enter a detector plane, the reference axis being an arbitrary direction within a plane parallel to a surface of the substrate;
a detection unit which detects secondary charged particles having energy that is not greater than a predetermined threshold value among the secondary charged particles emitted in a state of being separated or divided in N regions from the substrate, where N is an even number of 4 or more, to output a signal regarding the detected secondary charged particles by each region; and
a signal processing unit configured to change an intensity of the energy filter while irradiating the charged particle beam, to calculate a S/N ratio in the regions in regard to the signal obtained by each region based on a result of changing the intensity of the energy filter, and to calculate a position of a defect in a depth direction or a depth of a bottom surface of the pattern based on the calculated S/N ratio.
2. The apparatus of claim 1 ,
wherein the signal processing unit is configured to use the same S/N in an arbitrary region and in another region to calculate the SIN ratio.
3. The apparatus of claim 1 ,
wherein the signal processing unit calculates the position of the defect in the depth direction or the depth of the bottom surface of the pattern by comparing the calculated S/N ratio with reference data prepared in advance.
4. The apparatus of claim 1 ,
wherein the N regions of the detector comprise:
at least a first region including a Y axis and a second region including an X axis, the Y axis direction being a longitudinal direction when the pattern is a line pattern, or being a direction providing a minimum pitch in arrangement of the pattern when the pattern is continuously arranged in a plurality of directions, and the X axis being a direction orthogonal to the Y axis direction within a plane parallel to the surface of the substrate.