IP Library Granted Patent US 8,470,624
Granted Patent B2
US 8,470,624 · App. 13/602,343 · Granted Jun 25, 2013

Fabricating method of organic electro-luminescence display unit

Inventors: Chang-Ken Chen (Taipei County, TW); Hsing-Hung Hsieh (Changhua County, TW)
Assignee: Au Optronics Corporation
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Quick Facts
Patent No.
US 8,470,624
App. No.
13/602,343
Granted
Jun 25, 2013
Kind
B2
Abstract

A fabricating method of an organic electroluminescent display unit is provided. A gate and a gate insulating layer covering the gate are formed on the substrate. A patterned metal-oxide layer with an etching stop layer thereon is formed on the gate insulating layer. A surface treatment is performed on the patterned metal-oxide layer with use of the etching stop layer as a mask, such that a portion of the patterned metal-oxide layer uncovered by the etching stop layer has greater conductivity than conductivity of another portion of the patterned metal-oxide layer covered by the etching stop layer. The patterned metal-oxide layer treated by the surface treatment includes a pixel electrode and an active layer located above the gate. A source and a drain are then formed. And then, an organic electro-luminescence layer and a top electrode are sequentially formed on the pixel electrode.

Claims (10)

1. A fabricating method of an organic electro-luminescence display unit, comprising:

forming a gate on a substrate;

forming a gate insulating layer on the substrate to cover the gate;

forming a patterned metal-oxide layer on the gate insulating layer;

forming an etching stop layer on a portion of the patterned metal-oxide layer;

perfonning a surface treatment on the patterned metal-oxide layer with use of the etching stop layer as a mask, such that conductivity of a portion of the patterned metal-oxide layer uncovered by the etching stop layer is greater than conductivity of the a portion of the patterned metal-oxide layer covered by the etching stop layer, wherein the patterned metal-oxide layer treated by the surface treatment comprises a pixel electrode and an active layer located above the gate insulation layer;

forming a source and a drain, wherein the source and the drain are electrically connected to a portion of the active layer uncovered by the etching stop layer, and the drain is electrically connected to the pixel electrode;

forming an organic electro-luminescence layer on the pixel electrode; and

forming a top electrode on the organic electro-luminescence layer.

2. The fabricating method as claimed in claim 1 , wherein the surface treatment comprises a plasma surface treatment.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 24, 2025
From: AUO CORPORATION
To: NEOLAYER LLC
Reel/Frame 072266/0941 →
Priority Claims (1)
TW 98125240 A · Jul 27, 2009 · national
Continuity (2)
Division 12582711 · Oct 21, 2009
Related Publication 20120329189A1 · Dec 27, 2012